Predicted protein targets (top 19)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 3/20 | 0.41 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.40 |
| ▸ | CES2 | O00748 | 2/20 | 0.39 |
| ▸ | MEN1 | O00255 | 1/20 | 0.39 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.39 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.39 |
| ▸ | ATM | Q13315 | 1/20 | 0.38 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.36 |
| ▸ | MAPT | P10636 | 1/20 | 0.36 |
| ▸ | RAB9A | P51151 | 1/20 | 0.36 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.36 |
| ▸ | ADRB2 | P07550 | 1/20 | 0.36 |
| ▸ | ADRB1 | P08588 | 1/20 | 0.36 |
| ▸ | ADRB3 | P13945 | 1/20 | 0.36 |
| ▸ | ZDHHC20 | Q5W0Z9 | 1/20 | 0.36 |
| ▸ | HPGD | P15428 | 2/20 | 0.35 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.35 |
| ▸ | CA1 | P00915 | 1/20 | 0.34 |
| ▸ | CA2 | P00918 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL897003 | 0.90 | TSHR (0.42) | TSHRALDH1A1CES2MEN1KMT2A | |
| SCHEMBL36699 | 0.87 | HSD17B10 (0.33) | CA1CA2 | |
| SCHEMBL11669711 | 0.83 | CES2 (0.46) | TSHRCES2MEN1KMT2ACYP3A4 | |
| SCHEMBL11670661 | 0.83 | CES2 (0.46) | TSHRCES2MEN1KMT2ACYP3A4 | |
| SCHEMBL216906 | 0.83 | TSHR (0.44) | TSHRALDH1A1CES2MEN1KMT2A | |
| SCHEMBL11029014 | 0.82 | TSHR (0.50) | TSHRALDH1A1CES2MEN1KMT2A | |
| SCHEMBL36656 | 0.78 | ALOX15 (0.40) | TSHRALDH1A1TDP1CYP3A4 | |
| SCHEMBL9972945 | 0.78 | TSHR (0.40) | TSHRALDH1A1CES2MEN1KMT2A | |
| SCHEMBL16361836 | 0.78 | CES2 (0.42) | TSHRALDH1A1CES2MEN1KMT2A | |
| SCHEMBL14678852 | 0.78 | TSHR (0.45) | TSHRALDH1A1CES2MEN1KMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 298 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20260147276-A1 | NEGATIVE RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2026-05-28 | — | — | US | disclosed |
| US-12527163-B2 | Method for producing light-emitting elements | CENTRAL GLASS COMPANY, LIMITED (JP) | 2026-01-13 | — | — | US | disclosed |
| US-20260003284-A1 | PHOTOSENSITIVE COMPOSITION, AND METHOD FOR PRODUCING PATTERNED SILICON-CONTAINING RESIN FILM | TOKYO OHKA KOGYO CO LTD (JP) | 2026-01-01 | — | — | US | disclosed |
| US-20260003277-A1 | NEGATIVE PHOTOSENSITIVE COMPOSITION, AND METHOD FOR PRODUCING PATTERNED CURED FILM | TOKYO OHKA KOGYO CO LTD (JP) | 2026-01-01 | — | — | US | disclosed |
| US-20260003282-A1 | PHOTOSENSITIVE COMPOSITION, AND METHOD FOR PRODUCING PATTERNED CURED FILM | TOKYO OHKA KOGYO CO LTD (JP) | 2026-01-01 | — | — | US | disclosed |
| US-20260003283-A1 | PHOTOSENSITIVE COMPOSITION, METHOD FOR FORMING PATTERNED SILICON-CONTAINING RESIN FILM, AND SILICON-CONTAINING RESIN | TOKYO OHKA KOGYO CO LTD (JP) | 2026-01-01 | — | — | US | disclosed |
| EP-4667537-A1 | PRIMER COMPOSITION, LAMINATE, AND METHOD FOR PRODUCING LAMINATE | TOKYO OHKA KOGYO CO., LTD. (JP) | 2025-12-24 | — | — | EP | disclosed |
| US-20250382500-A1 | PRIMER COMPOSITION, LAMINATE, AND METHOD FOR PRODUCING LAMINATE | TOKYO OHKA KOGYO CO LTD (JP) | 2025-12-18 | — | — | US | disclosed |
| US-20250370338-A1 | NEGATIVE RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2025-12-04 | — | — | US | disclosed |
| US-20250355354-A1 | RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO LTD (JP) | 2025-11-20 | — | — | US | disclosed |
| US-20030022095-A1 | Negative type radiation sensitive resin composition | JSR CORPORATION (JP) | 2003-01-30 | — | — | US | disclosed |
| EP-0065388-B1 | COATING COMPOSITION | TORAY INDUSTRIES, INC. (JP) | 1985-08-28 | — | — | EP | disclosed |
| US-4439557-A | SILYL SUBSTITUTED ACRYLATES, CURING CATALYST | TORAY INDUSTRIES, INCORPORATED (JP) | 1984-03-27 | — | — | US | disclosed |
| EP-0065388-A1 | Coating composition | TORAY INDUSTRIES, INC. (JP) | 1982-11-24 | — | — | EP | disclosed |
| US-4250124-A | FIREPROOFING TEXTILES; REACTION OF AN HYDROXY-CONTAINING COMPOUND AND A 2-SUBSTITUTED-2-OXO-OXA-PHOSPHOLANE | HOECHST AKTIENGESELLSCHAFT (DE) | 1981-02-10 | — | — | US | disclosed |
| US-4244893-A | FIREPROOFING; FINISHES FOR TEXTILES | HOECHST AKTIENGESELLSCHAFT (DE) | 1981-01-13 | — | — | US | disclosed |
| US-4220610-A | Organic phosphorus compounds with 2-hydroxyalkyl-phosphonic acid groups | HOECHST AKTIENGESELLSCHAFT (DE) | 1980-09-02 | — | — | US | disclosed |
| US-4209581-A | UREA OR THIOUREA RESIN WITH N-ALKYLOL ACRYLAMIDE | TOKYO OHKA KOGYO KABUSHIKI KAISHA (JP) | 1980-06-24 | — | — | US | disclosed |
| US-4163034-A | DECYCLIZATION, ESTERIFICATION; FIREPROOFING | HOECHST AG. (DE) | 1979-07-31 | — | — | US | disclosed |
| US-4096208-A | FIREPROOFING AGENTS | HOECHST AKTIENGESELLSCHAFT (DT) | 1978-06-20 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (5 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20260003282-A1 | PHOTOSENSITIVE COMPOSITION, AND METHOD FOR PRODUCING PATTERNED CURED FILM | H1-4, H1-10, H1-0 | TSHR 1049/4885ALDH1A1 1668/4885CES2 1566/4885 |
| US-20260147276-A1 | NEGATIVE RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | RFC1, RFC2, RFC4 | TSHR 4670/4885ALDH1A1 2990/4885CES2 910/4885 |
| US-20260003284-A1 | PHOTOSENSITIVE COMPOSITION, AND METHOD FOR PRODUCING PATTERNED SILICON-CONTAINING RESIN FILM | ASH2L, SEM1, COL1A1 | TSHR 2611/4885ALDH1A1 188/4885CES2 2551/4885 |
| US-20260003277-A1 | NEGATIVE PHOTOSENSITIVE COMPOSITION, AND METHOD FOR PRODUCING PATTERNED CURED FILM | H1-4, H1-10, H1-0 | TSHR 1112/4885ALDH1A1 2163/4885CES2 1596/4885 |
| US-20260003283-A1 | PHOTOSENSITIVE COMPOSITION, METHOD FOR FORMING PATTERNED SILICON-CONTAINING RESIN FILM, AND SILICON-CONTAINING RESIN | RARA, COL1A1, TAS1R1 | TSHR 925/4885ALDH1A1 269/4885CES2 3301/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.