Predicted protein targets (top 2)
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1595408 | 0.84 | L3MBTL1 (0.37) | L3MBTL1 | |
| SCHEMBL5160078 | 0.78 | L3MBTL1 (0.31) | L3MBTL1 | |
| SCHEMBL27499988 | 0.74 | RIPK1 (0.34) | — | |
| SCHEMBL7181265 | 0.69 | ALDH1A1 (0.32) | L3MBTL1 | |
| SCHEMBL26131294 | 0.68 | CA12 (0.38) | L3MBTL1 | |
| SCHEMBL15136351 | 0.67 | L3MBTL1 (0.31) | L3MBTL1 | |
| SCHEMBL9958586 | 0.67 | L3MBTL1 (0.31) | L3MBTL1 | |
| SCHEMBL28819293 | 0.67 | GPR52 (0.39) | L3MBTL1GPR52 | |
| SCHEMBL7185625 | 0.65 | RORC (0.37) | — | |
| SCHEMBL27988641 | 0.65 | L3MBTL1 (0.30) | L3MBTL1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20100112474-A1 | PHOTOSENSITIVE COMPOSITION, PHOTOSENSITIVE FILM, METHOD FOR FORMING A PERMANENT PATTERN, AND PRINTED BOARD | FUJIFILM CORPORATION (JP) | 2010-05-06 | — | — | US | disclosed |
| US-20080268374-A1 | Photosensitive Composition, Pattern Forming Material, Photosensitive Laminate, Pattern Forming Apparatus, and Pattern Forming Process | FUJIFILM CORPORATION (JP) | 2008-10-30 | — | — | US | disclosed |
| US-20080118867-A1 | Pattern Forming Material, Pattern Forming Apparatus, And Pattern Forming Process | ASAHI KASEI E-MATERIALS CORPORATION (JP) | 2008-05-22 | — | — | US | disclosed |
| US-20080113302-A1 | Pattern Forming Process | FUJIFILM CORPORATION (JP) | 2008-05-15 | — | — | US | disclosed |
| EP-1780599-A1 | PHOTOSENSITIVE COMPOSITION, PATTERN FORMING MATERIAL, PHOTOSENSITIVE LAMINATE, PATTERN FORMING APPARATUS AND METHOD OF PATTERN FORMATION | FUJIFILM Corporation (JP) | 2007-05-02 | — | — | EP | disclosed |
| WO-2006004171-A1 | PHOTOSENSITIVE FILM, PROCESS FOR PRODUCING THE SAME, PROCESS FOR FORMING PERMANENT PATTERN | FUJI PHOTO FILM CO., LTD. (JP) | 2006-01-12 | — | — | WO | disclosed |
| WO-2005109098-A1 | PATTERN FORMING MATERIAL, PATTERN FORMING APPARATUS, AND PATTERN FORMING PROCESS | FUJI PHOTO FILM CO., LTD. (JP) | 2005-11-17 | — | — | WO | disclosed |
| WO-2005093515-A1 | PHOTOSENSITIVE COMPOSITION, PHOTOSENSITIVE FILM, AND PERMANENT PATTERN AND PROCESS FOR FORMING THE SAME | FUJI PHOTO FILM CO., LTD. (JP) | 2005-10-06 | — | — | WO | disclosed |
| WO-2005093793-A1 | PROCESS FOR FORMING PERMANENT PATTERN | FUJI PHOTO FILM CO., LTD. (JP) | 2005-10-06 | — | — | WO | disclosed |
| WO-2005091078-A1 | PATTERN FORMING PROCESS AND PATTERN | FUJI PHOTO FILM CO., LTD. (JP) | 2005-09-29 | — | — | WO | disclosed |
| WO-2005083522-A1 | PATTERN FORMING PROCESS | FUJI PHOTO FILM CO., LTD. (JP) | 2005-09-09 | — | — | WO | disclosed |
| WO-2005078776-A1 | PATTERN FORMING PROCESS | FUJI PHOTO FILM CO., LTD. (JP) | 2005-08-25 | — | — | WO | disclosed |