Predicted protein targets (top 5)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.32 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.32 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.32 |
| ▸ | HSD11B1 | P28845 | 2/20 | 0.30 |
| ▸ | CNR2 | P34972 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4480664 | 0.94 | NR1I2 (0.32) | — | |
| SCHEMBL447468 | 0.93 | PTGS2 (0.33) | CNR2 | |
| SCHEMBL6339049 | 0.91 | HSD11B1 (0.30) | HSD11B1 | |
| SCHEMBL384343 | 0.91 | ALDH1A1 (0.34) | ALDH1A1HSD11B1CNR2 | |
| SCHEMBL483101 | 0.90 | ALDH1A1 (0.30) | ALDH1A1SMN1; SMN2HSD17B10 | |
| SCHEMBL449277 | 0.89 | KMT2A (0.32) | ALDH1A1SMN1; SMN2HSD17B10 | |
| SCHEMBL384824 | 0.89 | NR1I2 (0.34) | ALDH1A1SMN1; SMN2HSD17B10HSD11B1 | |
| SCHEMBL384856 | 0.88 | — | — | |
| SCHEMBL4852337 | 0.88 | — | — | |
| SCHEMBL1355252 | 0.87 | ALDH1A1 (0.34) | ALDH1A1SMN1; SMN2HSD17B10HSD11B1CNR2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1108 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-121873631-B | Spin-on carbon composition, semiconductor preparation method and semiconductor device | Jiageng Innovation Laboratory (CN) | 2026-05-26 | — | — | CN | claimed |
| CN-119882351-A | High-adhesion positive KrF photoresist resin composition | 万华化学集团股份有限公司 | 2025-04-25 | — | — | CN | claimed |
| CN-119463075-A | Poly (4-hydroxystyrene) -based block copolymer and preparation and application thereof | 微芯新材料(湖州)有限公司 | 2025-02-18 | — | — | CN | claimed |
| US-20250021002-A1 | BOTTOM ANTI-REFLECTIVE COATING FOR DEEP ULTRAVIOLET LITHOGRAPHY, PREPARATION METHOD THEREFOR AND USE THEREOF | CHINA ADVANCED LITHOGRAPHIC MATERIAL TECHNOLOGY CO. LTD. (CN) | 2025-01-16 | — | — | US | claimed |
| CN-115586293-B | Quality control method for production process of cationic photoinitiator triphenylsulfonium camphorsulfonate | 青岛盛瀚色谱技术有限公司 | 2024-10-29 | — | — | CN | claimed |
| CN-118295209-A | Photoresist composition containing two sulfonium salts and preparation method and application thereof | 中国科学院化学研究所 | 2024-07-05 | — | — | CN | claimed |
| CN-117757070-A | Polyimide resin capable of being cured at low temperature, photoresist composition and preparation method thereof | 江苏艾森半导体材料股份有限公司 | 2024-03-26 | — | — | CN | claimed |
| CN-116102680-B | Bottom anti-reflection coating and preparation method and application thereof | 上海新阳半导体材料股份有限公司 | 2024-02-13 | — | — | CN | claimed |
| CN-116102938-B | Bottom anti-reflection coating for deep ultraviolet lithography and preparation method and application thereof | 上海新阳半导体材料股份有限公司 | 2023-10-20 | — | — | CN | claimed |
| CN-116102937-B | Bottom anti-reflection coating and preparation method and application thereof | 上海新阳半导体材料股份有限公司 | 2023-10-20 | — | — | CN | claimed |
| US-20090291392-A1 | WET DEVELOPABLE BOTTOM ANTIREFLECTIVE COATING COMPOSITION AND METHOD FOR USE THEREOF | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2009-11-26 | — | — | US | claimed |
| WO-2009053832-A2 | BOTTOM ANTIREFLECTIVE COATING COMPOSITIONS | AZ ELECTRONIC MATERIALS USA CORP. (DE) | 2009-04-30 | — | — | WO | claimed |
| US-20090104559-A1 | Bottom Antireflective Coating Compositions | MERCK PATENT GMBH (DE) | 2009-04-23 | — | — | US | claimed |
| EP-2013659-A2 | WET DEVELOPABLE BOTTOM ANTIREFLECTIVE COATING COMPOSITION AND METHOD FOR USE THEREOF | International Business Machines Corporation IBM (US) | 2009-01-14 | — | — | EP | claimed |
| WO-2007121456-A2 | WET DEVELOPABLE BOTTOM ANTIREFLECTIVE COATING COMPOSITION AND METHOD FOR USE THEREOF | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2007-10-25 | — | — | WO | claimed |
| US-20070243484-A1 | Wet developable bottom antireflective coating composition and method for use thereof | GLOBALFOUNDRIES U.S. INC. | 2007-10-18 | — | — | US | claimed |
| EP-0827970-B1 | New acid-labile group protected hydroxystyrene polymers or copolymers thereof and their application to radiation sensitive materials | CLARIANT FINANCE BVI LTD (VG) | 2001-09-26 | — | — | EP | claimed |
| US-5994022-A | BECOMES SOLUBLE IN ALKALI DEVELOPING SOLUTION BY ACTION OF AN ACID | JSR CORPORATION (JP) | 1999-11-30 | — | — | US | claimed |
| US-5852128-A | Acid-labile group protected hydroxystyrene polymers or copolymers thereof and their application to radiation sensitive materials | CLARIANT AG (CH) | 1998-12-22 | — | — | US | claimed |
| EP-0827970-A2 | New acid-labile group protected hydroxystyrene polymers or copolymers thereof and their application to radiation sensitive materials | Clariant AG (CH) | 1998-03-11 | — | — | EP | claimed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20090104559-A1 | Bottom Antireflective Coating Compositions | SDC2, S100A9, MYH9 | ALDH1A1 3154/4885SMN1; SMN2 579/4885HSD17B10 4444/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.