Predicted protein targets (top 6)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SLC6A3 | Q01959 | 4/20 | 0.39 |
| ▸ | TSHR | P16473 | 1/20 | 0.34 |
| ▸ | SLC6A4 | P31645 | 3/20 | 0.34 |
| ▸ | GAA | P10253 | 1/20 | 0.31 |
| ▸ | AKR1C3 | P42330 | 1/20 | 0.31 |
| ▸ | AKR1C1 | Q04828 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL11239464 | 0.75 | SLC6A3 (0.53) | SLC6A3TSHRSLC6A4 | |
| SCHEMBL654652 | 0.72 | SLC6A3 (0.40) | SLC6A3SLC6A4GAA | |
| SCHEMBL11245895 | 0.72 | SLC6A3 (0.40) | SLC6A3TSHRSLC6A4 | |
| SCHEMBL11244400 | 0.71 | SLC6A3 (0.39) | SLC6A3TSHRSLC6A4GAA | |
| SCHEMBL20819995 | 0.68 | TSHR (0.48) | SLC6A3TSHRSLC6A4 | |
| SCHEMBL22552682 | 0.68 | TSHR (0.48) | SLC6A3TSHRSLC6A4 | |
| SCHEMBL20819997 | 0.68 | TSHR (0.48) | SLC6A3TSHRSLC6A4 | |
| SCHEMBL8676270 | 0.67 | SLC6A3 (0.39) | SLC6A3TSHRSLC6A4 | |
| SCHEMBL383904 | 0.65 | — | — | |
| SCHEMBL21995884 | 0.65 | SLC6A3 (0.33) | SLC6A3SLC6A4 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 244 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1004568-B1 | Novel ester compounds, polymers, resist compositions and patterning process | SHINETSU CHEMICAL CO (JP) | 2006-01-25 | — | — | EP | claimed |
| US-6596463-B2 | Photosensitivity, resolution, chemical resistance | SHIN-ETSU CHEMICAL, CO., LTD. (JP) | 2003-07-22 | — | — | US | claimed |
| US-6312867-B1 | Ester compounds, polymers, resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2001-11-06 | — | — | US | claimed |
| US-4349552-A | TREATMENT OF CANCER | FUJISAWA PHARMACEUTICAL COMPANY, LTD. (JP) | 1982-09-14 | — | — | US | claimed |
| EP-0010941-B1 | 5-FLUOROURACIL DERIVATIVES, PREPARATION THEREOF AND THEIR PHARMACEUTICAL COMPOSITIONS | FUJISAWA PHARMACEUTICAL CO., LTD. (JP) | 1982-05-12 | — | — | EP | claimed |
| EP-0010941-A1 | 5-Fluorouracil derivatives, preparation thereof and their pharmaceutical compositions | FUJISAWA PHARMACEUTICAL CO., LTD. (JP) | 1980-05-14 | — | — | EP | claimed |
| EP-2482132-B1 | Resist pattern forming process | SHINETSU CHEMICAL CO (JP) | 2019-10-16 | — | — | EP | disclosed |
| EP-2325694-B1 | RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST PATTERN FORMATION METHOD | JSR CORP (JP) | 2017-11-08 | — | — | EP | disclosed |
| EP-1276012-B1 | Resist patterning process | SHINETSU CHEMICAL CO (JP) | 2016-03-23 | — | — | EP | disclosed |
| US-20150183912-A1 | (METH)ACRYLATE DERIVATIVE, POLYMER AND PHOTORESIST COMPOSITION HAVING LACTONE STRUCTURE, AND METHOD FOR FORMING PATTERN BY USING IT | NEC CORPORATION (JP) | 2015-07-02 | — | — | US | disclosed |
| US-9057949-B2 | Patterning process, resist composition, polymer, and polymerizable ester compound | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-06-16 | — | — | US | disclosed |
| US-8968979-B2 | Positive resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-03-03 | — | — | US | disclosed |
| US-8969483-B2 | (Meth)acrylate derivative, polymer and photoresist composition having lactone structure, and method for forming pattern by using it | NEC CORPORATION (JP) | 2015-03-03 | — | — | US | disclosed |
| US-6146806-A | Negative photoresist composition using polymer having 1,2-diol structure and process for forming pattern using the same | NEC CORPORATION (JP) | 2000-11-14 | — | — | US | disclosed |
| US-6147249-A | ESTER COMPOUND CAPABLE OF FORMING ACID-DECOMPOSABLE POLYMER WHICH CAN BE BLENDED AS BASE RESIN TO FORMULATE RESIST COMPOSITION HAVING HIGHER SENSITIVITY, RESOLUTION AND ETCHING RESISTANCE THAN CONVENTIONAL RESIST COMPOSITIONS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2000-11-14 | — | — | US | disclosed |
| EP-1031879-A1 | Novel ester compounds, polymers, resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2000-08-30 | — | — | EP | disclosed |
| EP-1004568-A2 | Novel ester compounds, polymers, resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2000-05-31 | — | — | EP | disclosed |
| US-4349552-A | TREATMENT OF CANCER | FUJISAWA PHARMACEUTICAL COMPANY, LTD. (JP) | 1982-09-14 | — | — | US | disclosed |
| EP-0010941-B1 | 5-FLUOROURACIL DERIVATIVES, PREPARATION THEREOF AND THEIR PHARMACEUTICAL COMPOSITIONS | FUJISAWA PHARMACEUTICAL CO., LTD. (JP) | 1982-05-12 | — | — | EP | disclosed |
| EP-0010941-A1 | 5-Fluorouracil derivatives, preparation thereof and their pharmaceutical compositions | FUJISAWA PHARMACEUTICAL CO., LTD. (JP) | 1980-05-14 | — | — | EP | disclosed |