SCHEMBL3256380

SCHEMBL3256380

C=C(C)C(=O)OCCNS(=O)(=O)CC

nearest known ligand 0.50

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
THRB P10828 1/20 0.50
TSHR P16473 3/20 0.49
ALDH1A1 P00352 2/20 0.39
POLB P06746 1/20 0.35
APEX1 P27695 1/20 0.35
HTT P42858 1/20 0.35
TDP1 Q9NUW8 1/20 0.35
PTGES O14684 1/20 0.31
SMN1; SMN2 Q16637 1/20 0.30
MGAM O43451 1/20 0.30
GAA P10253 1/20 0.30
SI P14410 1/20 0.30
MGAM2 Q2M2H8 1/20 0.30
MEN1 O00255 1/20 0.30
KMT2A Q03164 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12330291 0.86 THRB (0.43) THRBTSHRALDH1A1POLBAPEX1
SCHEMBL3243694 0.84 THRB (0.47) THRBTSHRALDH1A1POLBAPEX1
SCHEMBL9418366 0.84 THRB (0.47) THRBTSHRALDH1A1POLBAPEX1
SCHEMBL11418593 0.83 THRB (0.41) THRBTSHRALDH1A1POLBAPEX1
SCHEMBL8565012 0.83 TSHR (0.59) THRBTSHRPOLBAPEX1HTT
SCHEMBL15836509 0.82 THRB (0.40) THRBTSHRALDH1A1POLBAPEX1
SCHEMBL28429201 0.82 THRB (0.46) THRBTSHRALDH1A1POLBAPEX1
SCHEMBL28366360 0.80 TSHR (0.47) THRBTSHRALDH1A1POLBAPEX1
SCHEMBL9436877 0.79 TSHR (0.43) THRBTSHRALDH1A1POLBAPEX1
SCHEMBL217339 0.78 THRB (0.42) THRBTSHRALDH1A1POLBAPEX1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 25 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5141838-A Lithography printing plates FUJI PHOTO FILM CO., LTD. (JP) 1992-08-25 US claimed
US-20230251575-A1 PHOTORESIST TOPCOAT COMPOSITIONS AND PATTERN FORMATION METHODS U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT 2023-08-10 US disclosed
US-9594303-B2 Resist pattern-forming method and photoresist composition JSR CORPORATION (JP) 2017-03-14 US disclosed
US-9594303-B2 Resist pattern-forming method and photoresist composition JSR CORPORATION (JP) 2017-03-14 US disclosed
US-20150248054-A1 PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, METHOD OF MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2015-09-03 US disclosed
US-20150248054-A1 PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, METHOD OF MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2015-09-03 US disclosed
US-20150010866-A1 RESIST PATTERN-FORMING METHOD AND PHOTORESIST COMPOSITION JSR CORPORATION (JP) 2015-01-08 US disclosed
US-20150010866-A1 RESIST PATTERN-FORMING METHOD AND PHOTORESIST COMPOSITION JSR CORPORATION (JP) 2015-01-08 US disclosed
WO-2013141222-A1 RESIST PATTERN FORMING METHOD AND PHOTORESIST COMPOSITION JSR株式会社 (JP) 2013-09-26 WO disclosed
US-20120146264-A1 RESIN COMPOSITION FOR LASER ENGRAVING, RELIEF PRINTING PLATE PRECURSOR FOR LASER ENGRAVING AND PROCESS FOR PRODUCING SAME, AND PROCESS FOR MAKING RELIEF PRINTING PLATE FUJIFILM CORPORATION (JP) 2012-06-14 US disclosed
US-6517987-B2 Mixture of 1,2-naphthoquinone-2-diazide-5-sulfonic acid and polymer FUJI PHOTO FILM CO., LTD. (JP) 2003-02-11 US disclosed
US-20010041299-A1 Positive-working presensitized plate useful for preparing a lithographic printing plate FUJIFILM CORPORATION (JP) 2001-11-15 US disclosed
EP-0671660-B1 Lead-frame forming material FUJI PHOTO FILM CO LTD (JP) 2001-10-17 EP disclosed
EP-1136886-A1 Positive-working presensitized plate useful for preparing a lithographic printing plate Fuji Photo Film Co., Ltd. (JP) 2001-09-26 EP disclosed
EP-1077392-A1 Photosensitive lithographic printing plate FUJI PHOTO FILM CO., LTD. (JP) 2001-02-21 EP disclosed
US-5670293-A LIGHT SENSITIVE MATERIAL WITH COPPER OR NICKEL ALLOYS, DRYING A PHOTOSENSITIVE LAYER AND WINDING THE COATED WEB INTO STRIPS AND STACKING FUJI PHOTO FILM CO., LTD. (JP) 1997-09-23 US disclosed
EP-0330239-B1 Photosensitive composition FUJI PHOTO FILM CO LTD (JP) 1996-05-22 EP disclosed
EP-0671660-A2 Lead-frame forming material FUJI PHOTO FILM CO., LTD. (JP) 1995-09-13 EP disclosed
US-5141838-A Lithography printing plates FUJI PHOTO FILM CO., LTD. (JP) 1992-08-25 US disclosed
EP-0330239-A2 Photosensitive composition FUJI PHOTO FILM CO., LTD. (JP) 1989-08-30 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20120146264-A1 RESIN COMPOSITION FOR LASER ENGRAVING, RELIEF PRINTING PLATE PRECURSOR FOR LASER ENGRAVING AND PROCESS FOR PRODUCING SAME, AND PROCESS FOR MAKING RELIEF PRINTING PLATE EIF3L, EIF2B1, EIF2B5 THRB 4731/4885TSHR 4790/4885ALDH1A1 1302/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.