Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | RXRA | P19793 | 1/20 | 0.40 |
| ▸ | RXRB | P28702 | 1/20 | 0.40 |
| ▸ | BCL2 | P10415 | 1/20 | 0.40 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.35 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.35 |
| ▸ | MAPT | P10636 | 1/20 | 0.35 |
| ▸ | NPC1 | O15118 | 1/20 | 0.35 |
| ▸ | RAB9A | P51151 | 1/20 | 0.35 |
| ▸ | DCLRE1A | Q6PJP8 | 1/20 | 0.34 |
| ▸ | DCLRE1B | Q9H816 | 1/20 | 0.34 |
| ▸ | SRD5A2 | P31213 | 1/20 | 0.34 |
| ▸ | PTGS2 | P35354 | 1/20 | 0.33 |
| ▸ | HPGD | P15428 | 1/20 | 0.33 |
| ▸ | EGFR | P00533 | 1/20 | 0.33 |
| ▸ | DHODH | Q02127 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3482332 | 0.88 | BCL2 (0.41) | RXRARXRBBCL2SMN1; SMN2L3MBTL1 | |
| SCHEMBL3482005 | 0.85 | BCL2 (0.41) | RXRARXRBBCL2SMN1; SMN2L3MBTL1 | |
| SCHEMBL3482627 | 0.78 | BCL2 (0.46) | RXRARXRBBCL2SMN1; SMN2L3MBTL1 | |
| SCHEMBL3482584 | 0.78 | BCL2 (0.42) | RXRARXRBBCL2SMN1; SMN2L3MBTL1 | |
| SCHEMBL4267871 | 0.77 | MAPT (0.40) | L3MBTL1MAPTHPGD | |
| SCHEMBL3482145 | 0.76 | CYP1A2 (0.35) | SMN1; SMN2L3MBTL1MAPTRAB9AHPGD | |
| SCHEMBL16487201 | 0.73 | TAAR1 (0.40) | RXRARXRBSMN1; SMN2L3MBTL1MAPT | |
| SCHEMBL30380433 | 0.73 | DCLRE1A (0.47) | BCL2SMN1; SMN2L3MBTL1MAPTNPC1 | |
| SCHEMBL28992451 | 0.73 | DCLRE1A (0.47) | BCL2SMN1; SMN2L3MBTL1MAPTNPC1 | |
| SCHEMBL2961096 | 0.70 | ALDH1A1 (0.33) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2128897-B1 | SILICON DIELECTRIC TREATING AGENT FOR USE AFTER ETCHING, PROCESS FOR PRODUCING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE | FUJITSU LTD (JP) | 2015-05-06 | — | — | EP | disclosed |
| US-8716209-B2 | Agent for post-etch treatment of silicon dielectric film, method of manufacturing semiconductor device, and semiconductor device | FUJITSU LIMITED (JP) | 2014-05-06 | — | — | US | disclosed |
| US-20100007031-A1 | AGENT FOR POST-ETCH TREATMENT OF SILICON DIELECTRIC FILM, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE | FUJITSU LIMITED (JP) | 2010-01-14 | — | — | US | disclosed |
| EP-2128897-A1 | SILICON DIELECTRIC TREATING AGENT FOR USE AFTER ETCHING, PROCESS FOR PRODUCING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE | Fujitsu Limited (JP) | 2009-12-02 | — | — | EP | disclosed |