Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TP53 | P04637 | 1/20 | 0.44 |
| ▸ | PPARG | P37231 | 6/20 | 0.42 |
| ▸ | PPARA | Q07869 | 6/20 | 0.42 |
| ▸ | SIGMAR1 | Q99720 | 3/20 | 0.36 |
| ▸ | CRHBP | P24387 | 1/20 | 0.35 |
| ▸ | CRHR2 | Q13324 | 1/20 | 0.35 |
| ▸ | SLC6A2 | P23975 | 3/20 | 0.34 |
| ▸ | TAAR1 | Q96RJ0 | 2/20 | 0.34 |
| ▸ | SLC6A4 | P31645 | 2/20 | 0.34 |
| ▸ | SLC6A3 | Q01959 | 2/20 | 0.34 |
| ▸ | MAOA | P21397 | 1/20 | 0.34 |
| ▸ | CYP2A6 | P11509 | 1/20 | 0.34 |
| ▸ | ADORA2A | P29274 | 1/20 | 0.34 |
| ▸ | ADORA1 | P30542 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL703380 | 0.90 | SLC6A2 (0.40) | SIGMAR1SLC6A2TAAR1SLC6A4SLC6A3 | |
| SCHEMBL3481539 | 0.87 | TP53 (0.42) | TP53PPARGPPARACRHBPCRHR2 | |
| SCHEMBL3482158 | 0.85 | F2 (0.42) | TP53PPARGPPARA | |
| SCHEMBL3482509 | 0.80 | TP53 (0.45) | TP53PPARGPPARASIGMAR1CRHBP | |
| SCHEMBL3482380 | 0.79 | TP53 (0.43) | TP53PPARGPPARACRHBPCRHR2 | |
| SCHEMBL3481891 | 0.78 | TACR1 (0.42) | SIGMAR1 | |
| SCHEMBL10704774 | 0.78 | LMNA (0.42) | SLC6A2TAAR1SLC6A4 | |
| SCHEMBL29066974 | 0.77 | SIGMAR1 (0.40) | SIGMAR1SLC6A2TAAR1SLC6A4SLC6A3 | |
| SCHEMBL4171307 | 0.76 | SIGMAR1 (0.42) | SIGMAR1SLC6A2TAAR1SLC6A4SLC6A3 | |
| SCHEMBL11844149 | 0.74 | PPARG (0.55) | TP53PPARGPPARASLC6A4 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2128897-B1 | SILICON DIELECTRIC TREATING AGENT FOR USE AFTER ETCHING, PROCESS FOR PRODUCING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE | FUJITSU LTD (JP) | 2015-05-06 | — | — | EP | disclosed |
| US-8716209-B2 | Agent for post-etch treatment of silicon dielectric film, method of manufacturing semiconductor device, and semiconductor device | FUJITSU LIMITED (JP) | 2014-05-06 | — | — | US | disclosed |
| US-20100007031-A1 | AGENT FOR POST-ETCH TREATMENT OF SILICON DIELECTRIC FILM, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE | FUJITSU LIMITED (JP) | 2010-01-14 | — | — | US | disclosed |
| EP-2128897-A1 | SILICON DIELECTRIC TREATING AGENT FOR USE AFTER ETCHING, PROCESS FOR PRODUCING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE | Fujitsu Limited (JP) | 2009-12-02 | — | — | EP | disclosed |