Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 7/20 | 0.52 |
| ▸ | HPGD | P15428 | 6/20 | 0.52 |
| ▸ | HSD17B10 | Q99714 | 6/20 | 0.52 |
| ▸ | MEN1 | O00255 | 4/20 | 0.52 |
| ▸ | KMT2A | Q03164 | 4/20 | 0.52 |
| ▸ | KDM4E | B2RXH2 | 4/20 | 0.52 |
| ▸ | CYP2C19 | P33261 | 2/20 | 0.52 |
| ▸ | GLA | P06280 | 2/20 | 0.52 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.52 |
| ▸ | PTPN1 | P18031 | 1/20 | 0.49 |
| ▸ | IDO1 | P14902 | 1/20 | 0.48 |
| ▸ | MAPT | P10636 | 4/20 | 0.45 |
| ▸ | THRB | P10828 | 2/20 | 0.45 |
| ▸ | PKM | P14618 | 1/20 | 0.45 |
| ▸ | GRIN2D | O15399 | 1/20 | 0.45 |
| ▸ | GRIN2A | Q12879 | 1/20 | 0.45 |
| ▸ | GRIN2C | Q14957 | 1/20 | 0.45 |
| ▸ | GAA | P10253 | 1/20 | 0.45 |
| ▸ | MGAM | O43451 | 1/20 | 0.44 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.43 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28375782 | 0.89 | IDO1 (0.70) | ALDH1A1HPGDHSD17B10MEN1KMT2A | |
| SCHEMBL31061825 | 0.82 | PTPN1 (0.50) | ALDH1A1HPGDHSD17B10MEN1KMT2A | |
| SCHEMBL28721557 | 0.81 | GRIN2D (0.49) | ALDH1A1HPGDHSD17B10MEN1KMT2A | |
| SCHEMBL30363668 | 0.80 | MEN1 (0.55) | ALDH1A1HPGDHSD17B10MEN1KMT2A | |
| SCHEMBL7554285 | 0.80 | MEN1 (0.55) | ALDH1A1HPGDHSD17B10MEN1KMT2A | |
| SCHEMBL341301 | 0.79 | PTPN1 (0.66) | ALDH1A1HPGDHSD17B10MEN1KMT2A | |
| SCHEMBL29397498 | 0.79 | PTPN1 (0.66) | ALDH1A1HPGDHSD17B10MEN1KMT2A | |
| SCHEMBL8000087 | 0.79 | ALDH1A1 (0.57) | ALDH1A1HPGDHSD17B10MEN1KMT2A | |
| SCHEMBL70654 | 0.78 | PTPN1 (0.65) | ALDH1A1HPGDHSD17B10MEN1KMT2A | |
| SCHEMBL163552 | 0.78 | MEN1 (0.53) | ALDH1A1HPGDHSD17B10MEN1KMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 242 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-119781246-A | Photosensitive polyimide resin composition, cured film, and preparation method and application thereof | 吉林奥来德光电材料股份有限公司 | 2025-04-08 | — | — | CN | claimed |
| CN-115010924-B | Photosensitive polyimide resin composition, polyimide resin film containing photosensitive polyimide resin composition and application of photosensitive polyimide resin composition | 吉林奥来德光电材料股份有限公司 | 2023-10-13 | — | — | CN | claimed |
| CN-115010924-A | Photosensitive polyimide resin composition, polyimide resin film containing same and application of polyimide resin film | 吉林奥来德光电材料股份有限公司 | 2022-09-06 | — | — | CN | claimed |
| EP-1630605-B1 | PHOTOSENSITIVE RESIN COMPOSITION | TORAY INDUSTRIES (JP) | 2017-10-11 | — | — | EP | claimed |
| CN-101250164-A | Water-soluble triazine derivatives as well as preparation method and uses thereof | CHINESE ACAD INST CHEMISTRY (CN) | 2008-08-27 | — | — | CN | claimed |
| US-20060074105-A1 | Substituted quinoline and quinazoline inhibitors of quinone reductase 2 | SERENEX, INC. (US) | 2006-04-06 | — | — | US | claimed |
| WO-2006034235-A2 | SUBSTITUTED QUINOLINE AND QUINAZOLINE INHIBITORS OF QUINONE REDUCTASE 2 | SERENEX, INC. (US) | 2006-03-30 | — | — | WO | claimed |
| US-20260104641-A1 | NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS METHOD FOR FORMING CURED FILM, INTERLAYER INSULATING FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC COMPONENT | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2026-04-16 | — | — | US | disclosed |
| US-12583973-B2 | Polyimide-based polymer, positive photosensitive resin composition, negative photosensitive resin composition, patterning method, method for forming cured film, interlayer insulating film, surface protective film, and electronic component | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2026-03-24 | — | — | US | disclosed |
| EP-4660704-A1 | NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS, METHOD FOR FORMING CURED FILM, INTERLAYER INSULATING FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC COMPONENT | Shin-Etsu Chemical Co., Ltd. (JP) | 2025-12-10 | — | — | EP | disclosed |
| US-20250355350-A1 | NEGATIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS, METHOD FOR FORMING CURED COATING, INTERLAYER INSULATING FILM, SURFACE PROTECTING FILM, AND ELECTRONIC COMPONENT | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-11-20 | — | — | US | disclosed |
| EP-4650874-A1 | NEGATIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS, METHOD FOR FORMING CURED COATING, INTERLAYER INSULATING FILM, SURFACE PROTECTING FILM, AND ELECTRONIC COMPONENT | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-11-19 | — | — | EP | disclosed |
| EP-4636011-A1 | POLYMER, NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS, METHOD FOR FORMING CURED FILM, INTERLAYER INSULATING FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC COMPONENT | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-10-22 | — | — | EP | disclosed |
| EP-0790275-A1 | PREFOAMED PARTICLES OF POLYPROPYLENE RESIN AND PROCESS FOR PRODUCING THE SAME | KANEGAFUCHI KAGAKU KOGYO KABUSHIKI KAISHA (JP) | 1997-08-20 | — | — | EP | disclosed |
| EP-0776933-A1 | Polybutene-1 resin composition and a method of accelerating the crystal transformation | NEW JAPAN CHEMICAL CO.,LTD. (JP) | 1997-06-04 | — | — | EP | disclosed |
| US-5491188-A | ADDING DIAMIDE COMPOUNDS AS NUCLEATING AGENT TO PROPYLENE HOMO-, CO- AND TERPOLYMERS; FILTRATION MEMBRANES, PRINTING SHEETS | NEW JAPAN CHEMICAL CO., LTD. (JP) | 1996-02-13 | — | — | US | disclosed |
| CN-1098725-A | Based on porous stretched article of acrylic resin and preparation method thereof | NEW JAPAN CHEM CO LTD (JP) | 1995-02-15 | — | — | CN | disclosed |
| EP-0632095-A2 | Porous stretched article of polypropylene-based resin and process for its preparation | NEW JAPAN CHEMICAL CO.,LTD. (JP) | 1995-01-04 | — | — | EP | disclosed |
| EP-0557721-A2 | Crystalline polypropylene resin composition and amide compounds | NEW JAPAN CHEMICAL CO.,LTD. (JP) | 1993-09-01 | — | — | EP | disclosed |
| CN-85107032-A | The preparation of ruthenium complex and application | — | 1987-04-01 | — | — | CN | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20260104641-A1 | NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS METHOD FOR FORMING CURED FILM, INTERLAYER INSULATING FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC COMPONENT | ARCN1, PRDM9, LBR | ALDH1A1 3706/4885HPGD 3438/4885HSD17B10 4284/4885 |
| US-20060074105-A1 | Substituted quinoline and quinazoline inhibitors of quinone reductase 2 | NQO2, QTRT1, QTRT2 | ALDH1A1 867/4885HPGD 533/4885HSD17B10 419/4885 |
| US-12583973-B2 | Polyimide-based polymer, positive photosensitive resin composition, negative photosensitive resin composition, patterning method, method for forming cured film, interlayer insulating film, surface protective film, and electronic component | PRDM9, ARCN1, PUF60 | ALDH1A1 3281/4885HPGD 4313/4885HSD17B10 4119/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.