Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP1B1 | Q16678 | 1/20 | 0.34 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.33 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.33 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.33 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.33 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.33 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.33 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.33 |
| ▸ | POLB | P06746 | 1/20 | 0.33 |
| ▸ | CASP3 | P42574 | 1/20 | 0.33 |
| ▸ | SENP7 | Q9BQF6 | 1/20 | 0.33 |
| ▸ | SENP6 | Q9GZR1 | 1/20 | 0.33 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.32 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.32 |
| ▸ | PTPRC | P08575 | 1/20 | 0.31 |
| ▸ | PTPRF | P10586 | 1/20 | 0.31 |
| ▸ | PTPN1 | P18031 | 1/20 | 0.31 |
| ▸ | CDC25B | P30305 | 1/20 | 0.31 |
| ▸ | CYP11B2 | P19099 | 1/20 | 0.31 |
| ▸ | NPC1 | O15118 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4721538 | 0.98 | CYP1B1 (0.32) | CYP1B1ALDH1A1CYP1A2CYP2D6CYP2C9 | |
| SCHEMBL4721678 | 0.94 | ALDH1A1 (0.30) | ALDH1A1CYP1A2CYP2D6CYP2C9CYP2C19 | |
| SCHEMBL458139 | 0.90 | — | — | |
| SCHEMBL4719699 | 0.84 | CYP1B1 (0.35) | CYP1B1ALDH1A1CYP1A2CYP2D6CYP2C9 | |
| SCHEMBL4582513 | 0.82 | ICMT (0.30) | — | |
| SCHEMBL4721737 | 0.82 | CYP1B1 (0.33) | CYP1B1ALDH1A1CYP2D6HIF1AHSD17B10 | |
| SCHEMBL4720697 | 0.79 | L3MBTL1 (0.34) | CYP1B1ALDH1A1CYP2D6HIF1AHSD17B10 | |
| SCHEMBL6604353 | 0.76 | SLC18A3 (0.38) | — | |
| SCHEMBL4720723 | 0.75 | SLC6A3 (0.32) | — | |
| SCHEMBL4720998 | 0.74 | ALDH1A1 (0.32) | ALDH1A1HIF1AHSD17B10TDP1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 39 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20240053678-A1 | RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-02-15 | — | — | US | disclosed |
| CN-117539126-A | Resist composition and pattern forming method | 信越化学工业株式会社 | 2024-02-09 | — | — | CN | disclosed |
| CN-114405547-A | Metal complexes | 利兹大学 | 2022-04-29 | — | — | CN | disclosed |
| CN-108368145-B | Metal complexes | 利兹大学 | 2021-12-31 | — | — | CN | disclosed |
| US-20200247739-A1 | COMPOUND, RESIN, COMPOSITION, PATTERN FORMATION METHOD, AND PURIFICATION METHOD | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2020-08-06 | — | — | US | disclosed |
| US-10717754-B2 | Metal complexes | UNIVERSITY OF LEEDS (GB) | 2020-07-21 | — | — | US | disclosed |
| US-20200157060-A1 | FILM FORMING MATERIAL, COMPOSITION FOR FILM FORMATION FOR LITHOGRAPHY, MATERIAL FOR OPTICAL COMPONENT FORMATION, RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, PERMANENT FILM FOR RESIST, RADIATION-SENSITIVE COMPOSITION, METHOD FOR PRODUCING AMORPHOUS FILM, UNDERLAYER FILM FORMING MATERIAL FOR LITHOGRAPHY, COMPOSITION FOR UNDERLAYER FILM FORMATION FOR LITHOGRAPHY, METHOD FOR PRODUCING UNDERLAYER FILM FOR LITHOGRAPHY, AND CIRCUIT PATTERN FORMATION METHOD | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2020-05-21 | — | — | US | disclosed |
| EP-3647869-A1 | FILM-FORMING MATERIAL, LITHOGRAPHIC FILM-FORMING COMPOSITION, OPTICAL COMPONENT-FORMING MATERIAL, RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, RESIST PERMANENT FILM, RADIATION-SENSITIVE COMPOSITION, AMORPHOUS FILM PRODUCTION METHOD, LITHOGRAPHIC UNDERLAYER FILM-FORMING MATERIAL, LITHOGRAPHIC UNDERLAYER FILM-FORMING COMPOSITION, LITHOGRAPHIC UNDERLAYER FILM PRODUCTION METHOD, AND CIRCUIT PATTERN FORMATION METHOD | Mitsubishi Gas Chemical Company, Inc. (JP) | 2020-05-06 | — | — | EP | disclosed |
| CN-110856451-A | Film-forming material, composition for forming film for lithography, material for forming optical member, resist composition, method for forming resist pattern, permanent film for resist, radiation-sensitive composition, method for producing amorphous film, material for forming underlayer film for lithography, composition for forming underlayer film for lithography, method for producing underlayer film for lithography, and method for forming circuit pattern | 三菱瓦斯化学株式会社 | 2020-02-28 | — | — | CN | disclosed |
| EP-3390421-B1 | METAL COMPLEXES | UNIV LEEDS INNOVATIONS LTD (GB) | 2020-01-29 | — | — | EP | disclosed |
| US-20030078426-A1 | Amine derivative compounds | SANKYO COMPANY, LIMITED (JP) | 2003-04-24 | — | — | US | disclosed |
| US-6492364-B1 | Triazolo and derivatives as chemokine inhibitors | TORAY INDUSTRIES, INC. (JP) | 2002-12-10 | — | — | US | disclosed |
| EP-1167366-A1 | AMINE DERIVATIVES | Sankyo Company, Limited (JP) | 2002-01-02 | — | — | EP | disclosed |
| CN-1293674-A | Triazolo gerivatives and chemokine inhibitors containing the same as the active ingredient | TORAY INDUSTRIES (JP) | 2001-05-02 | — | — | CN | disclosed |
| EP-1067130-A1 | TRIAZOLO DERIVATIVES AND CHEMOKINE INHIBITORS CONTAINING THE SAME AS THE ACTIVE INGREDIENT | TORAY INDUSTRIES, INC. (JP) | 2001-01-10 | — | — | EP | disclosed |
| US-4282171-A | Phosphorus and sulfur containing amides and thioamides | THE LUBRIZOL CORPORATION (US) | 1981-08-04 | — | — | US | disclosed |
| US-4208357-A | Process for preparing phosphorus and sulfur containing amides and thioamides | THE LUBRIZOL CORPORATION (US) | 1980-06-17 | — | — | US | disclosed |
| US-4081386-A | ANTIOXIDANTS | THE LUBRIZOL CORPORATION (US) | 1978-03-28 | — | — | US | disclosed |
| US-4032461-A | PHOSPHORUS AND SULFUR CONTAINING AMIDES AND THIOAMIDES AS LUBRICATING OIL ADDITIVES AND LUBRICATING OIL COMPOSITIONS CONTAINING SAME | THE LUBRIZOL CORPORATION (US) | 1977-06-28 | — | — | US | disclosed |
| US-4031023-A | Lubricating compositions and methods utilizing hydroxy thioethers | THE LUBRIZOL CORPORATION (US) | 1977-06-21 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20200247739-A1 | COMPOUND, RESIN, COMPOSITION, PATTERN FORMATION METHOD, AND PURIFICATION METHOD | CROCC, RDX, RBBP9 | CYP1B1 3474/4885ALDH1A1 4055/4885CYP1A2 3874/4885 |
| US-20200157060-A1 | FILM FORMING MATERIAL, COMPOSITION FOR FILM FORMATION FOR LITHOGRAPHY, MATERIAL FOR OPTICAL COMPONENT FORMATION, RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, PERMANENT FILM FOR RESIST, RADIATION-SENSITIVE COMPOSITION, METHOD FOR PRODUCING AMORPHOUS FILM, UNDERLAYER FILM FORMING MATERIAL FOR LITHOGRAPHY, COMPOSITION FOR UNDERLAYER FILM FORMATION FOR LITHOGRAPHY, METHOD FOR PRODUCING UNDERLAYER FILM FOR LITHOGRAPHY, AND CIRCUIT PATTERN FORMATION METHOD | RAD51, C5, UBE2G2 | CYP1B1 2213/4885ALDH1A1 3075/4885CYP1A2 1346/4885 |
| US-10717754-B2 | Metal complexes | SDHB, MPI, AP1M1 | CYP1B1 1080/4885ALDH1A1 1027/4885CYP1A2 1734/4885 |
| US-20030078426-A1 | Amine derivative compounds | H1-10, APOB, PRMT1 | CYP1B1 587/4885ALDH1A1 874/4885CYP1A2 1561/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.