SCHEMBL375165

SCHEMBL375165

CCCCC(CC)CC([O])=O

nearest known ligand 0.54

Predicted protein targets (top 11)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 4/20 0.54
CA2 P00918 9/20 0.53
CYP3A4 P08684 4/20 0.48
TSHR P16473 3/20 0.48
TDP1 Q9NUW8 2/20 0.48
ATM Q13315 1/20 0.48
MAPK1 P28482 1/20 0.45
L3MBTL1 Q9Y468 1/20 0.44
RECQL P46063 1/20 0.44
CA1 P00915 4/20 0.43
BCL2L1 Q07817 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8813695 0.93 CA2 (0.47) ALDH1A1CA2CYP3A4TSHRTDP1
SCHEMBL2349537 0.91 CA2 (0.47) ALDH1A1CA2CYP3A4TSHRTDP1
SCHEMBL11150364 0.86 TDP1 (0.39) ALDH1A1CA2CYP3A4TSHRTDP1
SCHEMBL5046988 0.84 ALDH1A1 (0.56) ALDH1A1CA2CYP3A4TSHRTDP1
SCHEMBL11980515 0.84 CA2 (0.61) ALDH1A1CA2CYP3A4TSHRTDP1
SCHEMBL4440711 0.82 ALDH1A1 (0.54) ALDH1A1CA2CYP3A4TSHRTDP1
SCHEMBL9176596 0.82 ALDH1A1 (0.54) ALDH1A1CA2CYP3A4TSHRTDP1
SCHEMBL2350195 0.82 LMNA (0.54) CA2CA1
SCHEMBL6761797 0.82 ALDH1A1 (0.54) ALDH1A1CA2CYP3A4TSHRTDP1
SCHEMBL140442 0.82 ALDH1A1 (0.54) ALDH1A1CA2CYP3A4TSHRTDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 354 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20240231226-A1 SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2024-07-11 US disclosed
US-20240219830-A1 SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2024-07-04 US disclosed
US-20240210823-A1 CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2024-06-27 US disclosed
US-20240210824-A1 CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2024-06-27 US disclosed
US-12013636-B2 Salt, acid generator, resist composition and method for producing resist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2024-06-18 US disclosed
US-20240142872-A1 SALT, ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2024-05-02 US disclosed
US-11947257-B2 Salt, acid generator, resist composition and method for producing resist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2024-04-02 US disclosed
EP-3395583-B1 HEAT-SENSITIVE RECORDING MATERIAL NIPPON KAYAKU KK (JP) 2024-03-27 EP disclosed
WO-2024043261-A1 AZO COMPOUND OR SALT THEREOF, AND POLARIZING FILM, POLARIZING PLATE AND LIQUID CRYSTAL DISPLAY DEVICE COMPRISING SAME 日本化薬株式会社 2024-02-29 WO disclosed
US-20240067846-A1 PHOTOPOLYMERIZABLE COMPOSITION, CURED SUBSTANCE, AND OPTICAL MEMBER FUJIFILM CORPORATION (JP) 2024-02-29 US disclosed
EP-1905787-A2 Polymer latex of high acrylonitrile content, film, pattern forming material and lithographic printing plate precursor using the same, and method for production of polymer latex FUJIFILM Corporation (JP) 2008-04-02 EP disclosed
CN-100343340-C azo metal chelate dye and optical recording medium MITSUBISHI KAGAKU MEDIA CO LTD (JP) 2007-10-17 CN disclosed
CN-101045825-A Azo metal chelate dye and optical recording medium MITSUBISHI CHEM CORP (JP) 2007-10-03 CN disclosed
US-20070054219-A1 Azo-metal chelate dye and optical recording medium MITSUBISHI KAGAKU MEDIA CO., LTD. (JP) 2007-03-08 US disclosed
EP-1666538-A1 AZO METAL CHELATE COLORING MATTER AND OPTICAL RECORDING MEDIUM Mitsubishi Chemical Corporation (JP) 2006-06-07 EP disclosed
US-20060035171-A1 Azo-metal chelate dye and optical recording medium MITSUBISHI CHEMICAL CORPORATION (JP) 2006-02-16 US disclosed
US-20030232259-A1 Dye-containing curable composition, color filter, and producing process thereof FUJI PHOTO FILM CO., LTD. 2003-12-18 US disclosed
US-5691319-A ANTICARCINOGENIC AGENTS SANKYO COMPANY, LIMITED (JP) 1997-11-25 US disclosed
EP-0536936-B1 Pyrimidine nucleoside derivatives having anti-tumor activity, their preparation and use SANKYO CO (JP) 1996-08-14 EP disclosed
EP-0536936-A1 Pyrimidine nucleoside derivatives having anti-tumor activity, their preparation and use Sankyo Company Limited (JP) 1993-04-14 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-12013636-B2 Salt, acid generator, resist composition and method for producing resist pattern RER1, FGFR1, NHERF1 ALDH1A1 861/4885CA2 100/4885CYP3A4 1895/4885
US-20240210824-A1 CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SCO2, CBR1, OXGR1 ALDH1A1 492/4885CA2 87/4885CYP3A4 591/4885
US-20240219830-A1 SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN H1-0, HCN3, RER1 ALDH1A1 1499/4885CA2 26/4885CYP3A4 1805/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.