SCHEMBL3581753

SCHEMBL3581753

NC(N)(CCc1ccccc1)Oc1ccccc1

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
SMN1; SMN2 Q16637 2/20 0.41
TAAR1 Q96RJ0 2/20 0.41
CYP2A6 P11509 1/20 0.41
HTR2A P28223 1/20 0.41
LOXL2 Q9Y4K0 1/20 0.41
IDO1 P14902 2/20 0.39
NPC1 O15118 2/20 0.39
RAB9A P51151 2/20 0.39
MAOA P21397 4/20 0.39
MAOB P27338 3/20 0.39
GRM2 Q14416 1/20 0.38
GRM3 Q14832 1/20 0.38
ALDH1A1 P00352 2/20 0.38
HPGD P15428 1/20 0.38
ALOX15 P16050 1/20 0.38
ALOX12 P18054 1/20 0.38
CASP1 P29466 1/20 0.38
HSD17B10 Q99714 1/20 0.38
GAA P10253 1/20 0.38
SLC6A2 P23975 2/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9446218 0.80 TAAR1 (0.42) SMN1; SMN2TAAR1CYP2A6HTR2ALOXL2
SCHEMBL3953288 0.74 LTA4H (0.44) SMN1; SMN2HTR2AMAOAALDH1A1SLC6A2
SCHEMBL28049304 0.73 PPARG (0.39) TAAR1ALDH1A1HPGDALOX15ALOX12
SCHEMBL28645941 0.73 GAA (0.36) SMN1; SMN2TAAR1CYP2A6HTR2ALOXL2
SCHEMBL8113702 0.72 ALDH1A1 (0.41) SMN1; SMN2TAAR1MAOAALDH1A1ALOX15
SCHEMBL23151884 0.72 LTA4H (0.43) SMN1; SMN2HTR2AMAOAALDH1A1SLC6A2
SCHEMBL6245906 0.72 LTA4H (0.43) SMN1; SMN2HTR2AMAOAALDH1A1SLC6A2
SCHEMBL7143393 0.71 TAAR1 (0.45) SMN1; SMN2TAAR1NPC1RAB9AMAOA
SCHEMBL9331455 0.71 CA1 (0.37) SMN1; SMN2ALDH1A1ALOX15GAALMNA
SCHEMBL21058237 0.70 TAAR1 (0.54) SMN1; SMN2TAAR1CYP2A6HTR2ALOXL2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 90 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-113227207-A Polyamic acid composition and transparent polyimide film using same 株式会社斗山 2021-08-06 CN claimed
CN-109897180-B Polyamide acid solution, transparent polyimide resin film using same, and transparent substrate 株式会社斗山 2021-08-03 CN claimed
CN-113045782-A Ultrahigh-light-shading polyimide composite film and preparation method thereof 南京精工新材料有限公司 2021-06-29 CN claimed
CN-112851982-A Polyimide film and preparation method thereof 南京精工新材料有限公司 2021-05-28 CN claimed
CN-112778552-A Preparation method of polyimide film 南京精工新材料有限公司 2021-05-11 CN claimed
EP-2178952-B1 POLYIMIDE FILM WITH IMPROVED THERMAL STABILITY KOLON INC (KR) 2016-03-16 EP claimed
EP-0770638-B1 Polyimide compositions for electrodeposition and coatings formed of the same ITATANI HIROSHI (JP) 1999-06-02 EP claimed
US-5741599-A Polyimide compositions for electrodeposition and coatings formed of the same PI MATERIALS RESEARCH LABORATORY (JP) 1998-04-21 US claimed
EP-0770638-A1 Polyimide compositions for electrodeposition and coatings formed of the same PI MATERIAL RESEARCH LABORATORY (JP) 1997-05-02 EP claimed
EP-4707338-A1 COMPOSITION Daikin Industries, Ltd. (JP) 2026-03-11 EP disclosed
EP-4696749-A1 COMPOSITION Daikin Industries, Ltd. (JP) 2026-02-18 EP disclosed
EP-4640767-A1 COMPOSITION Daikin Industries, Ltd. (JP) 2025-10-29 EP disclosed
US-12427709-B2 Method for manufacturing polyimide-based film and polyimide-based film manufacture KOLON INDUSTRIES, INC. (KR) 2025-09-30 US disclosed
US-20250237016-A1 REPELLENT DAIKIN INDUSTRIES, LTD. (JP) 2025-07-24 US disclosed
US-20100305299-A1 BIPHENYLTETRACARBOXYLIC ACID DIANHYDRIDE AND PROCESS FOR PRODUCING THE SAME, AND POLYIMIDE FORMED FROM THE SAME AND PROCESS FOR PRODUCING THE SAME MITSUBISHI CHEMICAL CORPORATION (JP) 2010-12-02 US disclosed
US-7842824-B2 Biphenyltetracarboxylic acid dianhydride and process for producing the same, and polyimide formed from the same and process for producing the same MITSUBISHI CHEMICAL CORPORATION (JP) 2010-11-30 US disclosed
US-20080063849-A1 Biphenyltetracarboxylic Acid Dianhydride and Process for Producing the Same, and Polymide Formed from the Same and Process for Producing Same MITSUBISHI CHEMICAL CORPORATION (JP) 2008-03-13 US disclosed
US-20070260036-A1 High Adhesive Polyimide Film and Method for Producing Same KANEKA CORPORATION (JP) 2007-11-08 US disclosed
JP-2000119521-A COPOLYMERIZED POLYIMIDE FILM, ITS PRODUCTION AND METAL WIRING CIRCUIT BOARD USING THE FILM AS SUBSTRATE DU PONT TORAY CO LTD 2000-04-25 JP disclosed
JP-2000080178-A COPOLYIMIDE FILM, PREPARATION THEREOF AND METALLIC WIRING BOARD USING SAME AS SUBSTRATE MATERIAL DU PONT TORAY CO LTD 2000-03-21 JP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20250237016-A1 REPELLENT PRMT5, CHAT, DCXR SMN1; SMN2 1058/4885TAAR1 23/4885CYP2A6 2954/4885
US-20100305299-A1 BIPHENYLTETRACARBOXYLIC ACID DIANHYDRIDE AND PROCESS FOR PRODUCING THE SAME, AND POLYIMIDE FORMED FROM THE SAME AND PROCESS FOR PRODUCING THE SAME PCCA, DDT, HPD SMN1; SMN2 2683/4885TAAR1 3227/4885CYP2A6 158/4885
US-20080063849-A1 Biphenyltetracarboxylic Acid Dianhydride and Process for Producing the Same, and Polymide Formed from the Same and Process for Producing Same HPD, PCCA, UROD SMN1; SMN2 3636/4885TAAR1 3595/4885CYP2A6 135/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.