Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KCNN4 | O15554 | 1/20 | 0.38 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.37 |
| ▸ | LMNA | P02545 | 3/20 | 0.36 |
| ▸ | SCN1A | P35498 | 3/20 | 0.36 |
| ▸ | SCN2A | Q99250 | 3/20 | 0.36 |
| ▸ | SCN3A | Q9NY46 | 3/20 | 0.36 |
| ▸ | SIGMAR1 | Q99720 | 2/20 | 0.36 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.36 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.36 |
| ▸ | CYP2D6 | P10635 | 2/20 | 0.36 |
| ▸ | CYP2C9 | P11712 | 2/20 | 0.36 |
| ▸ | CYP2C19 | P33261 | 2/20 | 0.36 |
| ▸ | TSHR | P16473 | 1/20 | 0.36 |
| ▸ | NFKB1 | P19838 | 1/20 | 0.36 |
| ▸ | MTOR | P42345 | 1/20 | 0.36 |
| ▸ | RAB9A | P51151 | 1/20 | 0.36 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.36 |
| ▸ | MEN1 | O00255 | 1/20 | 0.36 |
| ▸ | NR1I2 | O75469 | 1/20 | 0.36 |
| ▸ | CYP1A1 | P04798 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3415673 | 0.88 | KIF11 (0.38) | KCNN4MAPK1LMNASIGMAR1KIF11 | |
| SCHEMBL3481756 | 0.88 | LTA4H (0.38) | KCNN4MAPK1SIGMAR1MEN1KMT2A | |
| SCHEMBL703240 | 0.83 | KCNN4 (0.38) | KCNN4MAPK1LMNASCN1ASCN2A | |
| SCHEMBL2238102 | 0.83 | KCNN4 (0.40) | KCNN4MAPK1LMNASIGMAR1TAAR1 | |
| SCHEMBL5614716 | 0.83 | KCNN4 (0.40) | KCNN4MAPK1LMNASCN1ASCN2A | |
| SCHEMBL4079897 | 0.79 | TSHR (0.36) | KCNN4MAPK1CYP1A2TSHRTAAR1 | |
| SCHEMBL7799317 | 0.79 | KCNN4 (0.38) | KCNN4MAPK1LMNASCN1ASCN2A | |
| SCHEMBL3959640 | 0.79 | KCNN4 (0.38) | KCNN4MAPK1LMNASCN1ASCN2A | |
| SCHEMBL4078047 | 0.79 | ALDH1A1 (0.34) | KCNN4MAPK1TSHRHSD17B10TAAR1 | |
| SCHEMBL4082792 | 0.79 | TDP1 (0.33) | KCNN4MAPK1LMNASIGMAR1TSHR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 43 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-115181223-B | Low-gloss matte auxiliary agent, preparation method thereof and molded body | 铨盛聚碳科技股份有限公司 | 2023-08-29 | — | — | CN | claimed |
| EP-3812428-B1 | COLLOIDAL STRUCTURE, MULTI-COLLOIDAL STRUCTURE, AND PRODUCTION METHOD FOR COLLOIDAL STRUCTURE | PANASONIC IP MAN CO LTD (JP) | 2025-12-03 | — | — | EP | disclosed |
| CN-115181223-B | Low-gloss matte auxiliary agent, preparation method thereof and molded body | 铨盛聚碳科技股份有限公司 | 2023-08-29 | — | — | CN | disclosed |
| CN-112424290-B | Colloid structure, colloid multiple structure, and method for producing colloid structure | 松下知识产权经营株式会社 | 2023-08-22 | — | — | CN | disclosed |
| EP-4056604-B1 | METHOD FOR PRODUCING COPOLYMER OF 1,3,7-OCTATRIENE AND STYRENE | KURARAY CO (JP) | 2023-08-02 | — | — | EP | disclosed |
| EP-3564280-B1 | COPOLYMER OF 1, 3, 7-OCTATRIENE AND STYRENE AND HYDRIDE THEREOF | KURARAY CO (JP) | 2023-07-26 | — | — | EP | disclosed |
| EP-4163312-A1 | COPOLYMER OF 1,3,7-OCTATRIENE AND ISOPRENE, HYDRIDE THEREOF, AND METHOD FOR PRODUCING SAID COPOLYMER | Kuraray Co., Ltd. (JP) | 2023-04-12 | — | — | EP | disclosed |
| EP-4163311-A1 | COPOLYMER OF 1,3,7-OCTATRIENE AND ISOPRENE, HYDRIDE THEREOF, AND METHOD FOR PRODUCING SAID COPOLYMER | Kuraray Co., Ltd. (JP) | 2023-04-12 | — | — | EP | disclosed |
| EP-3564274-B1 | 1, 3, 7-OCTATRIENE POLYMER, HYDRIDE THEREOF, AND METHOD FOR PRODUCING SAID POLYMER | KURARAY CO (JP) | 2022-12-28 | — | — | EP | disclosed |
| CN-115181223-A | Low-gloss matte auxiliary agent, preparation method thereof and formed body | 铨盛聚碳科技股份有限公司 | 2022-10-14 | — | — | CN | disclosed |
| US-20170204214-A1 | METHOD FOR MANUFACTURING HYDROGENATED POLYMER | KURARAY CO., LTD. (JP) | 2017-07-20 | — | — | US | disclosed |
| EP-3162816-A1 | METHOD FOR MANUFACTURING HYDROGENATED POLYMER | Kuraray Co., Ltd. (JP) | 2017-05-03 | — | — | EP | disclosed |
| EP-2128897-B1 | SILICON DIELECTRIC TREATING AGENT FOR USE AFTER ETCHING, PROCESS FOR PRODUCING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE | FUJITSU LTD (JP) | 2015-05-06 | — | — | EP | disclosed |
| US-8716209-B2 | Agent for post-etch treatment of silicon dielectric film, method of manufacturing semiconductor device, and semiconductor device | FUJITSU LIMITED (JP) | 2014-05-06 | — | — | US | disclosed |
| US-20100007031-A1 | AGENT FOR POST-ETCH TREATMENT OF SILICON DIELECTRIC FILM, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE | FUJITSU LIMITED (JP) | 2010-01-14 | — | — | US | disclosed |
| EP-2128897-A1 | SILICON DIELECTRIC TREATING AGENT FOR USE AFTER ETCHING, PROCESS FOR PRODUCING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE | Fujitsu Limited (JP) | 2009-12-02 | — | — | EP | disclosed |
| US-7604866-B2 | Comprising silica particles and at least one binder compound; good mechanical strength and abrasion resistance | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2009-10-20 | — | — | US | disclosed |
| US-20060269724-A1 | Comprising silica particles and at least one binder compound; good mechanical strength and abrasion resistance | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2006-11-30 | — | — | US | disclosed |
| CN-1739190-A | Fluorine-free plasma curing method for porous Low-K material | AXCELIS TECH INC (US) | 2006-02-22 | — | — | CN | disclosed |
| US-20040077757-A1 | Coating composition for use in producing an insulating thin film | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2004-04-22 | — | — | US | disclosed |