Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | APP | P05067 | 3/20 | 0.43 |
| ▸ | PTPN1 | P18031 | 1/20 | 0.39 |
| ▸ | STAT3 | P40763 | 1/20 | 0.38 |
| ▸ | HSD11B1 | P28845 | 1/20 | 0.37 |
| ▸ | KDM4E | B2RXH2 | 4/20 | 0.37 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.37 |
| ▸ | MAPT | P10636 | 3/20 | 0.37 |
| ▸ | KMT2A | Q03164 | 4/20 | 0.36 |
| ▸ | MEN1 | O00255 | 3/20 | 0.36 |
| ▸ | TNK2 | Q07912 | 2/20 | 0.35 |
| ▸ | CA12 | O43570 | 2/20 | 0.34 |
| ▸ | CA1 | P00915 | 2/20 | 0.34 |
| ▸ | CA2 | P00918 | 2/20 | 0.34 |
| ▸ | CA3 | P07451 | 2/20 | 0.34 |
| ▸ | CA4 | P22748 | 2/20 | 0.34 |
| ▸ | CA6 | P23280 | 2/20 | 0.34 |
| ▸ | CA5A | P35218 | 2/20 | 0.34 |
| ▸ | CA7 | P43166 | 2/20 | 0.34 |
| ▸ | CA9 | Q16790 | 2/20 | 0.34 |
| ▸ | CA13 | Q8N1Q1 | 2/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL15093765 | 0.88 | MEN1 (0.43) | PTPN1HSD11B1ALDH1A1KMT2AMEN1 | |
| SCHEMBL15093959 | 0.88 | MEN1 (0.43) | PTPN1HSD11B1ALDH1A1KMT2AMEN1 | |
| SCHEMBL222919 | 0.88 | MEN1 (0.43) | PTPN1HSD11B1ALDH1A1KMT2AMEN1 | |
| 4-Vinylphenol SCHEMBL8767532 | 0.86 | PTPN1 (0.41) | PTPN1HSD11B1KDM4EALDH1A1KMT2A | |
| SCHEMBL9712487 | 0.85 | MEN1 (0.39) | PTPN1HSD11B1KDM4EALDH1A1KMT2A | |
| SCHEMBL7285052 | 0.84 | ALDH1A1 (0.42) | HSD11B1KDM4EALDH1A1MAPTKMT2A | |
| SCHEMBL7285049 | 0.84 | ALDH1A1 (0.42) | HSD11B1KDM4EALDH1A1MAPTKMT2A | |
| SCHEMBL3842585 | 0.84 | PTPN1 (0.39) | APPPTPN1STAT3HSD11B1KDM4E | |
| SCHEMBL217929 | 0.84 | TNK2 (0.43) | PTPN1HSD11B1ALDH1A1KMT2AMEN1 | |
| SCHEMBL7155013 | 0.83 | ALDH1A1 (0.41) | PTPN1HSD11B1KDM4EALDH1A1MAPT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 23 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20100136477-A1 | Photosensitive Composition | AZ ELECTRONIC MATERIALS USA CORP. | 2010-06-03 | — | — | US | disclosed |
| EP-2111567-A2 | PHOTORESIST COMPOSITION | AZ Electronic Materials USA Corp. (US) | 2009-10-28 | — | — | EP | disclosed |
| WO-2008096263-A2 | PHOTORESIST COMPOSITION | AZ ELECTRONIC MATERIALS USA CORP. (DE) | 2008-08-14 | — | — | WO | disclosed |
| US-20080187868-A1 | Photoactive Compounds | AZ ELECTRONIC MATERIALS USA CORP. | 2008-08-07 | — | — | US | disclosed |
| EP-1314725-B1 | SULFONIUM SALT COMPOUND | WAKO PURE CHEM IND LTD (JP) | 2008-03-19 | — | — | EP | disclosed |
| US-6924323-B2 | Sulfonium salt compound | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 2005-08-02 | — | — | US | disclosed |
| US-20040033434-A1 | Sulfonium salt compound | FUJIFILM WAKO PURE CHEMICAL CORPORATION (JP) | 2004-02-19 | — | — | US | disclosed |
| EP-1314725-A1 | SULFONIUM SALT COMPOUND | Wako Pure Chemical Industries, Ltd. (JP) | 2003-05-28 | — | — | EP | disclosed |
| US-6358665-B1 | ONIUM SALT PRECURSOR FOR GENERATING FLUOROALKYLSULFONATE | CLARIANT INTERNATIONAL LTD. (CH) | 2002-03-19 | — | — | US | disclosed |
| EP-0814381-B1 | Positive image forming composition | FUJI PHOTO FILM CO LTD (JP) | 2001-09-19 | — | — | EP | disclosed |
| US-5731123-A | SULFONIMIDE AND ACID GENERATING COMPOUNDS | FUJI PHOTO FILM CO., LTD. (JP) | 1998-03-24 | — | — | US | disclosed |
| EP-0819982-A1 | Radiation-sensitive composition | Olin Microelectronic Chemicals, Inc. (US) | 1998-01-21 | — | — | EP | disclosed |
| US-5707776-A | PHOTORESISTS FOR MANUFACTURE OF INTEGRATED CIRCUITS, SENSITIVE TO EXCIMER LASER RADIATION, BLOCK POLYMERS OF PHENOLIC RESINS AND DICYCLOPENTADIENE MODIFIED PHENOLIC RESINS | FUJI PHOTO FILM CO., LTD. (JP) | 1998-01-13 | — | — | US | disclosed |
| EP-0814381-A1 | Positive image forming composition | FUJI PHOTO FILM CO., LTD. (JP) | 1997-12-29 | — | — | EP | disclosed |
| US-5658711-A | FORMING RESIST FILM CONTAINING BASE GENERATOR, GENERATING BASE BY RADIATION, FORMING METAL OXIDE FILM, ETCHING | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) | 1997-08-19 | — | — | US | disclosed |
| EP-0440374-B1 | Chemical amplified resist material | WAKO PURE CHEM IND LTD (JP) | 1997-04-16 | — | — | EP | disclosed |
| EP-0691674-A2 | Method of forming micropatterns | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) | 1996-01-10 | — | — | EP | disclosed |
| US-5350660-A | Chemical amplified resist material containing photosensitive compound capable of generating an acid and specific polystyrene copolymer having functional groups that become alkali-soluble under an acid atmosphere | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 1994-09-27 | — | — | US | disclosed |
| EP-0595361-A2 | Method of forming micropatterns | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) | 1994-05-04 | — | — | EP | disclosed |
| EP-0440374-A2 | Chemical amplified resist material | WAKO PURE CHEMICAL INDUSTRIES LTD (JP) | 1991-08-07 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20040033434-A1 | Sulfonium salt compound | SPIN1, RER1, SPIN2B | APP 3069/4885PTPN1 6/4885STAT3 2127/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.