Predicted protein targets (top 4)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.33 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.32 |
| ▸ | CA1 | P00915 | 1/20 | 0.30 |
| ▸ | CA2 | P00918 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL36378 | 0.87 | TSHR (0.41) | CA1CA2 | |
| SCHEMBL36656 | 0.81 | ALOX15 (0.40) | HSD17B10ALOX15 | |
| SCHEMBL21905156 | 0.81 | HSD17B10 (0.36) | HSD17B10CA2 | |
| SCHEMBL897003 | 0.78 | TSHR (0.42) | — | |
| SCHEMBL11670661 | 0.75 | CES2 (0.46) | — | |
| SCHEMBL11669711 | 0.75 | CES2 (0.46) | — | |
| SCHEMBL28833521 | 0.74 | HSD17B10 (0.34) | HSD17B10ALOX15CA1CA2 | |
| SCHEMBL28206372 | 0.74 | HSD17B10 (0.34) | HSD17B10ALOX15CA1CA2 | |
| SCHEMBL27753638 | 0.74 | — | — | |
| SCHEMBL11612731 | 0.73 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 302 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20260015490-A1 | Rubber Compositions Containing Phloroglucinolic Resins for Use in Tire Treads of Heavy Vehicles | SUMITOMO CHEMICAL ADVANCED TECH LLC D B A SUMIKA ELECTRONIC MATERIALS (US) | 2026-01-15 | — | — | US | claimed |
| EP-4554800-A1 | RUBBER COMPOSITIONS CONTAINING PHLOROGLUCINOLIC RESINS FOR USE IN TIRE TREADS OF HEAVY VEHICLES | Sumitomo Chemical Advanced Technologies LLC (US) | 2025-05-21 | — | — | EP | claimed |
| EP-3877459-B1 | POLYMER NETWORK FORMING SILANE COMPOSITIONS | MOMENTIVE PERFORMANCE MAT INC (US) | 2025-01-22 | — | — | EP | claimed |
| WO-2024015956-A1 | RUBBER COMPOSITIONS CONTAINING PHLOROGLUCINOLIC RESINS FOR USE IN TIRE TREADS OF HEAVY VEHICLES | SUMITOMO CHEMICAL ADVANCED TECHNOLOGIES, LLC, D.B.A. SUMIKA ELECTRONIC MATERIALS (US) | 2024-01-18 | — | — | WO | claimed |
| US-11267955-B2 | Polymer network forming silane compositions | MOMENTIVE PERFORMANCE MATERIALS INC. (US) | 2022-03-08 | — | — | US | claimed |
| US-20200140662-A1 | POLYMER NETWORK FORMING SILANE COMPOSITIONS | MOMENTIVE PERFORMANCE MATERIALS INC. | 2020-05-07 | — | — | US | claimed |
| US-20260147276-A1 | NEGATIVE RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2026-05-28 | — | — | US | disclosed |
| US-20260015490-A1 | Rubber Compositions Containing Phloroglucinolic Resins for Use in Tire Treads of Heavy Vehicles | SUMITOMO CHEMICAL ADVANCED TECH LLC D B A SUMIKA ELECTRONIC MATERIALS (US) | 2026-01-15 | — | — | US | disclosed |
| US-12527163-B2 | Method for producing light-emitting elements | CENTRAL GLASS COMPANY, LIMITED (JP) | 2026-01-13 | — | — | US | disclosed |
| US-20260003284-A1 | PHOTOSENSITIVE COMPOSITION, AND METHOD FOR PRODUCING PATTERNED SILICON-CONTAINING RESIN FILM | TOKYO OHKA KOGYO CO LTD (JP) | 2026-01-01 | — | — | US | disclosed |
| US-20260003277-A1 | NEGATIVE PHOTOSENSITIVE COMPOSITION, AND METHOD FOR PRODUCING PATTERNED CURED FILM | TOKYO OHKA KOGYO CO LTD (JP) | 2026-01-01 | — | — | US | disclosed |
| US-20260003283-A1 | PHOTOSENSITIVE COMPOSITION, METHOD FOR FORMING PATTERNED SILICON-CONTAINING RESIN FILM, AND SILICON-CONTAINING RESIN | TOKYO OHKA KOGYO CO LTD (JP) | 2026-01-01 | — | — | US | disclosed |
| US-20260003282-A1 | PHOTOSENSITIVE COMPOSITION, AND METHOD FOR PRODUCING PATTERNED CURED FILM | TOKYO OHKA KOGYO CO LTD (JP) | 2026-01-01 | — | — | US | disclosed |
| US-20090081590-A1 | NEGATIVE RESIST COMPOSITION AND PROCESS FOR FORMING RESIST PATTERNS | TOKYO OHKA KOGYO CO., LTD. (JP) | 2009-03-26 | — | — | US | disclosed |
| US-20090035697-A1 | NEGATIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKAKOGYO CO.,LTD. (JP) | 2009-02-05 | — | — | US | disclosed |
| US-20090011199-A1 | Fluorine-Containing Compound, Fluorine-Containing Polymer, Negative-Type Resist Composition, and Patterning Process Using Same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2009-01-08 | — | — | US | disclosed |
| US-20080124648-A1 | Resist Pattern Forming Method, Supercritical Processing Solution For Lithography Process, And Antireflection Film Forming Method | NIPPON TELEGRAPH AND TELEPHONE CORPORATION (JP) | 2008-05-29 | — | — | US | disclosed |
| US-20080118871-A1 | Resist Pattern Forming Method | NIPPON TELEGRAPH AND TELEPHONE CORPORATION (JP) | 2008-05-22 | — | — | US | disclosed |
| US-7323284-B2 | Negative type radiation sensitive resin composition | JSR CORPORATION (JP) | 2008-01-29 | — | — | US | disclosed |
| US-20030022095-A1 | Negative type radiation sensitive resin composition | JSR CORPORATION (JP) | 2003-01-30 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (9 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20260003282-A1 | PHOTOSENSITIVE COMPOSITION, AND METHOD FOR PRODUCING PATTERNED CURED FILM | H1-4, H1-10, H1-0 | HSD17B10 1617/4885ALOX15 76/4885CA1 824/4885 |
| US-20260147276-A1 | NEGATIVE RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | RFC1, RFC2, RFC4 | HSD17B10 1979/4885ALOX15 795/4885CA1 2893/4885 |
| US-20260003284-A1 | PHOTOSENSITIVE COMPOSITION, AND METHOD FOR PRODUCING PATTERNED SILICON-CONTAINING RESIN FILM | ASH2L, SEM1, COL1A1 | HSD17B10 1577/4885ALOX15 880/4885CA1 314/4885 |
| US-20260003277-A1 | NEGATIVE PHOTOSENSITIVE COMPOSITION, AND METHOD FOR PRODUCING PATTERNED CURED FILM | H1-4, H1-10, H1-0 | HSD17B10 1672/4885ALOX15 286/4885CA1 1105/4885 |
| US-20090011199-A1 | Fluorine-Containing Compound, Fluorine-Containing Polymer, Negative-Type Resist Composition, and Patterning Process Using Same | FGFR2, RTF1, ADGRF1 | HSD17B10 3780/4885ALOX15 2027/4885CA1 2222/4885 |
| US-20260003283-A1 | PHOTOSENSITIVE COMPOSITION, METHOD FOR FORMING PATTERNED SILICON-CONTAINING RESIN FILM, AND SILICON-CONTAINING RESIN | RARA, COL1A1, TAS1R1 | HSD17B10 3286/4885ALOX15 349/4885CA1 1328/4885 |
| US-20260015490-A1 | Rubber Compositions Containing Phloroglucinolic Resins for Use in Tire Treads of Heavy Vehicles | TST, RIF1, SORD | HSD17B10 3144/4885ALOX15 1986/4885CA1 4426/4885 |
| US-20200140662-A1 | POLYMER NETWORK FORMING SILANE COMPOSITIONS | TSN, RIF1, TRHDE | HSD17B10 3830/4885ALOX15 881/4885CA1 3619/4885 |
| US-11267955-B2 | Polymer network forming silane compositions | TSN, RIF1, TRHDE | HSD17B10 3830/4885ALOX15 881/4885CA1 3619/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.