Propylene Glycol

Propylene Glycol

SCHEMBL329889

CC(=O)OC(C)C.CC(O)CO.CCOCC

nearest known ligand 0.56

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

SLC5A2

The experimentally established mechanism targets of Propylene Glycol. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
TSHR P16473 4/20 0.56
TDP1 Q9NUW8 1/20 0.40
ALDH1A1 P00352 3/20 0.38
CHRM2 P08172 1/20 0.35
CHRM4 P08173 1/20 0.35
CHRM1 P11229 1/20 0.35
TBXA2R P21731 1/20 0.35
LMNA P02545 3/20 0.34
HSD17B10 Q99714 2/20 0.34
GALR3 O60755 1/20 0.34
MAPT P10636 1/20 0.34
BLM P54132 1/20 0.34
SMN1; SMN2 Q16637 1/20 0.34
PRKCA P17252 2/20 0.33
TRPV1 Q8NER1 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Propylene Glycol SCHEMBL944726 0.89 TSHR (0.70) TSHRTDP1CHRM2CHRM4CHRM1
Ether SCHEMBL2146705 0.89 TSHR (0.70) TSHRTDP1ALDH1A1CHRM2CHRM4
Ether SCHEMBL330790 0.88 TSHR (0.61) TSHRTDP1ALDH1A1CHRM2CHRM4
Propylene Glycol SCHEMBL701829 0.85 TSHR (0.41) TSHRTDP1ALDH1A1CHRM2CHRM4
Propylene Glycol SCHEMBL140963 0.83 ALDH1A1 (0.43) TSHRTDP1ALDH1A1LMNAHSD17B10
Propylene Glycol SCHEMBL186272 0.83 ALDH1A1 (0.43) TSHRTDP1ALDH1A1LMNAHSD17B10
Propylene Glycol SCHEMBL151562 0.83 TDP1 (0.48) TSHRTDP1ALDH1A1LMNAHSD17B10
Propylene Glycol SCHEMBL28710964 0.83 TDP1 (0.48) TSHRTDP1ALDH1A1LMNAHSD17B10
Di(Hydroxyethyl)Ether SCHEMBL597204 0.82 TSHR (0.54) TSHRALDH1A1CHRM2CHRM4CHRM1
Ethyl Acetate SCHEMBL65476 0.82 ALDH1A1 (0.58) TSHRTDP1ALDH1A1CHRM2CHRM4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 282 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-110874025-B Diluent composition, substrate processing method and semiconductor element manufacturing method 易案爱富科技有限公司 2024-05-24 CN claimed
US-11220659-B2 Thinner composition ENF TECHNOLOGY CO., LTD. (KR) 2022-01-11 US claimed
CN-110874025-A Thinner composition, substrate processing method and semiconductor device manufacturing method 易案爱富科技有限公司 2020-03-10 CN claimed
US-20200071640-A1 THINNER COMPOSITION ENF TECHNOLOGY CO., LTD. (KR) 2020-03-05 US claimed
EP-2404940-B1 Method for producing polymer composition and polymer composition INCTEC INC (JP) 2014-12-24 EP claimed
EP-2404940-A1 Method for producing polymer composition and polymer composition The Inctec Inc. (JP) 2012-01-11 EP claimed
US-20070193960-A1 Process for recovering organic compounds from aqueous streams containing same DOW GLOBAL TECHNOLOGIES INC. 2007-08-23 US claimed
EP-1720814-A2 PROCESS FOR RECOVERING ORGANIC COMPOUNDS FROM AQUEOUS STREAMS CONTAINING SAME The Dow Global Technologies Inc. (US) 2006-11-15 EP claimed
WO-2005087692-A2 PROCESS FOR RECOVERING ORGANIC COMPOUNDS FROM AQUEOUS STREAMS CONTAINING SAME DOW GLOBAL TECHNOLOGIES INC. (US) 2005-09-22 WO claimed
US-20250090668-A1 GLYCOL COMPOSITIONS INCLUDING TOCOPHEROLS DOW GLOBAL TECHNOLOGIES LLC (US) 2025-03-20 US disclosed
US-20240409714-A1 GLYCOL COMPOSITIONS COMPRISING CHELANTS DOW GLOBAL TECHNOLOGIES LLC (US) 2024-12-12 US disclosed
EP-4430152-A1 GLYCOL COMPOSITIONS COMPRISING CHELANTS Dow Global Technologies LLC (US) 2024-09-18 EP disclosed
CN-118510877-A Cleaning composition for pretreatment of metal substrates, method for the production thereof and use thereof 巴斯夫涂料有限公司 2024-08-16 CN disclosed
CN-118382663-A Glycol composition comprising tocopherol 陶氏环球技术有限责任公司 2024-07-23 CN disclosed
US-5380612-A Forming electrophotographic latent image on photoconductive layer of photosensitive planographic plate, developing to form toner image, uniformly exposing photoconductor to actinic light, removing photoconductive layer with no toner image KONICA CORPORATION (JP) 1995-01-10 US disclosed
US-5266443-A Presensitized plates for lithography not requiring dampening with water FUJI PHOTO FILM CO., LTD. (JP) 1993-11-30 US disclosed
EP-0510646-A1 Presensitized plates for use in making lithographic printing plates not requiring dampening with water FUJI PHOTO FILM CO., LTD. (JP) 1992-10-28 EP disclosed
EP-0500951-A1 HALOGEN-FREE DETERGENT COMPOSITION NEW JAPAN CHEMICAL CO.,LTD. (JP) 1992-09-02 EP disclosed
EP-0466070-A2 Presensitized plates for use in making lithographic printing plates not requiring dampening with water Fuji Photo Film Co., Ltd. (JP) 1992-01-15 EP disclosed
US-4186122-A POLYESTER-AMIDE-IMIDE COPOLYMERS HITACHI CHEMICAL COMPANY, LTD. (JP) 1980-01-29 US disclosed