Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | NPC1 | O15118 | 3/20 | 0.83 |
| ▸ | RAB9A | P51151 | 3/20 | 0.83 |
| ▸ | MAOA | P21397 | 3/20 | 0.83 |
| ▸ | ALDH1A1 | P00352 | 8/20 | 0.72 |
| ▸ | KDM4E | B2RXH2 | 7/20 | 0.72 |
| ▸ | MAPT | P10636 | 5/20 | 0.72 |
| ▸ | HPGD | P15428 | 5/20 | 0.72 |
| ▸ | CASP3 | P42574 | 1/20 | 0.72 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.72 |
| ▸ | SENP8 | Q96LD8 | 1/20 | 0.72 |
| ▸ | SENP7 | Q9BQF6 | 1/20 | 0.72 |
| ▸ | SENP6 | Q9GZR1 | 1/20 | 0.72 |
| ▸ | POLB | P06746 | 1/20 | 0.66 |
| ▸ | STAT1 | P42224 | 1/20 | 0.66 |
| ▸ | HSD17B10 | Q99714 | 4/20 | 0.64 |
| ▸ | CA1 | P00915 | 3/20 | 0.62 |
| ▸ | CA2 | P00918 | 3/20 | 0.62 |
| ▸ | MEN1 | O00255 | 2/20 | 0.62 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.62 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.62 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7331388 | 0.93 | KDM4E (0.86) | NPC1RAB9AMAOAALDH1A1KDM4E | |
| SCHEMBL29958722 | 0.91 | MAOA (1.00) | NPC1RAB9AMAOAALDH1A1KDM4E | |
| SCHEMBL9078491 | 0.91 | NPC1 (0.71) | NPC1RAB9AMAOAALDH1A1KDM4E | |
| SCHEMBL789950 | 0.91 | MAOA (1.00) | NPC1RAB9AMAOAALDH1A1KDM4E | |
| SCHEMBL8867576 | 0.90 | MAOA (0.69) | NPC1RAB9AMAOAALDH1A1KDM4E | |
| SCHEMBL11367852 | 0.90 | MAOA (0.69) | NPC1RAB9AMAOAALDH1A1KDM4E | |
| SCHEMBL490107 | 0.90 | MAOA (0.69) | NPC1RAB9AMAOAALDH1A1KDM4E | |
| SCHEMBL17037021 | 0.90 | NPC1 (0.69) | NPC1RAB9AMAOAALDH1A1KDM4E | |
| SCHEMBL20329619 | 0.88 | NPC1 (0.68) | NPC1RAB9AMAOAALDH1A1KDM4E | |
| SCHEMBL20317211 | 0.88 | NPC1 (0.77) | NPC1RAB9AMAOAALDH1A1KDM4E |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 54 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3994125-B1 | MODULATORS OF HSD17B13 AND METHODS OF USE THEREOF | REGENERON PHARMA (US) | 2025-12-24 | — | — | EP | disclosed |
| US-11957687-B2 | Modulators of HSD17B13 and methods of use thereof | REGENERON PHARMACEUTICALS, INC. (US) | 2024-04-16 | — | — | US | disclosed |
| US-20230094341-A1 | MODULATORS OF HSD17B13 AND METHODS OF USE THEREOF | REGENERON PHARMACEUTICALS, INC. (US) | 2023-03-30 | — | — | US | disclosed |
| EP-3994125-A1 | MODULATORS OF HSD17B13 AND METHODS OF USE THEREOF | Regeneron Pharmaceuticals, Inc. (US) | 2022-05-11 | — | — | EP | disclosed |
| WO-2021003295-A1 | MODULATORS OF HSD17B13 AND METHODS OF USE THEREOF | REGENERON PHARMACEUTICALS, INC. (US) | 2021-01-07 | — | — | WO | disclosed |
| WO-2021003295-A1 | MODULATORS OF HSD17B13 AND METHODS OF USE THEREOF | REGENERON PHARMACEUTICALS, INC. (US) | 2021-01-07 | — | — | WO | disclosed |
| EP-3109703-B1 | PHOTOSENSITIZATION CHEMICAL-AMPLIFICATION TYPE RESIST MATERIAL, AND METHOD FOR FORMING PATTERN USING SAME | TOKYO ELECTRON LTD (JP) | 2020-12-30 | — | — | EP | disclosed |
| CN-110664816-A | SECA inhibitors and methods of making and using the same | 佐治亚州立大学研究基金会公司 | 2020-01-10 | — | — | CN | disclosed |
| EP-3339395-B1 | CONDENSED CYCLIC COMPOUND AND ORGANIC LIGHT-EMITTING DEVICE INCLUDING THE SAME | SAMSUNG ELECTRONICS CO LTD (KR) | 2019-10-02 | — | — | EP | disclosed |
| US-10025187-B2 | Photosensitization chemical-amplification type resist material, method for forming pattern using same, semiconductor device, mask for lithography, and template for nanoimprinting | TOKYO ELECTRON LIMITED (JP) | 2018-07-17 | — | — | US | disclosed |
| US-20080286484-A1 | INK COMPOSITION, INKJET RECORDING METHOD, AND PRINTED MATERIAL | FUJIFILM CORPORATION (JP) | 2008-11-20 | — | — | US | disclosed |
| US-20080227024-A1 | PHOTOSENSITIVE COMPOSITION, AND CURED RELIEF PATTERN PRODUCTION METHOD AND SEMICONDUCTOR DEVICE USING THE SAME | FUJIFILM CORPORATION (JP) | 2008-09-18 | — | — | US | disclosed |
| US-20080227024-A1 | PHOTOSENSITIVE COMPOSITION, AND CURED RELIEF PATTERN PRODUCTION METHOD AND SEMICONDUCTOR DEVICE USING THE SAME | FUJIFILM CORPORATION (JP) | 2008-09-18 | — | — | US | disclosed |
| US-20080206527-A1 | INK COMPOSITION, INKJET RECORDING METHOD, PRINTED MATERIAL, AND INK SET | FUJIFILM CORPORATION (JP) | 2008-08-28 | — | — | US | disclosed |
| US-20080206527-A1 | INK COMPOSITION, INKJET RECORDING METHOD, PRINTED MATERIAL, AND INK SET | FUJIFILM CORPORATION (JP) | 2008-08-28 | — | — | US | disclosed |
| US-5623080-A | Fluorone and pyronin Y derivatives | SPECTRA GROUP LIMITED, INC. (US) | 1997-04-22 | — | — | US | disclosed |
| US-5495005-A | ANTICOAGULANTS, CARDIOVASCULAR DISORDERS | NATIONAL SCIENCE COUNCIL (TW) | 1996-02-27 | — | — | US | disclosed |
| US-5451343-A | Photoinitiators | SPECTRA GROUP LIMITED, INC. (US) | 1995-09-19 | — | — | US | disclosed |
| WO-1995014689-A1 | FLUORONE AND PYRONIN Y DERIVATIVES | SPECTRA GROUP LIMITED, INC. (US) | 1995-06-01 | — | — | WO | disclosed |
| US-4267344-A | 3-PENTA/ALKOXY/BENZYL-; -XANTHYL-, -THIOXANTHYL-, OR -SELENOXANTHYLOXAZOLIDINE-2,5-DIONES | PROTEINKEMISK INSTITUT. TILKNYTTET AKADEMIET FOR DE TEKNISKE VIDENSKABER (DK) | 1981-05-12 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-10025187-B2 | Photosensitization chemical-amplification type resist material, method for forming pattern using same, semiconductor device, mask for lithography, and template for nanoimprinting | ASIC1, ASIC3, CLTA | NPC1 3366/4885RAB9A 2483/4885MAOA 1735/4885 |
| US-20230094341-A1 | MODULATORS OF HSD17B13 AND METHODS OF USE THEREOF | HSD17B3, HSD17B11, HSD17B1 | NPC1 404/4885RAB9A 3998/4885MAOA 1875/4885 |
| US-11957687-B2 | Modulators of HSD17B13 and methods of use thereof | HSD17B3, HSD17B11, HSD17B1 | NPC1 404/4885RAB9A 3998/4885MAOA 1875/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.