Tromethamine

Tromethamine

SCHEMBL3189166

CC(C)(C)C(=O)OCCN.NC(CO)(CO)CO

nearest known ligand 0.39

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

DHFRGARTPTGFRPTGIRPTGS1PTGS2TUBA1ATUBA1BTUBA1CTUBA3CTUBA3ETUBA4ATUBBTUBB1TUBB2ATUBB2BTUBB3TUBB4ATUBB4BTUBB6TUBB8envmurAthyA

The experimentally established mechanism targets of Tromethamine. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 9)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 1/20 0.39
LMNA P02545 1/20 0.39
KMT2A Q03164 1/20 0.39
PRKCA P17252 2/20 0.38
POLB P06746 1/20 0.37
GAA P10253 1/20 0.37
NPSR1 Q6W5P4 1/20 0.37
CYP4F2 P78329 1/20 0.30
CYP4A11 Q02928 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7096949 0.88 POLB (0.43) MEN1LMNAKMT2APRKCAPOLB
Hydrochloric Acid SCHEMBL3506265 0.86 POLB (0.42) MEN1LMNAKMT2APRKCAPOLB
SCHEMBL16174088 0.78 PRKCA (0.33) PRKCA
SCHEMBL18274690 0.77 ALDH1A1 (0.35) POLBGAANPSR1
Tromethamine SCHEMBL6327657 0.77 NAAA (0.42) MEN1LMNAKMT2AGAA
SCHEMBL12392870 0.76 POLB (0.39) PRKCAPOLBGAANPSR1CYP4F2
SCHEMBL16580063 0.75 POLB (0.41) MEN1LMNAKMT2APRKCAPOLB
SCHEMBL12972547 0.75 NPSR1 (0.41) LMNAKMT2APRKCAPOLBGAA
SCHEMBL12209931 0.74 DGAT1 (0.34) LMNAPOLBGAANPSR1
SCHEMBL13089654 0.74 NPSR1 (0.40) MEN1LMNAKMT2APRKCAPOLB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7655378-B2 Negative resist composition and patterning process using the same SHIN-ETSU CHEMICAL CO., LTD. (JP) 2010-02-02 US disclosed
US-20080020290-A1 Negative resist composition and patterning process using the same SHIN-ETSU CHEMICAL CO., LTD. (JP) 2008-01-24 US disclosed