Water

Water

SCHEMBL338994

O.[AlH3].[LiH].[LiH]

nearest known ligand 0.00

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

ABCC9ABL1ACEACHEACVR1ADORA1ADORA2AADORA2BADORA3ADRA1AADRA1BADRA1DADRA2AADRA2BADRA2CADRB1ADRB2ADRB3AGTR1ALOX5ATP4AATP4BBCRBTKCACNA1ACACNA1BCACNA1CCACNA1DCACNA1ECACNA1FCACNA1GCACNA1HCACNA1ICACNA1SCACNA2D1CACNA2D2CACNA2D3CACNA2D4CACNB1CACNB2CACNB3CACNB4CACNG1CACNG2CACNG3CACNG4CACNG5CACNG6CACNG7CACNG8CALCRLCFBCHRM1CHRM2CHRM3CHRM4CHRM5CHRNA1CHRNB1CHRNDCHRNECHRNGCRBNCUL4ACXCR1CXCR2DDB1DDCDHFRDPP4DRD2DRD3DRD4EGFRERBB2ERBB4ESR1ESR2FDPSFKBP1AFLT1FLT3FLT4GARTGHSRGRIA1GRIA2GRIA3GRIA4GRIK1GRIK2GRIK3GRIK4GRIK5GRIN2AGSK3AGSK3BHDAC1HDAC10HDAC11HDAC2HDAC3HDAC4HDAC5HDAC6HDAC7HDAC8HDAC9HRH1HTR1AHTR1BHTR1DHTR1EHTR1FHTR2AHTR2BHTR2CHTR3AHTR3BHTR3CHTR3DHTR3EHTR4HTR5AHTR6HTR7IDH1IDH2IMPA1ITGA2BITGB3JAK1JAK2JAK3KCNJ11KCNK3KCNK9KDRKITMEN1METMMP1MMP13MMP7MMP8NANOD2NS5bODC1OPG057OPRD1OPRK1OPRM1PPARP1PARP2PDE3APDE3BPDE4APDE4BPDE4CPDE4DPDGFRBPIK3CAPIK3CBPIK3CDPIK3CGPIK3R1PIK3R2PIK3R3PIK3R5PKLRPPARDPPATPTGS1PTGS2RBX1ROCK1ROCK2RRM1RRM2RRM2BSCN10ASCN11ASCN1ASCN2ASCN3ASCN4ASCN5ASCN7ASCN8ASCN9ASCNN1ASCNN1BSCNN1GSIGMAR1SLC10A2SLC5A2SLC6A2SLC6A3SLC6A4SLC9A3SYKTACR1THRATHRBTOP1TUBA1ATUBA1BTUBA1CTUBA3CTUBA3ETUBA4ATUBBTUBB1TUBB2ATUBB2BTUBB3TUBB4ATUBB4BTUBB6TUBB8TYK2TYMSVDRampCblablaT-3blaT-4blaT-5blaT-6blaUOE-1dacAdacBdacCfolAfolPftsIgyrAgyrBileSmecAmrcAmrcBmrdAparCparEpbp2pbp4pbpApbpFrplArplBrplCrplDrplErplFrplIrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmE2rpmFrpmGrpmG1rpmG2rpmG3rpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUthyAykgMykgO

The experimentally established mechanism targets of Water. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Water SCHEMBL2052257 1.00
Water SCHEMBL28539948 1.00
Water SCHEMBL56097 1.00
Water SCHEMBL28376188 1.00
Water SCHEMBL19179020 1.00
Water SCHEMBL23004637 0.87
Water SCHEMBL2865855 0.87
Water SCHEMBL21433587 0.87
Water SCHEMBL21380055 0.87
Water SCHEMBL21175555 0.87

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 34 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11279876-B2 Phosphor and light-emitting device using same DENKA COMPANY LIMITED (JP) 2022-03-22 US disclosed
US-20210017448-A1 PHOSPHOR AND LIGHT-EMITTING DEVICE USING SAME DENKA COMPANY LIMITED (JP) 2021-01-21 US disclosed
CN-102693970-B Light emitting diode device 晶元光电股份有限公司 2017-04-12 CN disclosed
CN-104205370-B Optical substrate, semiconductor light-emitting element, and method for producing semiconductor light-emitting element 旭化成株式会社 2017-03-22 CN disclosed
CN-102956805-B Light emitting element 晶元光电股份有限公司 2017-03-22 CN disclosed
CN-106328798-A Light emitting diode chip 晶宇光电(厦门)有限公司 2017-01-11 CN disclosed
CN-103548124-B The method of the III nitride semiconductor growth improved 应用材料公司 2016-10-26 CN disclosed
CN-103548117-B The method of the group III-nitride buffer growth improved 应用材料公司 2016-10-05 CN disclosed
CN-103378255-B Semiconductor light-emitting elements 丰田合成株式会社 2016-08-24 CN disclosed
CN-103296154-B The manufacture method of III group-III nitride semiconductor light-emitting component, III group-III nitride semiconductor light-emitting component, lamp and reticle mask 丰田合成株式会社 2016-08-03 CN disclosed
US-20100051980-A1 METHOD FOR MANUFACTURING GROUP III NITRIDE COMPOUND SEMICONDUCTOR LIGHT-EMITTING DEVICE, GROUP III NITRIDE COMPOUND SEMICONDUCTOR LIGHT-EMITTING DEVICE, AND LAMP SHOWA DENKO K.K. (JP) 2010-03-04 US disclosed
US-20100025684-A1 METHOD FOR PRODUCING GROUP III NITRIDE SEMICONDUCTOR LAYER, GROUP III NITRIDE SEMICONDUCTOR LIGHT-EMITTING DEVICE, AND LAMP SHOWA DENKO K.K. (JP) 2010-02-04 US disclosed
US-7585690-B2 Process for producing group III nitride compound semiconductor light emitting device, group III nitride compound semiconductor light emitting device and lamp SHOWA DENKO K.K. (JP) 2009-09-08 US disclosed
US-20080116478-A1 PROCESS FOR PRODUCING III GROUP NITRIDE COMPOUND SEMICONDUCTOR LIGHT EMITTING DEVICE, III GROUP NITRIDE COMPOUND SEMICONDUCTOR LIGHT EMITTING DEVICE AND LAMP SHOWA DENKO K.K. (JP) 2008-05-22 US disclosed
US-20060072047-A1 Liquid crystal display CITIZEN HOLDINGS CO., LTD. (JP) 2006-04-06 US disclosed
US-6881501-B2 Organic electro-luminescence element and the manufacturing method thereof SEIKO EPSON CORPORATION (JP) 2005-04-19 US disclosed
US-20020022148-A1 Organic electro-luminescence element and the manufacturing method thereof SEIKO EPSON CORPORATION (JP) 2002-02-21 US disclosed
US-6321429-B1 Method of manufacturing an enveloped multilayer capacitor U.S. PHILIPS CORPORATION 2001-11-27 US disclosed
EP-0951724-A2 METHOD OF MANUFACTURING AN ENVELOPED MULTILAYER CAPACITOR AND AN ENVELOPE MULTILAYER CAPACITOR Koninklijke Philips Electronics N.V. (NL) 1999-10-27 EP disclosed
WO-1998049698-A2 METHOD OF MANUFACTURING AN ENVELOPED MULTILAYER CAPACITOR AND AN ENVELOPE MULTILAYER CAPACITOR KONINKLIJKE PHILIPS ELECTRONICS N.V. (NL) 1998-11-05 WO disclosed