Predicted protein targets (top 5)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KDM4E | B2RXH2 | 6/20 | 0.33 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.33 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.33 |
| ▸ | POLB | P06746 | 1/20 | 0.31 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3367438 | 0.87 | KDM4E (0.33) | KDM4EALDH1A1TDP1POLBALOX15 | |
| SCHEMBL24355008 | 0.85 | KDM4E (0.34) | KDM4EALDH1A1TDP1POLBALOX15 | |
| SCHEMBL3363142 | 0.85 | KDM4E (0.35) | KDM4EALDH1A1TDP1POLBALOX15 | |
| SCHEMBL12460485 | 0.84 | KDM4E (0.32) | KDM4EALDH1A1TDP1POLBALOX15 | |
| SCHEMBL6423573 | 0.83 | KDM4E (0.38) | KDM4EALDH1A1TDP1POLBALOX15 | |
| SCHEMBL14595021 | 0.80 | — | — | |
| SCHEMBL4271968 | 0.77 | KDM4E (0.37) | KDM4EALDH1A1TDP1POLBALOX15 | |
| SCHEMBL13743053 | 0.77 | KDM4E (0.35) | KDM4EALDH1A1TDP1 | |
| SCHEMBL3362486 | 0.77 | KDM4E (0.38) | KDM4EALDH1A1TDP1POLBALOX15 | |
| SCHEMBL7146563 | 0.76 | KDM4E (0.36) | KDM4EALDH1A1TDP1POLBALOX15 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 21 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20220128906-A1 | PHOTORESIST PATTERN TRIMMING COMPOSITIONS AND METHODS OF TRIMMING PHOTORESIST PATTERNS | DUPONT ELECTRONIC MATERIALS INTERNATIONAL, LLC | 2022-04-28 | — | — | US | disclosed |
| US-8470944-B2 | Polynorbornene pervaporation membrane films, preparation and use thereof | PROMERUS, LLC (US) | 2013-06-25 | — | — | US | disclosed |
| US-20120283404-A1 | Polynorbornene Pervaporation Membrane Films, Preparation and Use Thereof | PROMERUS LLC (US) | 2012-11-08 | — | — | US | disclosed |
| EP-1164434-B1 | Radiation-sensitive resin composition | JSR CORP (JP) | 2010-10-06 | — | — | EP | disclosed |
| US-7202011-B2 | Photosensitive polymer including fluorine and resist composition containing the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2007-04-10 | — | — | US | disclosed |
| US-7202011-B2 | Photosensitive polymer including fluorine and resist composition containing the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2007-04-10 | — | — | US | disclosed |
| US-7202016-B2 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2007-04-10 | — | — | US | disclosed |
| US-6964840-B2 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2005-11-15 | — | — | US | disclosed |
| US-6962768-B2 | Ether monomers and polymers having multi-ring structures, and photosensitive polymers and resist compositions obtained from the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2005-11-08 | — | — | US | disclosed |
| US-20050214680-A1 | Radiation-sensitive resin composition | MIYAJI MASAAKI | 2005-09-29 | — | — | US | disclosed |
| US-20040241580-A1 | Radiation-sensitive resin composition | NISHIMURA YUKIO (JP) | 2004-12-02 | — | — | US | disclosed |
| US-6800414-B2 | FLUOROPOLYMER | JSR CORPORATION (JP) | 2004-10-05 | — | — | US | disclosed |
| US-20040170919-A1 | Ether monomers and polymers having multi-ring structures, and photosensitive polymers and resist compositions obtained from the same | SAMSUNG ELECTRONICS CO. LTD. (KR) | 2004-09-02 | — | — | US | disclosed |
| US-6623907-B2 | Chemical amplified photoresist | JSR CORPORATION (JP) | 2003-09-23 | — | — | US | disclosed |
| US-20020058201-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2002-05-16 | — | — | US | disclosed |
| EP-1193558-A2 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2002-04-03 | — | — | EP | disclosed |
| US-20020009668-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2002-01-24 | — | — | US | disclosed |
| EP-1164434-A2 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2001-12-19 | — | — | EP | disclosed |
| US-20010023050-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2001-09-20 | — | — | US | disclosed |
| EP-1122605-A2 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2001-08-08 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20040170919-A1 | Ether monomers and polymers having multi-ring structures, and photosensitive polymers and resist compositions obtained from the same | EEF1D, MACF1, YTHDF2 | KDM4E 51/4885ALDH1A1 1539/4885TDP1 2089/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.