SCHEMBL3284146

SCHEMBL3284146

Cc1ccc(S(=O)(=O)OC(=O)c2ccc([N+](=O)[O-])cc2)cc1

nearest known ligand 0.59

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
POLB P06746 1/20 0.58
PKM P14618 2/20 0.58
ALDH1A1 P00352 7/20 0.57
MAPT P10636 6/20 0.57
LMNA P02545 2/20 0.57
HPGD P15428 2/20 0.57
CYP1A2 P05177 1/20 0.57
CYP3A4 P08684 1/20 0.57
CYP2D6 P10635 1/20 0.57
THRB P10828 1/20 0.57
CYP2C9 P11712 1/20 0.57
CYP2C19 P33261 1/20 0.57
SMN1; SMN2 Q16637 1/20 0.57
ACHE P22303 1/20 0.53
HSD17B10 Q99714 1/20 0.53
KMT2A Q03164 4/20 0.50
GAA P10253 2/20 0.50
MEN1 O00255 2/20 0.50
MAOA P21397 1/20 0.49
MAOB P27338 1/20 0.49

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9559105 0.87 TDP1 (0.53) ALDH1A1MAPTLMNAHPGDCYP2C9
SCHEMBL27445333 0.85 CES2 (0.56) POLBALDH1A1MAPTLMNACYP2C9
SCHEMBL27639097 0.81 ALDH1A1 (0.51) ALDH1A1MAPTLMNAACHEKMT2A
SCHEMBL12275941 0.81 ACHE (0.64) POLBPKMALDH1A1MAPTLMNA
SCHEMBL11751319 0.80 ENPP3 (0.54) POLBALDH1A1MAPTLMNAKMT2A
SCHEMBL2213274 0.80 RECQL (0.53) POLBALDH1A1MAPTLMNACYP1A2
SCHEMBL2540780 0.79 PKM (0.65) POLBPKMALDH1A1MAPTLMNA
SCHEMBL28292535 0.79 POLB (0.51) POLBPKMALDH1A1MAPTLMNA
Water SCHEMBL7747510 0.78 RECQL (0.51) POLBALDH1A1MAPTLMNACYP1A2
SCHEMBL6311444 0.78 ALDH1A1 (0.55) POLBALDH1A1MAPTHPGDCYP3A4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7714079-B2 Ultra-large scale integrated (ULSI); film stack; hydrosilation INTERNATIONAL BUSINESS MACHINES CORPORAITON (US) 2010-05-11 US disclosed
US-20080063880-A1 Ultra-large scale integrated (ULSI); film stack; hydrosilation INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2008-03-13 US disclosed
US-7306853-B2 Ultra-large scale integrated interconnect structures; forming via and/or line patterns in a curable caged polysilsesquioxane, curing and filling the patterns with a conductor; combines the functions of a photoresist and a conventional low-k dielectric into a single material INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2007-12-11 US disclosed
US-20060105181-A1 Ultra-large scale integrated interconnect structures; forming via and/or line patterns in a curable caged polysilsesquioxane, curing and filling the patterns with a conductor; combines the functions of a photoresist and a conventional low-k dielectric into a single material INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2006-05-18 US disclosed
US-7041748-B2 Polysilsesquioxane has acid-sensitive imageable groups; acid generator or a crosslinking agent; crosslinkable after exposing to light; photoresists, ladder polymers; film stacks INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2006-05-09 US disclosed
US-20040137241-A1 Polysilsesquioxane has acid-sensitive imageable groups; acid generator or a crosslinking agent; crosslinkable after exposing to light; photoresists, ladder polymers; film stacks INTERNATIONAL BUSINESS MACHINES CORPORATION 2004-07-15 US disclosed
US-4008271-A Process for preparing a mixed anhydride of a sulfonic acid and a carboxylic acid ETHYL CORPORATION (US) 1977-02-15 US disclosed
US-3935216-A Preparation of toluoyl-5-pyrryl-2-acetonitrile ETHYL CORPORATION (US) 1976-01-27 US disclosed