Predicted protein targets (top 9)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KCNJ11 | Q14654 | 1/20 | 0.33 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.31 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.31 |
| ▸ | LMNA | P02545 | 1/20 | 0.31 |
| ▸ | GAA | P10253 | 1/20 | 0.31 |
| ▸ | MAPT | P10636 | 1/20 | 0.31 |
| ▸ | GALK1 | P51570 | 1/20 | 0.31 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.31 |
| ▸ | TLR2 | O60603 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Trifluoromethanesulfonic Acid SCHEMBL6838193 | 0.91 | HCRTR1 (0.33) | ALDH1A1LMNA | |
| SCHEMBL3367881 | 0.91 | KCNJ11 (0.32) | KCNJ11 | |
| Trifluoromethanesulfonic Acid SCHEMBL2745482 | 0.88 | MEN1 (0.32) | — | |
| Trifluoromethanesulfonic Acid SCHEMBL2745117 | 0.87 | ALDH1A1 (0.38) | KDM4EALDH1A1MAPTNPSR1 | |
| Trifluoromethanesulfonic Acid SCHEMBL3367466 | 0.85 | ALDH1A1 (0.32) | ALDH1A1 | |
| Trifluoromethanesulfonic Acid SCHEMBL6562885 | 0.84 | CYP2C19 (0.31) | — | |
| SCHEMBL3364441 | 0.84 | KDM4E (0.37) | KDM4EALDH1A1 | |
| Trifluoromethanesulfonic Acid SCHEMBL3365764 | 0.84 | CNR1 (0.32) | KDM4EALDH1A1GAAMAPT | |
| Trifluoromethanesulfonic Acid SCHEMBL6845188 | 0.83 | ACHE (0.32) | — | |
| SCHEMBL3363116 | 0.83 | RORC (0.32) | LMNA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1614151-B1 | METHOD FOR FORMING AN ANTIREFLECTIVE LAYER | DOW GLOBAL TECHNOLOGIES INC (US) | 2010-11-03 | — | — | EP | disclosed |
| EP-1164434-B1 | Radiation-sensitive resin composition | JSR CORP (JP) | 2010-10-06 | — | — | EP | disclosed |
| US-6964840-B2 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2005-11-15 | — | — | US | disclosed |
| US-20040241580-A1 | Radiation-sensitive resin composition | NISHIMURA YUKIO (JP) | 2004-12-02 | — | — | US | disclosed |
| US-6800414-B2 | FLUOROPOLYMER | JSR CORPORATION (JP) | 2004-10-05 | — | — | US | disclosed |
| US-6403280-B1 | TERPOLYMER COMPRISING MALEIC ANHYDRIDE, NORBORNENE ESTER DERIVATIVE, AND ALICYCLIC (METH)ACRYLATE MONOMERS; DURABILITY TO DRY ETCHING; TRANSPARENCY, STORAGE STABILITY | JSR CORPORATION (JP) | 2002-06-11 | — | — | US | disclosed |
| US-20020009668-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2002-01-24 | — | — | US | disclosed |
| EP-1164434-A2 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2001-12-19 | — | — | EP | disclosed |
| EP-1048983-A1 | Radiation sensitive resin composition | JSR Corporation (JP) | 2000-11-02 | — | — | EP | disclosed |