SCHEMBL3290419

SCHEMBL3290419

Nc1ccc(S([O])(=O)=O)cc1

nearest known ligand 0.65

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TSHR P16473 4/20 0.65
LMNA P02545 2/20 0.65
HTR6 P50406 2/20 0.65
MPO P05164 1/20 0.65
CYP3A4 P08684 1/20 0.65
CYP2C9 P11712 1/20 0.65
CA2 P00918 5/20 0.62
CA9 Q16790 5/20 0.62
CA1 P00915 4/20 0.62
CA12 O43570 4/20 0.62
CA14 Q9ULX7 2/20 0.62
AGO2 Q9UKV8 2/20 0.62
CA4 P22748 2/20 0.62
TDP1 Q9NUW8 2/20 0.62
USP2 O75604 1/20 0.62
CA6 P23280 1/20 0.62
CA5A P35218 1/20 0.62
CA7 P43166 1/20 0.62
CA13 Q8N1Q1 1/20 0.62
CA5B Q9Y2D0 1/20 0.62

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Dapsone SCHEMBL5055312 0.79 HTR6 (1.00) TSHRLMNAHTR6MPOCYP3A4
Dapsone SCHEMBL21428 0.79 HTR6 (1.00) TSHRLMNAHTR6MPOCYP3A4
Dapsone SCHEMBL1219599 0.79 HTR6 (1.00) TSHRLMNAHTR6MPOCYP3A4
SCHEMBL10596934 0.79 HTR6 (1.00) TSHRLMNAHTR6MPOCYP3A4
SCHEMBL324893 0.79 HTR6 (1.00) TSHRLMNAHTR6MPOCYP3A4
Sulfanilamide SCHEMBL740 0.77 CA2 (1.00) TSHRLMNAHTR6MPOCYP3A4
Sulfanilamide SCHEMBL2798899 0.77 CA2 (1.00) TSHRLMNAHTR6MPOCYP3A4
Dapsone SCHEMBL9690514 0.77 HTR6 (0.94) TSHRLMNAHTR6MPOCYP3A4
Dapsone SCHEMBL9690505 0.77 HTR6 (0.94) TSHRLMNAHTR6MPOCYP3A4
Dapsone SCHEMBL2203636 0.77 HTR6 (0.94) TSHRLMNAHTR6MPOCYP3A4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-105849638-A Active light sensitive or radiation sensitive resin composition, active light sensitive or radiation sensitive film, mask blank provided with active light sensitive or radiation sensitive film, photomask, pattern forming method, method for manufacturing electronic device, electronic device, compound and method for producing compound 富士胶片株式会社 2016-08-10 CN disclosed
EP-1847568-B1 THERMOSETTING RESIN COMPOSITION, THERMOSETTING-RESIN MOLDING MATERIAL, AND CURED OBJECT OBTAINED THEREFROM SUMITOMO BAKELITE CO (JP) 2015-05-20 EP disclosed
US-7732646-B2 Crosslinking agent based on linear hydroxypolyallyl ether DAISO CO., LTD. (JP) 2010-06-08 US disclosed
EP-1247834-B1 CROSSLINKING AGENT BASED ON POLYALLYL ETHER COMPOUND DAISO CO LTD (JP) 2007-04-25 EP disclosed
US-20050113526-A1 Crosslinking agent based on linear hydroxypolyallyl ether OSAKA SODA CO., LTD. (JP) 2005-05-26 US disclosed
US-6835325-B1 Highly water-absorbing polymer DAISO CO., LTD. (JP) 2004-12-28 US disclosed
US-20030208022-A1 Crosslinking agent based on linear hydroxypolyallyl ether DAISO CO., LTD. (JP) 2003-11-06 US disclosed
US-20030208020-A1 Water absorbing polymer BASF AKTIENGESELLSCHAFT, A GERMAN CORPORATION (DE) 2003-11-06 US disclosed
EP-1247834-A1 CROSSLINKING AGENT BASED ON POLYALLYL ETHER COMPOUND DAISO CO., LTD. (JP) 2002-10-09 EP disclosed