SCHEMBL3797993

SCHEMBL3797993

C=C(C)C(=O)OCC12CC3CC(CC(C3)C1)C2

nearest known ligand 0.54

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 5/20 0.54
MEN1 O00255 3/20 0.51
KMT2A Q03164 3/20 0.51
L3MBTL1 Q9Y468 2/20 0.51
CA12 O43570 1/20 0.47
CA1 P00915 1/20 0.47
CA2 P00918 1/20 0.47
CA9 Q16790 1/20 0.47
TSHR P16473 4/20 0.40
MAPT P10636 3/20 0.40
ATM Q13315 1/20 0.39
HSD17B10 Q99714 1/20 0.39
THRB P10828 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL20349638 1.00 ALDH1A1 (0.54) ALDH1A1MEN1KMT2AL3MBTL1CA12
SCHEMBL684276 0.90 ALDH1A1 (0.44) ALDH1A1MEN1KMT2AL3MBTL1CA12
SCHEMBL1506678 0.89 ALDH1A1 (0.46) ALDH1A1MEN1KMT2AL3MBTL1CA12
SCHEMBL10064087 0.88 ALDH1A1 (0.43) ALDH1A1MEN1KMT2AL3MBTL1CA12
SCHEMBL950132 0.88 ALDH1A1 (0.47) ALDH1A1MEN1KMT2AL3MBTL1CA12
SCHEMBL3791380 0.87 ALDH1A1 (0.47) ALDH1A1MEN1KMT2AL3MBTL1CA12
SCHEMBL855402 0.87 ALDH1A1 (0.45) ALDH1A1MEN1KMT2AL3MBTL1CA12
SCHEMBL12576381 0.86 ALDH1A1 (0.43) ALDH1A1MEN1KMT2AL3MBTL1CA12
SCHEMBL75495 0.85 ALDH1A1 (0.41) ALDH1A1MEN1KMT2AL3MBTL1CA12
SCHEMBL76909 0.84 ALDH1A1 (0.40) ALDH1A1MEN1KMT2AL3MBTL1MAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 79 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2554555-B1 METHODS FOR PRODUCING AN ADAMANTYL (METH)ACRYLATE MONOMER AND A (METH)ACRYLIC COPOLYMER THAT CONTAINS REPEATING UNITS DERIVED FROM THE MONOMER MITSUBISHI GAS CHEMICAL CO (JP) 2019-09-18 EP claimed
US-8846840-B2 Adamantyl (meth)acrylic monomer and (meth)acrylic polymer containing the same as repeating unit MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2014-09-30 US claimed
EP-2554555-A1 ADAMANTYL (METH)ACRYLATE MONOMER AND (METH)ACRYLIC POLYMER THAT CONTAINS REPEATING UNITS DERIVED FROM THE MONOMER Mitsubishi Gas Chemical Company, Inc. (JP) 2013-02-06 EP claimed
US-20130023638-A1 ADAMANTYL (METH)ACRYLIC MONOMER AND (METH)ACRYLIC POLYMER CONTAINING THE SAME AS REPEATING UNIT MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2013-01-24 US claimed
CN-101305321-A Developable undercoating composition for thick photoresist layers AZ ELECTRONIC MATERIALS USA (US) 2008-11-12 CN claimed
CN-1171125-C Copolymer with nitrile and alcyl group and photoresist composite containing the copolymer ϣ 2004-10-13 CN claimed
CN-1170207-C Photoresist of phenol/alicyclic copolymer, and preparation method and product thereof ϣ 2004-10-06 CN claimed
CN-1308254-A Copolymer with nitrile and alcyl group and photoresist composite containing the copolymer HIPULE INC (US) 2001-08-15 CN claimed
CN-1297167-A Phenol/alicyclic copolymer and photoresist HIPREY CORP (US) 2001-05-30 CN claimed
CN-116981758-A Thermally responsive brush polymers having a copolymer backbone and copolymer arms 英菲诺姆国际有限公司 2023-10-31 CN disclosed
CN-116410503-A Multifunctional layer structure, preparation method and product thereof 江苏百赛飞生物科技有限公司 2023-07-11 CN disclosed
US-20220119336-A1 COMPOUND, (CO)POLYMER, COMPOSITION, METHOD FOR FORMING PATTERN, AND METHOD FOR PRODUCING COMPOUND MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2022-04-21 US disclosed
US-10894918-B2 Liquid crystal medium containing polymerisable compounds MERCK PATENT GMBH (DE) 2021-01-19 US disclosed
US-10759996-B2 Liquid-crystal medium MERCK PATENT GMBH (DE) 2020-09-01 US disclosed
CN-1623121-A Photoresist composition for deep UV radiation comprising additives CLARIANT FINANCE BVI LTD (VG) 2005-06-01 CN disclosed
CN-1171125-C Copolymer with nitrile and alcyl group and photoresist composite containing the copolymer ϣ 2004-10-13 CN disclosed
CN-1170207-C Photoresist of phenol/alicyclic copolymer, and preparation method and product thereof ϣ 2004-10-06 CN disclosed
US-20040191674-A1 Chemical amplification resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2004-09-30 US disclosed
CN-1308254-A Copolymer with nitrile and alcyl group and photoresist composite containing the copolymer HIPULE INC (US) 2001-08-15 CN disclosed
CN-1297167-A Phenol/alicyclic copolymer and photoresist HIPREY CORP (US) 2001-05-30 CN disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20220119336-A1 COMPOUND, (CO)POLYMER, COMPOSITION, METHOD FOR FORMING PATTERN, AND METHOD FOR PRODUCING COMPOUND PYM1, MMAB, MEN1 ALDH1A1 1455/4885MEN1 3/4885KMT2A 556/4885
US-20130023638-A1 ADAMANTYL (METH)ACRYLIC MONOMER AND (METH)ACRYLIC POLYMER CONTAINING THE SAME AS REPEATING UNIT METTL3, METTL16, METTL14 ALDH1A1 238/4885MEN1 149/4885KMT2A 1331/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.