Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SLC1A3 | P43003 | 3/20 | 0.37 |
| ▸ | SLC1A2 | P43004 | 3/20 | 0.37 |
| ▸ | SLC1A1 | P43005 | 3/20 | 0.37 |
| ▸ | LMNA | P02545 | 2/20 | 0.35 |
| ▸ | PRMT5 | O14744 | 1/20 | 0.35 |
| ▸ | WDR77 | Q9BQA1 | 1/20 | 0.35 |
| ▸ | ADRB1 | P08588 | 1/20 | 0.34 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.34 |
| ▸ | MEN1 | O00255 | 1/20 | 0.34 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.34 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.34 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Methyl Alcohol SCHEMBL3273946 | 0.87 | LMNA (0.39) | SLC1A3SLC1A2SLC1A1LMNACYP1A2 | |
| Methyl Alcohol SCHEMBL16210946 | 0.84 | LMNA (0.42) | SLC1A3SLC1A2SLC1A1LMNACYP1A2 | |
| Methyl Alcohol SCHEMBL17513807 | 0.84 | LMNA (0.42) | SLC1A3SLC1A2SLC1A1LMNACYP1A2 | |
| SCHEMBL20531 | 0.84 | CTSL (0.38) | SLC1A3SLC1A2SLC1A1LMNACYP1A2 | |
| SCHEMBL27899696 | 0.83 | SLC1A3 (0.32) | SLC1A3SLC1A2SLC1A1LMNACYP1A2 | |
| Alcohol SCHEMBL3274620 | 0.82 | CYP1A2 (0.37) | SLC1A3SLC1A2SLC1A1LMNACYP1A2 | |
| SCHEMBL23039739 | 0.81 | CTSL (0.41) | SLC1A3SLC1A2SLC1A1LMNACYP1A2 | |
| SCHEMBL16239892 | 0.81 | CTSL (0.41) | SLC1A3SLC1A2SLC1A1LMNACYP1A2 | |
| SCHEMBL379081 | 0.81 | CTSL (0.41) | SLC1A3SLC1A2SLC1A1LMNACYP1A2 | |
| SCHEMBL869115 | 0.81 | CTSL (0.41) | SLC1A3SLC1A2SLC1A1LMNACYP1A2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-115466188-B | Novel process for synthesizing glycine ethyl ester hydrochloride | 大连凯飞化学股份有限公司 | 2023-08-18 | — | — | CN | disclosed |
| CN-115466188-A | Novel synthesis process of glycine ethyl ester hydrochloride | 大连凯飞化学股份有限公司 | 2022-12-13 | — | — | CN | disclosed |
| US-9624356-B2 | Ultraviolet absorber, composition for forming a resist under layer film, and patterning process | SHIN-ETSU CHEMIAL CO., LTD (JP) | 2017-04-18 | — | — | US | disclosed |
| US-9522979-B2 | Fluorine-containing silicon compound, method for producing same, and method for producing fluorine-containing silicon resin | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-12-20 | — | — | US | disclosed |
| US-20160229960-A1 | FLUORINE-CONTAINING SILICON COMPOUND, METHOD FOR PRODUCING SAME, AND METHOD FOR PRODUCING FLUORINE-CONTAINING SILICON RESIN | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-08-11 | — | — | US | disclosed |
| US-9315670-B2 | Composition for forming resist underlayer film and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-04-19 | — | — | US | disclosed |
| US-20160053087-A1 | ULTRAVIOLET ABSORBER, COMPOSITION FOR FORMING A RESIST UNDER LAYER FILM, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-02-25 | — | — | US | disclosed |
| US-9188866-B2 | Composition for forming titanium-containing resist underlayer film and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-11-17 | — | — | US | disclosed |
| US-9176382-B2 | Composition for forming titanium-containing resist underlayer film and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-11-03 | — | — | US | disclosed |
| US-8852844-B2 | Composition for forming silicon-containing film, silicon-containing film-formed substrate and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-10-07 | — | — | US | disclosed |
| US-20140273448-A1 | COMPOSITION FOR FORMING TITANIUM-CONTAINING RESIST UNDERLAYER FILM AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-09-18 | — | — | US | disclosed |
| US-20140273447-A1 | COMPOSITION FOR FORMING TITANIUM-CONTAINING RESIST UNDERLAYER FILM AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-09-18 | — | — | US | disclosed |
| US-20140235796-A1 | COMPOSITION FOR FORMING RESIST UNDERLAYER FILM AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-08-21 | — | — | US | disclosed |
| US-20140193975-A1 | COMPOSITION FOR FORMING TITANIUM-CONTAINING RESIST UNDERLAYER FILM AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-07-10 | — | — | US | disclosed |
| EP-2657240-A1 | Silicon compound, silicon-containing compound, composition for forming resits underlayer film containing the same and patterning process | Shin-Etsu Chemical Co., Ltd. (JP) | 2013-10-30 | — | — | EP | disclosed |
| US-20130280912-A1 | SILICON COMPOUND, SILICON-CONTAINING COMPOUND, COMPOSITION FOR FORMING RESIST UNDERLAYER FILM CONTAINING THE SAME AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-10-24 | — | — | US | disclosed |
| US-20100086870-A1 | Composition for forming silicon-containing film, silicon-containing film-formed substrate and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-04-08 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20160053087-A1 | ULTRAVIOLET ABSORBER, COMPOSITION FOR FORMING A RESIST UNDER LAYER FILM, AND PATTERNING PROCESS | CDH1, KDM1A, DSG1 | SLC1A3 1356/4885SLC1A2 1666/4885SLC1A1 1310/4885 |
| US-20160229960-A1 | FLUORINE-CONTAINING SILICON COMPOUND, METHOD FOR PRODUCING SAME, AND METHOD FOR PRODUCING FLUORINE-CONTAINING SILICON RESIN | RFT1, FEM1B, RER1 | SLC1A3 2793/4885SLC1A2 2242/4885SLC1A1 2920/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.