Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PLCG1 | P19174 | 1/20 | 0.58 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.52 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.52 |
| ▸ | MEN1 | O00255 | 1/20 | 0.52 |
| ▸ | PKM | P14618 | 1/20 | 0.52 |
| ▸ | CA2 | P00918 | 3/20 | 0.48 |
| ▸ | MMP2 | P08253 | 2/20 | 0.48 |
| ▸ | MMP9 | P14780 | 2/20 | 0.48 |
| ▸ | CA1 | P00915 | 2/20 | 0.48 |
| ▸ | MMP1 | P03956 | 1/20 | 0.48 |
| ▸ | MMP8 | P22894 | 1/20 | 0.48 |
| ▸ | MMP13 | P45452 | 1/20 | 0.48 |
| ▸ | HSD11B1 | P28845 | 2/20 | 0.46 |
| ▸ | PAX8 | Q06710 | 1/20 | 0.44 |
| ▸ | MMP14 | P50281 | 1/20 | 0.44 |
| ▸ | PSEN1 | P49768 | 1/20 | 0.44 |
| ▸ | PSEN2 | P49810 | 1/20 | 0.44 |
| ▸ | APH1B | Q8WW43 | 1/20 | 0.44 |
| ▸ | NCSTN | Q92542 | 1/20 | 0.44 |
| ▸ | APH1A | Q96BI3 | 1/20 | 0.44 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8763331 | 0.83 | ALDH1A1 (0.43) | PLCG1KMT2AALDH1A1MEN1PKM | |
| Fluoresone SCHEMBL24999 | 0.82 | PSIP1 (0.58) | KMT2AALDH1A1MEN1PKMCA2 | |
| SCHEMBL15199478 | 0.82 | MMP2 (0.46) | KMT2AALDH1A1MEN1PKMCA2 | |
| SCHEMBL9704701 | 0.82 | CA1 (0.46) | KMT2AALDH1A1MEN1PKMCA2 | |
| SCHEMBL3108160 | 0.80 | PSEN1 (0.46) | KMT2AALDH1A1MEN1PKMCA2 | |
| SCHEMBL14544901 | 0.80 | MMP2 (0.45) | KMT2AALDH1A1MEN1PKMCA2 | |
| SCHEMBL15013716 | 0.80 | ALDH1A1 (0.56) | KMT2AALDH1A1MEN1PKMCA2 | |
| SCHEMBL28108051 | 0.78 | MLNR (0.53) | CA2MMP2MMP9CA1MMP1 | |
| SCHEMBL28110228 | 0.77 | ALDH1A1 (0.43) | PLCG1KMT2AALDH1A1MEN1PKM | |
| SCHEMBL12570643 | 0.77 | PTGS2 (0.58) | KMT2APAX8 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0989460-B1 | PATTERN FORMING METHOD | AZ ELECTRONIC MATERIALS USA (US) | 2010-05-26 | — | — | EP | disclosed |
| US-6527966-B1 | Forming a pattern composed of an etchable layer by conducting dry etching of an etchable layer formed on a substrate for semiconductor through a mask of patterned radiation sensitive material coating formed on the etchable layer | CLARIANT FINANCE (BVI) LIMITED (VG) | 2003-03-04 | — | — | US | disclosed |
| US-6479210-B2 | COMPRISING AN ORGANIC MATERIAL CONTAINING SUBSTITUENT(S) CAPABLE OF BEING RELEASED IN THE PRESENCE OF ACID, AND ACID GENERATORS OF AT LEAST ONE ONIUM SALT AND SULFONE AND/OR SULFONATE COMPOUNDS; RESOLUTION, SENSITIVITY | CLARIANT FINANCE (BVI) LIMITED (VG) | 2002-11-12 | — | — | US | disclosed |
| US-20010036589-A1 | CHEMICALLY AMPLIFIED RESIST COMPOSITION | MERCK PATENT GMBH (DE) | 2001-11-01 | — | — | US | disclosed |
| EP-0827970-B1 | New acid-labile group protected hydroxystyrene polymers or copolymers thereof and their application to radiation sensitive materials | CLARIANT FINANCE BVI LTD (VG) | 2001-09-26 | — | — | EP | disclosed |
| EP-0989460-A1 | PATTERN FORMING METHOD | Clariant Finance (BVI) Limited (VG) | 2000-03-29 | — | — | EP | disclosed |
| EP-0989459-A1 | CHEMICALLY AMPLIFIED RESIST COMPOSITION | Clariant Finance (BVI) Limited (VG) | 2000-03-29 | — | — | EP | disclosed |
| US-5852128-A | Acid-labile group protected hydroxystyrene polymers or copolymers thereof and their application to radiation sensitive materials | CLARIANT AG (CH) | 1998-12-22 | — | — | US | disclosed |
| EP-0827970-A2 | New acid-labile group protected hydroxystyrene polymers or copolymers thereof and their application to radiation sensitive materials | Clariant AG (CH) | 1998-03-11 | — | — | EP | disclosed |
| EP-0654149-B1 | POSITIVE-ACTING RADIATION-SENSITIVE MIXTURE AND RECORDING MATERIAL PRODUCED THEREWITH | HOECHST AG (DE) | 1997-02-05 | — | — | EP | disclosed |
| EP-0654149-A1 | POSITIVE-ACTING RADIATION-SENSITIVE MIXTURE AND RECORDING MATERIAL PRODUCED THEREWITH. | HOECHST AG (DE) | 1995-05-24 | — | — | EP | disclosed |
| WO-1994003837-A1 | POSITIVE-ACTING RADIATION-SENSITIVE MIXTURE AND RECORDING MATERIAL PRODUCED THEREWITH | HOECHST AKTIENGESELLSCHAFT (DE) | 1994-02-17 | — | — | WO | disclosed |