Predicted protein targets (top 7)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ATM | Q13315 | 1/20 | 0.34 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.34 |
| ▸ | TSHR | P16473 | 2/20 | 0.33 |
| ▸ | MPO | P05164 | 1/20 | 0.31 |
| ▸ | SLC6A4 | P31645 | 1/20 | 0.31 |
| ▸ | CYP4F2 | P78329 | 1/20 | 0.30 |
| ▸ | CYP4A11 | Q02928 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6666783 | 0.91 | MEN1 (0.34) | TSHR | |
| SCHEMBL1144164 | 0.84 | ATM (0.36) | ATML3MBTL1TSHRMPOSLC6A4 | |
| SCHEMBL3481842 | 0.82 | LIPG (0.40) | CYP4F2CYP4A11 | |
| SCHEMBL28537235 | 0.80 | CYP4F2 (0.38) | CYP4F2CYP4A11 | |
| SCHEMBL1069351 | 0.80 | TAAR1 (0.36) | CYP4F2CYP4A11 | |
| SCHEMBL28546603 | 0.80 | CYP4F2 (0.32) | CYP4F2CYP4A11 | |
| SCHEMBL3482683 | 0.79 | ADRA2A (0.33) | L3MBTL1SLC6A4CYP4F2CYP4A11 | |
| SCHEMBL7533066 | 0.78 | MAOA (0.39) | MPOSLC6A4CYP4F2CYP4A11 | |
| SCHEMBL1345730 | 0.76 | ATM (0.38) | ATML3MBTL1TSHRMPOSLC6A4 | |
| SCHEMBL21084618 | 0.75 | GABRA1 (0.32) | CYP4F2CYP4A11 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8968458-B2 | Composition for resist underlayer film and process for producing same | JSR CORPORATION (JP) | 2015-03-03 | — | — | US | disclosed |
| US-8808446-B2 | Composition for resist underlayer film and process for producing same | JSR CORPORATION (JP) | 2014-08-19 | — | — | US | disclosed |
| US-20100151384-A1 | COMPOSITION FOR RESIST UNDERLAYER FILM AND PROCESS FOR PRODUCING SAME | JSR CORPORATION (JP) | 2010-06-17 | — | — | US | disclosed |
| US-20090050020-A1 | COMPOSITION FOR RESIST UNDERLAYER FILM AND PROCESS FOR PRODUCING SAME | JSR CORPORATION (JP) | 2009-02-26 | — | — | US | disclosed |
| EP-1855159-A1 | COMPOSITION FOR UNDERLAYER FILM OF RESIST AND PROCESS FOR PRODUCING THE SAME | JSR Corporation (JP) | 2007-11-14 | — | — | EP | disclosed |