Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PLA2G2A | P14555 | 1/20 | 0.47 |
| ▸ | BLM | P54132 | 1/20 | 0.47 |
| ▸ | POLB | P06746 | 1/20 | 0.44 |
| ▸ | GAA | P10253 | 1/20 | 0.44 |
| ▸ | TSPO | P30536 | 5/20 | 0.43 |
| ▸ | TPMT | P51580 | 1/20 | 0.43 |
| ▸ | KEAP1 | Q14145 | 2/20 | 0.40 |
| ▸ | NFE2L2 | Q16236 | 2/20 | 0.40 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.36 |
| ▸ | RXRA | P19793 | 1/20 | 0.35 |
| ▸ | RXRB | P28702 | 1/20 | 0.35 |
| ▸ | RXRG | P48443 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL26558157 | 0.90 | BLM (0.44) | PLA2G2ABLMPOLBGAATSPO | |
| SCHEMBL17075287 | 0.84 | PLA2G2A (0.40) | PLA2G2ABLMPOLBGAATSPO | |
| SCHEMBL28860797 | 0.81 | POLB (0.43) | POLBGAATSPOTPMTKEAP1 | |
| SCHEMBL2808762 | 0.80 | ALDH1A1 (0.48) | — | |
| SCHEMBL9795610 | 0.79 | POLB (0.42) | POLBGAATSPOTPMTKEAP1 | |
| SCHEMBL9831883 | 0.79 | SMN1; SMN2 (0.44) | PLA2G2ABLMPOLBGAATSPO | |
| SCHEMBL9974573 | 0.78 | KEAP1 (0.56) | POLBGAAKEAP1NFE2L2SMN1; SMN2 | |
| SCHEMBL7069055 | 0.77 | ALDH1A1 (0.39) | BLMPOLBGAATSPOTPMT | |
| SCHEMBL13603785 | 0.74 | PLA2G2A (0.44) | PLA2G2ABLMTPMTSMN1; SMN2RXRA | |
| SCHEMBL8038936 | 0.74 | TDP1 (0.44) | PLA2G2ABLMKEAP1NFE2L2SMN1; SMN2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 102 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20180118887-A1 | PRECURSOR COMPOSITION, PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING PRECURSOR COMPOSITION, CURED FILM, METHOD FOR PRODUCING CURED FILM, AND SEMICONDUCTOR DEVICE | FUJIFILM CORPORATION (JP) | 2018-05-03 | — | — | US | disclosed |
| US-20180079864-A1 | POLYIMIDE PRECURSOR COMPOSITION, PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, METHOD FOR PRODUCING CURED FILM, A SEMICONDUCTOR DEVICE, AND METHOD FOR PRODUCING POLYIMIDE PRECURSOR COMPOSITION | FUJIFILM CORPORATION (JP) | 2018-03-22 | — | — | US | disclosed |
| EP-1975707-B1 | Curable composition and planographic printing plate precursor | FUJIFILM CORP (JP) | 2017-07-19 | — | — | EP | disclosed |
| EP-1801651-B1 | Polymerizable composition and planographic printing plate precursor using the same | FUJIFILM CORP (JP) | 2017-04-19 | — | — | EP | disclosed |
| US-20170101521-A1 | THERMAL BASE GENERATOR, THERMOSETTING RESIN COMPOSITION, CURED FILM, CURED FILM MANUFACTURING METHOD, AND SEMICONDUCTOR DEVICE | FUJIFILM CORPORATION (JP) | 2017-04-13 | — | — | US | disclosed |
| EP-2471655-B1 | Lithographic printing plate precursor and lithographic printing method | FUJIFILM CORP (JP) | 2016-08-17 | — | — | EP | disclosed |
| EP-1887423-B1 | Laser-decomposable resin composition and pattern-forming material using the same | FUJIFILM CORP (JP) | 2016-01-27 | — | — | EP | disclosed |
| EP-1431032-B1 | Polymerizable composition and lithographic printing plate precursor | FUJIFILM CORP (JP) | 2015-12-09 | — | — | EP | disclosed |
| CN-102529310-B | Original edition of lithographic printing plate and lithographic process | FUJI FILM CORP. (JP) | 2015-09-16 | — | — | CN | disclosed |
| EP-2039509-B1 | Curable composition, image forming material, and planographic printing plate precursor | FUJIFILM CORP (JP) | 2014-03-26 | — | — | EP | disclosed |
| EP-1079972-A1 | IR-SENSITIVE COMPOSITION AND USE THEREOF FOR THE PREPARATION OF PRINTING PLATE PRECURSORS | Kodak Polychrome Graphics Company Ltd. (US) | 2001-03-07 | — | — | EP | disclosed |
| WO-2000048836-A1 | IR-SENSITIVE COMPOSITION AND USE THEREOF FOR THE PREPARATION OF PRINTING PLATE PRECURSORS | KODAK POLYCHROME GRAPHICS COMPANY, LTD. (US) | 2000-08-24 | — | — | WO | disclosed |
| US-5942372-A | COMPRISED A SPECTRAL SENSITIZER THAT SENSITIZES IN THE ULTRAVIOLET OR VISIBLE REGIONS OF THE SPECTRUM AND AN N-ARYL POLYCARBOXYLIC ACID CO-INITIATOR; VERY HIGH PHOTOSPEED AND VERY GOOD SHELF-LIFE IN COMPUTER-TO-PLATE SYSTEMS | KODAK POLYCHROME GRAPHICS, LLC (US) | 1999-08-24 | — | — | US | disclosed |
| US-5914215-A | ELEMENT COMPRISING SUPPORT HAVING PHOTOIMAGEABLE, RADIATION SENSITIVE LAYER COMPRISING UNSATURATED COMPOUND, PHOTOINITIATOR SYSTEM COMPRISING SENSITIZER SENSITIZING IN ULTRAVIOLET OR VISIBLE REGION OF SPECTRUM, CO-INITIATOR | KODAK POLYCHROME GRAPHIC, LLC (US) | 1999-06-22 | — | — | US | disclosed |
| US-5888700-A | NONFOGGING, SHELF LIFE | KODAK POLYCHROME GRPAHICS, LLC (US) | 1999-03-30 | — | — | US | disclosed |
| US-5821030-A | DIRECT DIGITAL EXPOSURE; HIGH WRITING SPEED; ADHESION; ANTIFOGGING AGENTS; SHELF LIFE; USING A POLYCARBOXYLIC ACID IN THE PHOTOPOLYMERIZATION INITIATOR SYSTEM AND A BASIC COMPOUND IN THE OXYGEN BARRIER LAYER | KODAK POLYCHROME GRAPHICS (US) | 1998-10-13 | — | — | US | disclosed |
| US-5776655-A | CONTAINING PHOTOPOLYMER | EASTMAN KODAK COMPANY (US) | 1998-07-07 | — | — | US | disclosed |
| EP-0795790-A2 | Peel-developable lithographic printing plate | EASTMAN KODAK COMPANY (US) | 1997-09-17 | — | — | EP | disclosed |
| US-5629354-A | Photopolymerization initiator system comprising a spectral sensitizer and a polycarboxylic acid co-initiator | EASTMAN KODAK COMPANY (US) | 1997-05-13 | — | — | US | disclosed |
| EP-0730201-A1 | Sensitized photopolymerizable compositions and use thereof in lithographic printing plates | EASTMAN KODAK COMPANY (US) | 1996-09-04 | — | — | EP | disclosed |