Predicted protein targets (top 5)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ACHE | P22303 | 1/20 | 0.35 |
| ▸ | HSD11B1 | P28845 | 14/20 | 0.35 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.33 |
| ▸ | CNR2 | P34972 | 1/20 | 0.32 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1356600 | 0.88 | HSD11B1 (0.35) | ACHEHSD11B1KMT2ACNR2ALDH1A1 | |
| SCHEMBL220080 | 0.87 | HSD11B1 (0.36) | ACHEHSD11B1KMT2ACNR2ALDH1A1 | |
| SCHEMBL219862 | 0.87 | HSD11B1 (0.36) | ACHEHSD11B1KMT2ACNR2ALDH1A1 | |
| SCHEMBL503907 | 0.85 | APP (0.32) | — | |
| SCHEMBL447369 | 0.85 | HSD11B1 (0.31) | HSD11B1KMT2ACNR2ALDH1A1 | |
| SCHEMBL384343 | 0.83 | ALDH1A1 (0.34) | ACHEHSD11B1KMT2ACNR2ALDH1A1 | |
| SCHEMBL6342395 | 0.82 | — | — | |
| Lithium Ion SCHEMBL1458084 | 0.80 | ALDH1A1 (0.36) | KMT2ACNR2ALDH1A1 | |
| SCHEMBL906300 | 0.80 | ALDH1A1 (0.36) | KMT2ACNR2ALDH1A1 | |
| SCHEMBL20162191 | 0.80 | ALDH1A1 (0.36) | KMT2ACNR2ALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 507 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20250021002-A1 | BOTTOM ANTI-REFLECTIVE COATING FOR DEEP ULTRAVIOLET LITHOGRAPHY, PREPARATION METHOD THEREFOR AND USE THEREOF | CHINA ADVANCED LITHOGRAPHIC MATERIAL TECHNOLOGY CO. LTD. (CN) | 2025-01-16 | — | — | US | claimed |
| WO-2023082371-A1 | BOTTOM ANTI-REFLECTIVE COATING FOR DEEP ULTRAVIOLET LITHOGRAPHY, PREPARATION METHOD THEREFOR AND USE THEREOF | 上海新阳半导体材料股份有限公司 | 2023-05-19 | — | — | WO | claimed |
| US-8202678-B2 | Wet developable bottom antireflective coating composition and method for use thereof | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2012-06-19 | — | — | US | claimed |
| US-20090291392-A1 | WET DEVELOPABLE BOTTOM ANTIREFLECTIVE COATING COMPOSITION AND METHOD FOR USE THEREOF | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2009-11-26 | — | — | US | claimed |
| EP-2013659-A2 | WET DEVELOPABLE BOTTOM ANTIREFLECTIVE COATING COMPOSITION AND METHOD FOR USE THEREOF | International Business Machines Corporation IBM (US) | 2009-01-14 | — | — | EP | claimed |
| WO-2007121456-A2 | WET DEVELOPABLE BOTTOM ANTIREFLECTIVE COATING COMPOSITION AND METHOD FOR USE THEREOF | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2007-10-25 | — | — | WO | claimed |
| US-20070243484-A1 | Wet developable bottom antireflective coating composition and method for use thereof | GLOBALFOUNDRIES U.S. INC. | 2007-10-18 | — | — | US | claimed |
| US-6338934-B1 | Hybrid resist based on photo acid/photo base blending | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2002-01-15 | — | — | US | claimed |
| US-6203965-B1 | USEFUL AS DEEP ULTRAVIOLET RADIATION PHOTORESISTS | SHIPLEY COMPANY, L.L.C. | 2001-03-20 | — | — | US | claimed |
| US-6200726-B1 | SELECTING A DESIRED SPACE WIDTH, SELECTING AT LEAST ONE PHOTOACID GENERATOR (PAG), WHICH WILL GENERATE TWO PHOTOACIDS UPON EXPOSURE TO ACTINIC ENERGY TO PRODUCE A DESIRED SPACE WIDTH IN HYBRID PHOTORESIST, FORMING HYBRID PHOTORESIST | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2001-03-13 | — | — | US | claimed |
| US-20260133494-A1 | RESIST UNDERLAYER FILM-FORMING COMPOSITION | NISSAN CHEMICAL CORPORATION (JP) | 2026-05-14 | — | — | US | disclosed |
| US-20260118764-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM AND SILICON-CONTAINING RESIST UNDERLAYER FILM | NISSAN CHEMICAL CORPORATION (JP) | 2026-04-30 | — | — | US | disclosed |
| US-12607936-B2 | Film-forming composition having a multiple bond | NISSAN CHEMICAL CORPORATION (JP) | 2026-04-21 | — | — | US | disclosed |
| EP-4715465-A1 | MULTILAYER BODY, METHOD FOR PRODUCING MULTILAYER BODY, AND PHOTOSENSITIVE SURFACE MODIFIER | Nissan Chemical Corporation (JP) | 2026-03-25 | — | — | EP | disclosed |
| US-12585188-B2 | Composition for forming resist underlying film | NISSAN CHEMICAL CORPORATION (JP) | 2026-03-24 | — | — | US | disclosed |
| US-6037107-A | EXPOSING TO ACTIVATION RADIATION A POSITIVE WORKING PHOTORESIST COMPRISING AN ALKALI SOLUBLE RESIN SUBSTITUTED WITH AN ACID LABILE BLOCKING GROUP TO GENERATE HALOGENATED SULFONIC ACID BY PHOTOLYSIS | SHIPLEY COMPANY, L.L.C. (US) | 2000-03-14 | — | — | US | disclosed |
| EP-0938029-A2 | Methods using photoresist compositions and articles produced therewith | Shipley Company LLC (US) | 1999-08-25 | — | — | EP | disclosed |
| EP-0901043-A1 | Radiation-sensitive resin composition | JSR Corporation (JP) | 1999-03-10 | — | — | EP | disclosed |
| EP-0778495-A1 | Resist composition with radiation sensitive acid generator | International Business Machines Corporation (US) | 1997-06-11 | — | — | EP | disclosed |
| US-5585220-A | Resist composition with radiation sensitive acid generator | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 1996-12-17 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20260118764-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM AND SILICON-CONTAINING RESIST UNDERLAYER FILM | SRSF1, MACF1, SRPK1 | ACHE 2351/4885HSD11B1 3777/4885KMT2A 111/4885 |
| US-20260133494-A1 | RESIST UNDERLAYER FILM-FORMING COMPOSITION | ETV6, ETV1, RER1 | ACHE 4452/4885HSD11B1 2412/4885KMT2A 964/4885 |
| US-12585188-B2 | Composition for forming resist underlying film | SRR, SMC1A, ASH2L | ACHE 3939/4885HSD11B1 1047/4885KMT2A 1145/4885 |
| US-12607936-B2 | Film-forming composition having a multiple bond | ETV1, ARF1, ETV6 | ACHE 4452/4885HSD11B1 3945/4885KMT2A 881/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.