Predicted protein targets (top 10)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HSD11B1 | P28845 | 5/20 | 0.35 |
| ▸ | LMNA | P02545 | 1/20 | 0.33 |
| ▸ | HTT | P42858 | 1/20 | 0.33 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.33 |
| ▸ | SLC22A12 | Q96S37 | 4/20 | 0.33 |
| ▸ | GAA | P10253 | 1/20 | 0.32 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.32 |
| ▸ | FFAR1 | O14842 | 1/20 | 0.30 |
| ▸ | FFAR4 | Q5NUL3 | 1/20 | 0.30 |
| ▸ | RAB9A | P51151 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3776616 | 0.93 | SLC22A12 (0.34) | HSD11B1SLC22A12GAAKMT2ARAB9A | |
| SCHEMBL5445938 | 0.82 | HSD11B1 (0.47) | HSD11B1SLC22A12KMT2AFFAR1FFAR4 | |
| SCHEMBL3777143 | 0.81 | SMN1; SMN2 (0.37) | HSD11B1LMNAHTTSMN1; SMN2GAA | |
| SCHEMBL452162 | 0.80 | HSD11B1 (0.45) | HSD11B1SLC22A12KMT2AFFAR1FFAR4 | |
| SCHEMBL29754085 | 0.80 | HSD11B1 (0.45) | HSD11B1SLC22A12KMT2AFFAR1FFAR4 | |
| Trifluoromethanesulfonic Acid SCHEMBL2572040 | 0.79 | GPR3 (0.31) | — | |
| Trifluoromethanesulfonic Acid SCHEMBL2570839 | 0.79 | ACHE (0.31) | — | |
| SCHEMBL3778770 | 0.77 | FABP3 (0.32) | — | |
| SCHEMBL3789167 | 0.77 | HSD11B1 (0.45) | HSD11B1LMNASLC22A12KMT2AFFAR1 | |
| SCHEMBL450233 | 0.75 | GAA (0.53) | HSD11B1LMNASMN1; SMN2SLC22A12GAA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7858287-B2 | Photosensitive resin, and photosensitive composition | HYOGO PREFECTURE (JP) | 2010-12-28 | — | — | US | disclosed |
| US-20090142697-A1 | PHOTOSENSITIVE RESIN, AND PHOTOSENSITIVE COMPOSITION | TOYO GOSEI CO., LTD. (JP) | 2009-06-04 | — | — | US | disclosed |