SCHEMBL3390499

SCHEMBL3390499

CC12CCC(C(S(=O)(=O)[O-])C1=O)C2(C)C.COc1ccc([I+]c2ccccc2)cc1

nearest known ligand 0.36

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HSD11B1 P28845 2/20 0.36
L3MBTL1 Q9Y468 2/20 0.35
ATM Q13315 1/20 0.35
NR3C1 P04150 1/20 0.33
ALDH1A1 P00352 5/20 0.33
KDM4E B2RXH2 2/20 0.33
MAPT P10636 2/20 0.33
CNR2 P34972 1/20 0.33
KMT2A Q03164 1/20 0.33
CCR6 P51684 1/20 0.33
LMNA P02545 1/20 0.33
TSHR P16473 1/20 0.33
RECQL P46063 1/20 0.33
MMP13 P45452 3/20 0.32
MMP1 P03956 2/20 0.32
MMP3 P08254 2/20 0.32
MMP7 P09237 2/20 0.32
CTSG P08311 1/20 0.32
CMA1 P23946 1/20 0.32
HTT P42858 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL447369 0.91 HSD11B1 (0.31) HSD11B1ALDH1A1MAPTCNR2KMT2A
SCHEMBL6342395 0.89
SCHEMBL503907 0.82 APP (0.32)
SCHEMBL447472 0.80 ACHE (0.35) HSD11B1ALDH1A1CNR2KMT2A
SCHEMBL217323 0.78 ALDH1A1 (0.32) HSD11B1ALDH1A1CNR2
SCHEMBL6339049 0.77 HSD11B1 (0.30) HSD11B1
Potassium Ion SCHEMBL1305480 0.77 ALDH1A1 (0.36) ALDH1A1MAPTCNR2KMT2ALMNA
SCHEMBL20162191 0.77 ALDH1A1 (0.36) ALDH1A1MAPTCNR2KMT2ALMNA
Lithium Ion SCHEMBL1458084 0.77 ALDH1A1 (0.36) ALDH1A1MAPTCNR2KMT2ALMNA
SCHEMBL1401234 0.77 ALDH1A1 (0.36) ALDH1A1MAPTCNR2KMT2ALMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20100047539-A1 POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, METHOD OF FORMING PATTERN AND SEMICONDUCTOR DEVICE KOREA KUMHO PETROCHEMICAL CO., LTD. 2010-02-25 US disclosed
US-20090045552-A1 Positive resist composition for recording medium master, and method of producing recording medium master and method of producing stamper using the same IMAI GENJI 2009-02-19 US disclosed