Predicted protein targets (top 8)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SHBG | P04278 | 1/20 | 0.39 |
| ▸ | EPHX1 | P07099 | 2/20 | 0.33 |
| ▸ | CA12 | O43570 | 2/20 | 0.31 |
| ▸ | CA1 | P00915 | 2/20 | 0.31 |
| ▸ | CA2 | P00918 | 2/20 | 0.31 |
| ▸ | MMP2 | P08253 | 2/20 | 0.31 |
| ▸ | CA9 | Q16790 | 2/20 | 0.31 |
| ▸ | TP53 | P04637 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10437743 | 0.97 | SHBG (0.43) | SHBGEPHX1CA12CA1CA2 | |
| SCHEMBL3313525 | 0.97 | SHBG (0.43) | SHBGEPHX1CA12CA1CA2 | |
| SCHEMBL8160857 | 0.93 | SHBG (0.33) | SHBG | |
| SCHEMBL24722747 | 0.90 | SHBG (0.38) | SHBGEPHX1CA12CA1CA2 | |
| SCHEMBL16590946 | 0.88 | SHBG (0.42) | SHBGEPHX1CA12CA1CA2 | |
| SCHEMBL8168179 | 0.86 | — | — | |
| SCHEMBL17789899 | 0.83 | SHBG (0.33) | SHBGCA12CA1CA2MMP2 | |
| SCHEMBL4593053 | 0.81 | SHBG (0.37) | SHBGEPHX1CA12CA1CA2 | |
| SCHEMBL17789938 | 0.81 | SHBG (0.37) | SHBGEPHX1CA12CA1CA2 | |
| SCHEMBL6366987 | 0.78 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 82 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12631966-B2 | Method for forming photoresist patterns | SAMSUNG SDI CO., LTD. (KR) | 2026-05-19 | — | — | US | claimed |
| US-12590221-B2 | Resist topcoat composition, and method of forming patterns using the composition | SAMSUNG SDI CO., LTD. (KR) | 2026-03-31 | — | — | US | claimed |
| US-12554199-B2 | Resist topcoat composition, and method of forming patterns using the composition | SAMSUNG SDI CO., LTD. (KR) | 2026-02-17 | — | — | US | claimed |
| US-20230026721-A1 | RESIST TOPCOAT COMPOSITION, AND METHOD OF FORMING PATTERNS USING THE COMPOSITION | SAMSUNG SDI CO., LTD. (KR) | 2023-01-26 | — | — | US | claimed |
| US-20230021469-A1 | RESIST TOPCOAT COMPOSITION, AND METHOD OF FORMING PATTERNS USING THE COMPOSITION | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2023-01-26 | — | — | US | claimed |
| US-20230024422-A1 | RESIST TOPCOAT COMPOSITION, AND METHOD OF FORMING PATTERNS USING THE COMPOSITION | SAMSUNG SDI CO., LTD. (KR) | 2023-01-26 | — | — | US | claimed |
| US-20230026579-A1 | METHOD FOR FORMING PHOTORESIST PATTERNS | SAMSUNG SDI CO., LTD. (KR) | 2023-01-26 | — | — | US | claimed |
| US-20230028244-A1 | RESIST TOPCOAT COMPOSITION, AND METHOD OF FORMING PATTERNS USING THE COMPOSITION | SAMSUNG SDI CO., LTD. (KR) | 2023-01-26 | — | — | US | claimed |
| US-12631966-B2 | Method for forming photoresist patterns | SAMSUNG SDI CO., LTD. (KR) | 2026-05-19 | — | — | US | disclosed |
| US-12590221-B2 | Resist topcoat composition, and method of forming patterns using the composition | SAMSUNG SDI CO., LTD. (KR) | 2026-03-31 | — | — | US | disclosed |
| US-20260050212-A1 | RESIST TOPCOAT COMPOSITION AND METHOD OF FORMING PATTERNS USING THE COMPOSITION | SAMSUNG SDI CO LTD (KR) | 2026-02-19 | — | — | US | disclosed |
| US-12554199-B2 | Resist topcoat composition, and method of forming patterns using the composition | SAMSUNG SDI CO., LTD. (KR) | 2026-02-17 | — | — | US | disclosed |
| US-20260036906-A1 | RESIST TOPCOAT COMPOSITION AND METHOD OF FORMING PATTERNS USING THE COMPOSITION | SAMSUNG SDI CO LTD (KR) | 2026-02-05 | — | — | US | disclosed |
| US-20260003286-A1 | RESIST TOPCOAT COMPOSITION AND METHOD OF FORMING PATTERNS USING THE COMPOSITION | SAMSUNG SDI CO LTD (KR) | 2026-01-01 | — | — | US | disclosed |
| US-6037477-A | CONTACTING AN ETHER WITH OXYGEN IN THE PRESENCE OF AN OXIDATION CATALYST TO PRODUCE ESTER OR ANHYDRIDE | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2000-03-14 | — | — | US | disclosed |
| EP-0878458-A1 | Oxidation process of ethers | Daicel Chemical Industries, Ltd. (JP) | 1998-11-18 | — | — | EP | disclosed |
| US-5520710-A | Cleaner burning and cetane enhancing diesel fuel supplements | Olah, George A. (US) | 1996-05-28 | — | — | US | disclosed |
| EP-0284005-B1 | METHOD OF PRODUCTION OF POLYOLEFINS | IDEMITSU PETROCHEMICAL CO. LTD. (JP) | 1991-12-18 | — | — | EP | disclosed |
| US-4981930-A | POLYMERIZATION CATALYSTS | IDEMITSU PETROCHEMICAL COMPANY LIMITED (JP) | 1991-01-01 | — | — | US | disclosed |
| EP-0284005-A2 | Method of production of polyolefins | IDEMITSU PETROCHEMICAL CO. LTD. (JP) | 1988-09-28 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (8 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20230024422-A1 | RESIST TOPCOAT COMPOSITION, AND METHOD OF FORMING PATTERNS USING THE COMPOSITION | TOP1, TOP2A, FTO | SHBG 1843/4885EPHX1 1030/4885CA12 1436/4885 |
| US-12631966-B2 | Method for forming photoresist patterns | FTO, SOAT1, SOAT2 | SHBG 3131/4885EPHX1 1589/4885CA12 439/4885 |
| US-12554199-B2 | Resist topcoat composition, and method of forming patterns using the composition | FGFR2, FGFR1, FDFT1 | SHBG 2684/4885EPHX1 2868/4885CA12 1287/4885 |
| US-20260036906-A1 | RESIST TOPCOAT COMPOSITION AND METHOD OF FORMING PATTERNS USING THE COMPOSITION | CPT1A, RER1, CPT1B | SHBG 906/4885EPHX1 2600/4885CA12 1911/4885 |
| US-20260003286-A1 | RESIST TOPCOAT COMPOSITION AND METHOD OF FORMING PATTERNS USING THE COMPOSITION | RER1, CPT1A, SOAT1 | SHBG 561/4885EPHX1 2463/4885CA12 1341/4885 |
| US-20230021469-A1 | RESIST TOPCOAT COMPOSITION, AND METHOD OF FORMING PATTERNS USING THE COMPOSITION | COL2A1, TOP1, TOP2A | SHBG 1908/4885EPHX1 2043/4885CA12 601/4885 |
| US-12590221-B2 | Resist topcoat composition, and method of forming patterns using the composition | RER1, TOP1, RRS1 | SHBG 1213/4885EPHX1 1015/4885CA12 1549/4885 |
| US-20260050212-A1 | RESIST TOPCOAT COMPOSITION AND METHOD OF FORMING PATTERNS USING THE COMPOSITION | CPT1A, COL1A1, RCOR1 | SHBG 954/4885EPHX1 3161/4885CA12 1333/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.