SCHEMBL3482235

SCHEMBL3482235

Cc1cc(C)cc([SiH](C)O)c1

nearest known ligand 0.43

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 2/20 0.43
TSHR P16473 1/20 0.38
TPMT P51580 1/20 0.36
ACHE P22303 2/20 0.35
SELL P14151 1/20 0.35
SELP P16109 1/20 0.35
SELE P16581 1/20 0.35
PRSS1 P07477 1/20 0.35
PRSS2 P07478 1/20 0.35
C1S P09871 1/20 0.35
PRSS3 P35030 1/20 0.35
RXRA P19793 1/20 0.33
RXRB P28702 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3481692 0.79 ALDH1A1 (0.45) ALDH1A1TSHRTPMTACHESELL
SCHEMBL23027789 0.75 ALDH1A1 (0.42) ALDH1A1TSHRTPMTACHESELL
SCHEMBL16820306 0.71 ALDH1A1 (0.44) ALDH1A1TSHRTPMTACHESELL
SCHEMBL3481739 0.71 ALDH1A1 (0.38) ALDH1A1TSHRTPMTACHE
Methyl Alcohol SCHEMBL28397318 0.69 ALDH1A1 (0.64) ALDH1A1TSHRTPMTACHESELL
Methyl Alcohol SCHEMBL27974355 0.69 ALDH1A1 (0.64) ALDH1A1TSHRTPMTACHESELL
SCHEMBL17012261 0.69 ALDH1A1 (0.35) ALDH1A1TSHRACHESELLSELP
SCHEMBL26115 0.69
SCHEMBL341533 0.69 ALDH1A1 (0.67) ALDH1A1TSHRTPMTACHESELL
SCHEMBL3481666 0.67 ACHE (0.38) ALDH1A1TSHRTPMTACHERXRA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2128897-B1 SILICON DIELECTRIC TREATING AGENT FOR USE AFTER ETCHING, PROCESS FOR PRODUCING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE FUJITSU LTD (JP) 2015-05-06 EP disclosed
US-8716209-B2 Agent for post-etch treatment of silicon dielectric film, method of manufacturing semiconductor device, and semiconductor device FUJITSU LIMITED (JP) 2014-05-06 US disclosed
US-20100007031-A1 AGENT FOR POST-ETCH TREATMENT OF SILICON DIELECTRIC FILM, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE FUJITSU LIMITED (JP) 2010-01-14 US disclosed
EP-2128897-A1 SILICON DIELECTRIC TREATING AGENT FOR USE AFTER ETCHING, PROCESS FOR PRODUCING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE Fujitsu Limited (JP) 2009-12-02 EP disclosed