Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ADRA2A | P08913 | 4/20 | 0.46 |
| ▸ | ADRA2B | P18089 | 4/20 | 0.46 |
| ▸ | ADRA2C | P18825 | 4/20 | 0.46 |
| ▸ | HTR1A | P08908 | 3/20 | 0.37 |
| ▸ | NISCH | Q9Y2I1 | 1/20 | 0.37 |
| ▸ | PPARG | P37231 | 4/20 | 0.36 |
| ▸ | PPARA | Q07869 | 4/20 | 0.36 |
| ▸ | IDO1 | P14902 | 2/20 | 0.33 |
| ▸ | LIPG | Q9Y5X9 | 1/20 | 0.33 |
| ▸ | CYP4F2 | P78329 | 1/20 | 0.33 |
| ▸ | CYP4A11 | Q02928 | 1/20 | 0.33 |
| ▸ | PPARD | Q03181 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL705850 | 0.88 | LIPG (0.43) | ADRA2AADRA2BADRA2CPPARALIPG | |
| SCHEMBL3481682 | 0.86 | LIPG (0.50) | PPARGPPARALIPGCYP4F2CYP4A11 | |
| SCHEMBL10481807 | 0.82 | GABRA1 (0.41) | NISCHIDO1 | |
| SCHEMBL7588765 | 0.82 | ADRA2A (0.49) | ADRA2AADRA2BADRA2CHTR1ANISCH | |
| SCHEMBL703242 | 0.82 | ADRA2A (0.33) | ADRA2AADRA2BADRA2CHTR1ANISCH | |
| SCHEMBL142479 | 0.81 | ADRA2B (0.44) | ADRA2AADRA2BADRA2CHTR1APPARG | |
| SCHEMBL29488434 | 0.81 | ADRA2B (0.44) | ADRA2AADRA2BADRA2CHTR1APPARG | |
| SCHEMBL8439589 | 0.80 | ADRA2A (0.47) | ADRA2AADRA2BADRA2CHTR1ANISCH | |
| SCHEMBL30079758 | 0.78 | IDO1 (0.57) | ADRA2AADRA2BADRA2CIDO1 | |
| SCHEMBL9839840 | 0.78 | ADRA2B (0.43) | ADRA2AADRA2BADRA2CHTR1ANISCH |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2128897-B1 | SILICON DIELECTRIC TREATING AGENT FOR USE AFTER ETCHING, PROCESS FOR PRODUCING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE | FUJITSU LTD (JP) | 2015-05-06 | — | — | EP | disclosed |
| US-8716209-B2 | Agent for post-etch treatment of silicon dielectric film, method of manufacturing semiconductor device, and semiconductor device | FUJITSU LIMITED (JP) | 2014-05-06 | — | — | US | disclosed |
| US-20100007031-A1 | AGENT FOR POST-ETCH TREATMENT OF SILICON DIELECTRIC FILM, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE | FUJITSU LIMITED (JP) | 2010-01-14 | — | — | US | disclosed |
| EP-1539862-B1 | COMPOSITION ACTING AS COUPLING AGENT FOR FILLED AND PEROXIDICALLY CROSSLINKING RUBBER COMPOUNDS | EVONIK DEGUSSA GMBH (DE) | 2009-12-09 | — | — | EP | disclosed |
| EP-2128897-A1 | SILICON DIELECTRIC TREATING AGENT FOR USE AFTER ETCHING, PROCESS FOR PRODUCING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE | Fujitsu Limited (JP) | 2009-12-02 | — | — | EP | disclosed |
| US-7625975-B2 | Composition acting as coupling agent for filled and peroxidically crosslinking rubber compounds | DEGUSSA AG (DE) | 2009-12-01 | — | — | US | disclosed |
| US-20070032609-A1 | Composition acting as coupling agent for filled and peroxidically crosslinking rubber compounds | DEGUSSA AG (DE) | 2007-02-08 | — | — | US | disclosed |
| EP-1539862-A1 | COMPOSITION ACTING AS COUPLING AGENT FOR FILLED AND PEROXIDICALLY CROSSLINKING RUBBER COMPOUNDS | Degussa AG (DE) | 2005-06-15 | — | — | EP | disclosed |
| WO-2004018546-A1 | COMPOSITION ACTING AS COUPLING AGENT FOR FILLED AND PEROXIDICALLY CROSSLINKING RUBBER COMPOUNDS | DEGUSSA AG (DE) | 2004-03-04 | — | — | WO | disclosed |