Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 10/20 | 0.68 |
| ▸ | CA12 | O43570 | 6/20 | 0.68 |
| ▸ | CA9 | Q16790 | 6/20 | 0.68 |
| ▸ | CA1 | P00915 | 4/20 | 0.68 |
| ▸ | LMNA | P02545 | 2/20 | 0.68 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.68 |
| ▸ | CA4 | P22748 | 1/20 | 0.64 |
| ▸ | KDM4E | B2RXH2 | 9/20 | 0.60 |
| ▸ | GAA | P10253 | 6/20 | 0.60 |
| ▸ | HPGD | P15428 | 6/20 | 0.60 |
| ▸ | GLA | P06280 | 5/20 | 0.60 |
| ▸ | HSD17B10 | Q99714 | 5/20 | 0.60 |
| ▸ | CASP1 | P29466 | 2/20 | 0.60 |
| ▸ | CASP7 | P55210 | 2/20 | 0.60 |
| ▸ | MAOB | P27338 | 2/20 | 0.60 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.60 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.60 |
| ▸ | AKR1B1 | P15121 | 1/20 | 0.60 |
| ▸ | UGT1A1 | P22309 | 1/20 | 0.60 |
| ▸ | KDR | P35968 | 1/20 | 0.60 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29176757 | 0.92 | ALDH1A1 (0.59) | ALDH1A1CA12CA9CA1LMNA | |
| SCHEMBL16266302 | 0.85 | ALDH1A1 (0.66) | ALDH1A1CA12CA9CA1LMNA | |
| SCHEMBL16316724 | 0.85 | ALDH1A1 (0.66) | ALDH1A1CA12CA9CA1LMNA | |
| SCHEMBL19026763 | 0.84 | CA12 (0.70) | ALDH1A1CA12CA9CA1LMNA | |
| Hydrochloric Acid SCHEMBL25373064 | 0.83 | ALDH1A1 (0.64) | ALDH1A1CA12CA9CA1LMNA | |
| SCHEMBL20870224 | 0.83 | ALDH1A1 (0.64) | ALDH1A1CA12CA9CA1LMNA | |
| SCHEMBL10134019 | 0.82 | ALDH1A1 (0.62) | ALDH1A1CA12CA9CA1LMNA | |
| SCHEMBL1034943 | 0.82 | CA12 (0.72) | ALDH1A1CA12CA9CA1LMNA | |
| SCHEMBL19022033 | 0.82 | ALDH1A1 (0.62) | ALDH1A1CA12CA9CA1LMNA | |
| SCHEMBL29673209 | 0.82 | CA12 (0.72) | ALDH1A1CA12CA9CA1LMNA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 89 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20260124209-A1 | INHIBITORS OF HUMAN IMMUNODEFICIENCY VIRUS REPLICATION | VIIV Healthcare UK (No.5) Limited (GB) | 2026-05-07 | — | — | US | claimed |
| US-20250249005-A1 | INHIBITORS OF HUMAN IMMUNODEFICIENCY VIRUS REPLICATION | VIIV Healthcare UK (No.5) Limited (GB) | 2025-08-07 | — | — | US | claimed |
| CN-102662306-B | The manufacture method of photosensitive element, corrosion-resisting pattern formation method and printed circuit board (PCB) | HITACHI CHEMICAL CO., LTD. (JP) | 2015-11-25 | — | — | CN | claimed |
| CN-101421671-B | Photosensitive element, method for forming resist pattern, and method for manufacturing printed wiring board | HITACHI CHEMICAL CO LTD | 2012-05-30 | — | — | CN | claimed |
| US-20260124209-A1 | INHIBITORS OF HUMAN IMMUNODEFICIENCY VIRUS REPLICATION | VIIV Healthcare UK (No.5) Limited (GB) | 2026-05-07 | — | — | US | disclosed |
| US-12594276-B2 | Inhibitors of human immunodeficiency virus replication | VIIV HEALTHCARE UK (NO. 5) LIMITED (GB) | 2026-04-07 | — | — | US | disclosed |
| US-20250278024-A1 | PHOTOSENSITIVE ELEMENT, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR MANUFACTURING PRINTED WIRING BOARD | RESONAC CORPORATION (JP) | 2025-09-04 | — | — | US | disclosed |
| US-20250249005-A1 | INHIBITORS OF HUMAN IMMUNODEFICIENCY VIRUS REPLICATION | VIIV Healthcare UK (No.5) Limited (GB) | 2025-08-07 | — | — | US | disclosed |
| CN-120202439-A | Photosensitive element, method for forming resist pattern, and method for manufacturing printed wiring board | 株式会社力森诺科 | 2025-06-24 | — | — | CN | disclosed |
| CN-119739005-A | Photosensitive resin composition, photosensitive resin film, method for producing cured product, laminate, and electronic device | 株式会社力森诺科 | 2025-04-01 | — | — | CN | disclosed |
| CN-119395945-A | Photosensitive resin composition, photosensitive element, method for producing wiring board, and photosensitive element roll | 株式会社力森诺科 | 2025-02-07 | — | — | CN | disclosed |
| CN-117736168-B | Small molecular fluorescent probe for detecting nitric oxide and application thereof | 北京大学深圳研究生院 | 2025-01-28 | — | — | CN | disclosed |
| CN-1639641-A | Photosensitive resin composition, process for forming photosensitive elements or resist patterns with the same, and process for production of printed wiring boards | HITACHI CHEMICAL CO LTD (JP) | 2005-07-13 | — | — | CN | disclosed |
| CN-1209685-C | Photosensitive resin composition, photosensitive element using the same, method for producing protective layer pattern, and method for producing printed wiring board | HITACHI CHEMICAL CO LTD (JP) | 2005-07-06 | — | — | CN | disclosed |
| US-20050143272-A1 | Laundry detergent composition having granular cyclodextrin for removing malodor from laundered items and process for making & using same | ANGELL ADRIAN J W (US) | 2005-06-30 | — | — | US | disclosed |
| US-20040038149-A1 | Photosensitive resin composition, photosensitive element comprising the same, method for producing resist pattern, and method for producing printed wiring board | HITACHI CHEMICAL CO., LTD. (JP) | 2004-02-26 | — | — | US | disclosed |
| CN-1418329-A | Photosensitive resin composition, photosensitive element using the same, method for producing protective layer pattern, and method for producing printed wiring board | HITACHI CHEMICAL CO LTD (JP) | 2003-05-14 | — | — | CN | disclosed |
| EP-1282010-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT COMPRISING THE SAME, METHOD FOR PRODUCING RESIST PATTERN, AND METHOD FOR PRODUCING PRINTED WIRING BOARD | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2003-02-05 | — | — | EP | disclosed |
| US-4309353-A | ANTI-ALLERGIC AGENTS | CIBA-GEIGY CORPORATION (US) | 1982-01-05 | — | — | US | disclosed |
| US-4205082-A | ANTI-ALLERGIC AGENTS | CIBA-GEIGY CORPORATION (US) | 1980-05-27 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-12594276-B2 | Inhibitors of human immunodeficiency virus replication | SAMHD1, IRF3, SLC34A1 | ALDH1A1 3488/4885CA12 4408/4885CA9 3083/4885 |
| US-20260124209-A1 | INHIBITORS OF HUMAN IMMUNODEFICIENCY VIRUS REPLICATION | ZC3HAV1, GTF3C1, ODC1 | ALDH1A1 759/4885CA12 4521/4885CA9 3868/4885 |
| US-20250249005-A1 | INHIBITORS OF HUMAN IMMUNODEFICIENCY VIRUS REPLICATION | EIF2AK2, REV1, RTF2 | ALDH1A1 3189/4885CA12 4765/4885CA9 4255/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.