Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LTA4H | P09960 | 2/20 | 0.38 |
| ▸ | SIGMAR1 | Q99720 | 3/20 | 0.38 |
| ▸ | GAA | P10253 | 1/20 | 0.37 |
| ▸ | EBP | Q15125 | 1/20 | 0.37 |
| ▸ | KCNN4 | O15554 | 1/20 | 0.35 |
| ▸ | KIF11 | P52732 | 3/20 | 0.35 |
| ▸ | CNR1 | P21554 | 1/20 | 0.35 |
| ▸ | CNR2 | P34972 | 1/20 | 0.35 |
| ▸ | MEN1 | O00255 | 1/20 | 0.35 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.35 |
| ▸ | ATM | Q13315 | 1/20 | 0.35 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3415673 | 0.96 | KIF11 (0.38) | LTA4HSIGMAR1GAAEBPKCNN4 | |
| SCHEMBL3482436 | 0.88 | KCNN4 (0.38) | SIGMAR1KCNN4KIF11MEN1KMT2A | |
| SCHEMBL7785965 | 0.85 | SIGMAR1 (0.40) | LTA4HSIGMAR1GAAEBPCNR1 | |
| SCHEMBL8525821 | 0.83 | SIGMAR1 (0.39) | LTA4HSIGMAR1GAAEBPCNR1 | |
| SCHEMBL11124047 | 0.81 | LTA4H (0.36) | LTA4HSIGMAR1GAAEBPKCNN4 | |
| SCHEMBL706928 | 0.81 | KIF11 (0.38) | LTA4HSIGMAR1GAAEBPKCNN4 | |
| SCHEMBL10612623 | 0.81 | KIF11 (0.52) | KIF11 | |
| SCHEMBL227541 | 0.80 | SIGMAR1 (0.37) | LTA4HSIGMAR1GAAEBPCNR1 | |
| SCHEMBL1406140 | 0.80 | SIGMAR1 (0.37) | LTA4HSIGMAR1GAAEBPCNR1 | |
| SCHEMBL7107589 | 0.80 | SIGMAR1 (0.37) | LTA4HSIGMAR1GAAEBPCNR1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2128897-B1 | SILICON DIELECTRIC TREATING AGENT FOR USE AFTER ETCHING, PROCESS FOR PRODUCING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE | FUJITSU LTD (JP) | 2015-05-06 | — | — | EP | disclosed |
| US-8716209-B2 | Agent for post-etch treatment of silicon dielectric film, method of manufacturing semiconductor device, and semiconductor device | FUJITSU LIMITED (JP) | 2014-05-06 | — | — | US | disclosed |
| US-20100007031-A1 | AGENT FOR POST-ETCH TREATMENT OF SILICON DIELECTRIC FILM, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE | FUJITSU LIMITED (JP) | 2010-01-14 | — | — | US | disclosed |
| EP-2128897-A1 | SILICON DIELECTRIC TREATING AGENT FOR USE AFTER ETCHING, PROCESS FOR PRODUCING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE | Fujitsu Limited (JP) | 2009-12-02 | — | — | EP | disclosed |