Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.54 |
| ▸ | LMNA | P02545 | 2/20 | 0.54 |
| ▸ | HPGD | P15428 | 2/20 | 0.54 |
| ▸ | ALOX15 | P16050 | 2/20 | 0.54 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.54 |
| ▸ | TP53 | P04637 | 2/20 | 0.54 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.54 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.54 |
| ▸ | MAPT | P10636 | 1/20 | 0.54 |
| ▸ | ALOX12 | P18054 | 1/20 | 0.54 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.54 |
| ▸ | CA1 | P00915 | 4/20 | 0.44 |
| ▸ | CA2 | P00918 | 3/20 | 0.44 |
| ▸ | EGFR | P00533 | 2/20 | 0.44 |
| ▸ | ADAMTS4 | O75173 | 1/20 | 0.44 |
| ▸ | FYN | P06241 | 1/20 | 0.44 |
| ▸ | MMP2 | P08253 | 1/20 | 0.44 |
| ▸ | MMP9 | P14780 | 1/20 | 0.44 |
| ▸ | MMP8 | P22894 | 1/20 | 0.44 |
| ▸ | CA6 | P23280 | 1/20 | 0.44 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4255151 | 0.89 | ALDH1A1 (0.44) | ALDH1A1LMNAHPGDALOX15HSD17B10 | |
| SCHEMBL2001002 | 0.85 | HSD11B1 (0.53) | ALDH1A1LMNAHPGDALOX15HSD17B10 | |
| SCHEMBL5702524 | 0.84 | HSD17B10 (0.41) | ALDH1A1LMNAHPGDALOX15HSD17B10 | |
| SCHEMBL28030773 | 0.84 | KMT2A (0.44) | ALDH1A1LMNAHPGDALOX15HSD17B10 | |
| SCHEMBL28814954 | 0.83 | HSD11B1 (0.51) | ALDH1A1LMNAHPGDALOX15HSD17B10 | |
| SCHEMBL31683755 | 0.83 | HSD11B1 (0.56) | ALDH1A1LMNAHPGDALOX15HSD17B10 | |
| SCHEMBL1879537 | 0.81 | LMNA (0.50) | ALDH1A1LMNAHPGDALOX15HSD17B10 | |
| SCHEMBL28833567 | 0.80 | ALDH1A1 (0.50) | ALDH1A1LMNAHPGDALOX15HSD17B10 | |
| SCHEMBL1056663 | 0.78 | CA1 (0.42) | ALDH1A1LMNAHPGDALOX15HSD17B10 | |
| SCHEMBL10334392 | 0.77 | TP53 (0.52) | ALDH1A1LMNAHPGDALOX15HSD17B10 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 88 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11970557-B2 | Polymer containing photoacid generator | LG CHEM, LTD. (KR) | 2024-04-30 | — | — | US | disclosed |
| US-11681227-B2 | Enhanced EUV photoresist materials, formulations and processes | IRRESISTIBLE MATERIALS LTD (GB) | 2023-06-20 | — | — | US | disclosed |
| CN-107561863-B | Positive photosensitive resin composition and application thereof | 奇美实业股份有限公司 | 2022-09-16 | — | — | CN | disclosed |
| CN-111699206-B | Polymers comprising photoacid generators | 株式会社LG化学 | 2022-05-10 | — | — | CN | disclosed |
| CN-113994256-A | Method for forming EUV patterned resist | 亚历克斯·P·G·罗宾逊 | 2022-01-28 | — | — | CN | disclosed |
| CN-107207456-B | Latent acids and their use | 巴斯夫欧洲公司 | 2021-05-04 | — | — | CN | disclosed |
| US-20210102021-A1 | POLYMER CONTAINING PHOTOACID GENERATOR | LG CHEM, LTD. (KR) | 2021-04-08 | — | — | US | disclosed |
| CN-111699206-A | Polymers comprising photoacid generators | 株式会社LG化学 | 2020-09-22 | — | — | CN | disclosed |
| US-20200272050-A1 | Enhanced EUV Photoresist Materials, Formulations and Processes | IRRESISTIBLE MATERIALS, LTD (GB) | 2020-08-27 | — | — | US | disclosed |
| US-10747113-B2 | Method of pattern formation and method of producing polysilane resin precursor | TOKYO OHKA KOGYO CO., LTD. (JP) | 2020-08-18 | — | — | US | disclosed |
| US-5874195-A | Positive-working photoresist composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 1999-02-23 | — | — | US | disclosed |
| US-5856058-A | HALATION INHIBITOR WHICH IS AN ESTERIFICATION PRODUCT BETWEEN A SPECIFIED PHENOLIC COMPOUND AND A NAPHTHOQUINONE-1,2-DIAZIDE SULFONIC ACID. | TOKYO OHKA KOGYO CO., LTD. (JP) | 1999-01-05 | — | — | US | disclosed |
| EP-0646568-B1 | Tertiary butyl 4,4-bis(4'-hydroxyphenyl) pentanoate derivatives and positive resist materials containing the same | SHINETSU CHEMICAL CO (JP) | 1998-12-23 | — | — | EP | disclosed |
| US-5770343-A | Positive-working photoresist composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 1998-06-23 | — | — | US | disclosed |
| EP-0749044-A2 | Positive-working photoresist composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 1996-12-18 | — | — | EP | disclosed |
| EP-0749046-A1 | Positive-working photoresist composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 1996-12-18 | — | — | EP | disclosed |
| EP-0646568-A2 | Tertiary butyl 4,4-bis(4'-hydroxyphenyl) pentanoate derivatives and positive resist materials containing the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1995-04-05 | — | — | EP | disclosed |
| US-5356753-A | A polyhydroxystyrene resin having some hydroxyl groups substituted by tert-butoxycarbonyloxy groups; solution blocking agent; an onium salt | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1994-10-18 | — | — | US | disclosed |
| EP-0615163-A1 | Onium salts and positive resist materials using the same | Shin-Etsu Chemical Co., Ltd. (JP) | 1994-09-14 | — | — | EP | disclosed |
| EP-0542523-A1 | Positive resist material | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1993-05-19 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-10747113-B2 | Method of pattern formation and method of producing polysilane resin precursor | RTN4, RER1, CROCC | ALDH1A1 2894/4885LMNA 935/4885HPGD 3032/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.