Known targets — ChEMBL curated mechanism
ABCC9ABL1ACEACHEACVR1ADORA1ADORA2AADORA2BADORA3ADRA1AADRA1BADRA1DADRA2AADRA2BADRA2CADRB1ADRB2ADRB3AGTR1ALOX5ATP4AATP4BBCRBTKCACNA1ACACNA1BCACNA1CCACNA1DCACNA1ECACNA1FCACNA1GCACNA1HCACNA1ICACNA1SCACNA2D1CACNA2D2CACNA2D3CACNA2D4CACNB1CACNB2CACNB3CACNB4CACNG1CACNG2CACNG3CACNG4CACNG5CACNG6CACNG7CACNG8CALCRLCFBCHRM1CHRM2CHRM3CHRM4CHRM5CHRNA1CHRNB1CHRNDCHRNECHRNGCRBNCUL4ACXCR1CXCR2DDB1DDCDHFRDPP4DRD2DRD3DRD4EGFRERBB2ERBB4ESR1ESR2FDPSFKBP1AFLT1FLT3FLT4GARTGHSRGRIA1GRIA2GRIA3GRIA4GRIK1GRIK2GRIK3GRIK4GRIK5GRIN2AGSK3AGSK3BHDAC1HDAC10HDAC11HDAC2HDAC3HDAC4HDAC5HDAC6HDAC7HDAC8HDAC9HRH1HTR1AHTR1BHTR1DHTR1EHTR1FHTR2AHTR2BHTR2CHTR3AHTR3BHTR3CHTR3DHTR3EHTR4HTR5AHTR6HTR7IDH1IDH2IMPA1ITGA2BITGB3JAK1JAK2JAK3KCNJ11KCNK3KCNK9KDRKITMEN1METMMP1MMP13MMP7MMP8NANOD2NS5bODC1OPG057OPRD1OPRK1OPRM1PPARP1PARP2PDE3APDE3BPDE4APDE4BPDE4CPDE4DPDGFRBPIK3CAPIK3CBPIK3CDPIK3CGPIK3R1PIK3R2PIK3R3PIK3R5PKLRPPARDPPATPTGS1PTGS2RBX1ROCK1ROCK2RRM1RRM2RRM2BSCN10ASCN11ASCN1ASCN2ASCN3ASCN4ASCN5ASCN7ASCN8ASCN9ASCNN1ASCNN1BSCNN1GSIGMAR1SLC10A2SLC5A2SLC6A2SLC6A3SLC6A4SLC9A3SYKTACR1THRATHRBTOP1TUBA1ATUBA1BTUBA1CTUBA3CTUBA3ETUBA4ATUBBTUBB1TUBB2ATUBB2BTUBB3TUBB4ATUBB4BTUBB6TUBB8TYK2TYMSVDRampCblablaT-3blaT-4blaT-5blaT-6blaUOE-1dacAdacBdacCfolAfolPftsIgyrAgyrBileSmecAmrcAmrcBmrdAparCparEpbp2pbp4pbpApbpFrplArplBrplCrplDrplErplFrplIrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmE2rpmFrpmGrpmG1rpmG2rpmG3rpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUthyAykgMykgO
The experimentally established mechanism targets of Water. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Water SCHEMBL28539948 | 0.87 | — | — | |
| Water SCHEMBL28376188 | 0.87 | — | — | |
| Water SCHEMBL17237450 | 0.87 | — | — | |
| SCHEMBL8197250 | 0.87 | — | — | |
| Water SCHEMBL137758 | 0.87 | — | — | |
| Water SCHEMBL339458 | 0.87 | — | — | |
| Water SCHEMBL56097 | 0.87 | — | — | |
| Water SCHEMBL19179020 | 0.87 | — | — | |
| Water SCHEMBL338994 | 0.87 | — | — | |
| Water SCHEMBL2052257 | 0.87 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 22 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7713812-B2 | Method for manufacturing semiconductor thin film | PANASONIC CORPORATION (JP) | 2010-05-11 | — | — | US | claimed |
| US-20060121695-A1 | Method for manufacturing semiconductor thin film | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) | 2006-06-08 | — | — | US | claimed |
| US-7008839-B2 | Method for manufacturing semiconductor thin film | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) | 2006-03-07 | — | — | US | claimed |
| US-6887770-B2 | Method for fabricating semiconductor device | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) | 2005-05-03 | — | — | US | claimed |
| US-20050042788-A1 | Semiconductor device and method for manufacturing the same | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) | 2005-02-24 | — | — | US | claimed |
| US-6797532-B2 | Semiconductor device and method for manufacturing the same | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) | 2004-09-28 | — | — | US | claimed |
| US-20040110395-A1 | Method for fabricating semiconductor device | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. | 2004-06-10 | — | — | US | claimed |
| US-20040079994-A1 | Semiconductor device and method for manufacturing the same | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. | 2004-04-29 | — | — | US | claimed |
| US-20030186475-A1 | Method for manufacturing semiconductor thin film | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. | 2003-10-02 | — | — | US | claimed |
| US-7713812-B2 | Method for manufacturing semiconductor thin film | PANASONIC CORPORATION (JP) | 2010-05-11 | — | — | US | disclosed |
| US-20090261372-A1 | SEMICONDUCTOR LIGHT EMITTING DEVICE AND METHOD FOR FABRICATING THE SAME | PANASONIC CORPORATION (JP) | 2009-10-22 | — | — | US | disclosed |
| US-7569863-B2 | Semiconductor light emitting device | PANASONIC CORPORATION (JP) | 2009-08-04 | — | — | US | disclosed |
| US-20060121695-A1 | Method for manufacturing semiconductor thin film | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) | 2006-06-08 | — | — | US | disclosed |
| US-7008839-B2 | Method for manufacturing semiconductor thin film | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) | 2006-03-07 | — | — | US | disclosed |
| US-20050042788-A1 | Semiconductor device and method for manufacturing the same | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) | 2005-02-24 | — | — | US | disclosed |
| US-6797532-B2 | Semiconductor device and method for manufacturing the same | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) | 2004-09-28 | — | — | US | disclosed |
| US-20040110395-A1 | Method for fabricating semiconductor device | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. | 2004-06-10 | — | — | US | disclosed |
| US-20040079994-A1 | Semiconductor device and method for manufacturing the same | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. | 2004-04-29 | — | — | US | disclosed |
| US-20040065889-A1 | Semiconductor wafer, semiconductor device, and methods for fabricating the same | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. | 2004-04-08 | — | — | US | disclosed |
| US-20030186475-A1 | Method for manufacturing semiconductor thin film | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. | 2003-10-02 | — | — | US | disclosed |