Predicted protein targets (top 11)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KIF11 | P52732 | 4/20 | 0.38 |
| ▸ | SIGMAR1 | Q99720 | 2/20 | 0.38 |
| ▸ | LTA4H | P09960 | 2/20 | 0.36 |
| ▸ | ESR1 | P03372 | 2/20 | 0.36 |
| ▸ | ESR2 | Q92731 | 2/20 | 0.36 |
| ▸ | KCNN4 | O15554 | 1/20 | 0.35 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.34 |
| ▸ | GAA | P10253 | 1/20 | 0.34 |
| ▸ | LMNA | P02545 | 1/20 | 0.34 |
| ▸ | EBP | Q15125 | 1/20 | 0.34 |
| ▸ | KCNH2 | Q12809 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3481756 | 0.96 | LTA4H (0.38) | KIF11SIGMAR1LTA4HKCNN4MAPK1 | |
| SCHEMBL3482436 | 0.88 | KCNN4 (0.38) | KIF11SIGMAR1ESR1ESR2KCNN4 | |
| SCHEMBL706928 | 0.85 | KIF11 (0.38) | KIF11SIGMAR1LTA4HESR1ESR2 | |
| SCHEMBL2922377 | 0.82 | LMNA (0.45) | KIF11LTA4HESR1ESR2KCNN4 | |
| SCHEMBL28443465 | 0.81 | KIF11 (0.38) | KIF11SIGMAR1LTA4HESR1ESR2 | |
| SCHEMBL7785965 | 0.81 | SIGMAR1 (0.40) | SIGMAR1LTA4HESR1MAPK1GAA | |
| SCHEMBL10612623 | 0.81 | KIF11 (0.52) | KIF11KCNH2 | |
| SCHEMBL2238102 | 0.79 | KCNN4 (0.40) | KIF11SIGMAR1KCNN4MAPK1LMNA | |
| SCHEMBL9304142 | 0.79 | KIF11 (0.37) | KIF11SIGMAR1LTA4HESR1ESR2 | |
| SCHEMBL3481672 | 0.79 | MAPK1 (0.38) | KIF11SIGMAR1LTA4HESR1ESR2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-115181223-B | Low-gloss matte auxiliary agent, preparation method thereof and molded body | 铨盛聚碳科技股份有限公司 | 2023-08-29 | — | — | CN | claimed |
| CN-114085382-A | Hydrogen-containing poly titanium boron siloxane flame retardant, and preparation method and application thereof | 铨盛聚碳科技股份有限公司 | 2022-02-25 | — | — | CN | disclosed |
| EP-2128897-B1 | SILICON DIELECTRIC TREATING AGENT FOR USE AFTER ETCHING, PROCESS FOR PRODUCING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE | FUJITSU LTD (JP) | 2015-05-06 | — | — | EP | disclosed |
| US-8716209-B2 | Agent for post-etch treatment of silicon dielectric film, method of manufacturing semiconductor device, and semiconductor device | FUJITSU LIMITED (JP) | 2014-05-06 | — | — | US | disclosed |
| EP-2205644-A1 | METHOD FOR PRODUCING AN AQUEOUS COMPOSITE-PARTICLE DISPERSION | BASF SE (DE) | 2010-07-14 | — | — | EP | disclosed |
| US-20100007031-A1 | AGENT FOR POST-ETCH TREATMENT OF SILICON DIELECTRIC FILM, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE | FUJITSU LIMITED (JP) | 2010-01-14 | — | — | US | disclosed |
| EP-2128897-A1 | SILICON DIELECTRIC TREATING AGENT FOR USE AFTER ETCHING, PROCESS FOR PRODUCING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE | Fujitsu Limited (JP) | 2009-12-02 | — | — | EP | disclosed |
| US-7604866-B2 | Comprising silica particles and at least one binder compound; good mechanical strength and abrasion resistance | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2009-10-20 | — | — | US | disclosed |
| WO-2009053317-A1 | METHOD FOR PRODUCING AN AQUEOUS COMPOSITE-PARTICLE DISPERSION | BASF SE (DE) | 2009-04-30 | — | — | WO | disclosed |
| US-20060269724-A1 | Comprising silica particles and at least one binder compound; good mechanical strength and abrasion resistance | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2006-11-30 | — | — | US | disclosed |
| CN-1837221-A | Production processes for triorganomonochlorosilanes | HOKKO CHEM IND CO (JP) | 2006-09-27 | — | — | CN | disclosed |
| CN-1612886-A | Method for producing triorgano-monoalkoxysilanes and method for producing triorgano-monochlorosilanes | HOKKO CHEM IND CO (JP) | 2005-05-04 | — | — | CN | disclosed |
| US-20040077757-A1 | Coating composition for use in producing an insulating thin film | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2004-04-22 | — | — | US | disclosed |