SCHEMBL345828

SCHEMBL345828

NC(N)(Cl)c1ccccc1

nearest known ligand 0.58

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
KCNN4 O15554 4/20 0.58
TSHR P16473 2/20 0.58
CYP1A2 P05177 2/20 0.46
ALDH1A1 P00352 1/20 0.43
TAAR1 Q96RJ0 1/20 0.40
CYP2D6 P10635 1/20 0.38
MAPK1 P28482 1/20 0.38
KIF11 P52732 3/20 0.37
CA1 P00915 1/20 0.37
CA2 P00918 1/20 0.37
CA5A P35218 1/20 0.37
CA9 Q16790 1/20 0.37
MAPT P10636 1/20 0.37
KMT2A Q03164 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3868401 0.81 KCNN4 (0.58) KCNN4TSHRCYP1A2ALDH1A1TAAR1
SCHEMBL1436199 0.81 KCNN4 (0.58) KCNN4TSHRCYP1A2ALDH1A1TAAR1
Fluoride SCHEMBL634655 0.79 KCNN4 (0.55) KCNN4TSHRALDH1A1TAAR1MAPK1
Hydrochloric Acid SCHEMBL9576091 0.79 KCNN4 (0.55) KCNN4TSHRCYP1A2ALDH1A1TAAR1
SCHEMBL1128768 0.78 TSHR (0.61) KCNN4TSHRCYP1A2ALDH1A1TAAR1
Triphenylmethanamine SCHEMBL1508115 0.78 KCNN4 (0.93) KCNN4TSHRCYP1A2ALDH1A1TAAR1
Fluoride SCHEMBL28084339 0.78 TSHR (0.93) KCNN4TSHRCYP1A2ALDH1A1TAAR1
SCHEMBL4690524 0.77 KCNN4 (0.52) KCNN4TSHRCYP1A2ALDH1A1TAAR1
SCHEMBL2005276 0.77 KCNN4 (0.52) KCNN4TSHRCYP1A2ALDH1A1TAAR1
SCHEMBL6930353 0.77 KCNN4 (0.52) KCNN4TSHRCYP1A2ALDH1A1TAAR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 230 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11813713-B2 Chemical mechanical polishing pad and polishing method ROHM AND HAAS ELECTRONIC MATERIALS CMP HOLDINGS, INC. (US) 2023-11-14 US claimed
US-11806830-B2 Formulations for chemical mechanical polishing pads and CMP pads made therewith ROHM AND HAAS ELECTRONIC MATERIALS CMP HOLDINGS, INC. (US) 2023-11-07 US claimed
CN-114800255-A Formulation for chemical mechanical polishing pad and CMP pad made therefrom 罗门哈斯电子材料CMP控股股份有限公司 2022-07-29 CN claimed
CN-114770368-A Chemical mechanical polishing pad and polishing method 罗门哈斯电子材料CMP控股股份有限公司 2022-07-22 CN claimed
CN-114770369-A Formulation for chemical mechanical polishing pad with high planarization efficiency and CMP pad made with the same 罗门哈斯电子材料CMP控股股份有限公司 2022-07-22 CN claimed
US-20220226958-A1 FORMULATIONS FOR CHEMICAL MECHANICAL POLISHING PADS WITH HIGH PLANARIZATION EFFICIENCY AND CMP PADS MADE THEREWITH U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT 2022-07-21 US claimed
US-20220226959-A1 FORMULATIONS FOR CHEMICAL MECHANICAL POLISHING PADS AND CMP PADS MADE THEREWITH U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT 2022-07-21 US claimed
US-20220226957-A1 CHEMICAL MECHANICAL POLISHING PAD AND POLISHING METHOD U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT 2022-07-21 US claimed
US-10464187-B2 High removal rate chemical mechanical polishing pads from amine initiated polyol containing curatives ROHM AND HAAS ELECTRONIC MATERIALS CMP HOLDINGS, INC. (US) 2019-11-05 US claimed
US-20190168356-A1 HIGH REMOVAL RATE CHEMICAL MECHANICAL POLISHING PADS FROM AMINE INITIATED POLYOL CONTAINING CURATIVES U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT 2019-06-06 US claimed
US-6375966-B1 Polyurethane/polyurea matrices for the delivery of active agents SCENTED TECHNOLOGIES, LLC 2002-04-23 US claimed
WO-2001091551-A1 POLYURETHANE/POLYUREA MATRICES FOR THE DELIVERY OF ACTIVE AGENTS FLAVOR & FRAGRANCE SPECIALTIES (US) 2001-12-06 WO claimed
US-5821316-A POLYETHERURETHANES AND POLYUREAURETHANES FORMED BY CONDENSATION POLYMERIZATION OF DIISOCYANATES AIR PRODUCTS AND CHEMICALS, INC. (US) 1998-10-13 US claimed
EP-0855414-A1 Polyurethane prepolymers for making elastomers having improved dynamic properties AIR PRODUCTS AND CHEMICALS, INC. (US) 1998-07-29 EP claimed
EP-0283868-A2 Process for producing polyurethane/urea elastomers AIR PRODUCTS AND CHEMICALS, INC. (US) 1988-09-28 EP claimed
US-4722989-A URETHANE-LINKED TOLUENEDIISOCYANATE, DIAMINE CHAIN EXTENSION AIR PRODUCTS AND CHEMICALS, INC. (US) 1988-02-02 US claimed
US-4549007-A REACTION INJECTION MOLDING OF POLYURETHANES-POLYUREAS GAF CORPORATION (US) 1985-10-22 US claimed
US-4523004-A 1,4-BUTANEDIOL AND MONOSUBSTITUTED TOLUENE DIAMINE GAF CORPORATION (US) 1985-06-11 US claimed
US-4507459-A AROMATIC DIAMINE CHAIN EXTENDER, TIRES AIR PRODUCTS AND CHEMICALS, INC. (US) 1985-03-26 US claimed
EP-0102203-A1 Diamine/diol chain extender blends for RIM process GAF CORPORATION (US) 1984-03-07 EP claimed