SCHEMBL3855464

SCHEMBL3855464

Cc1cccc2c1C(=O)N(OS(=O)(=O)C(F)(F)F)C2=O

nearest known ligand 0.47

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 7/20 0.43
MAPT P10636 6/20 0.43
KMT2A Q03164 6/20 0.43
ALDH1A1 P00352 6/20 0.43
HPGD P15428 5/20 0.43
F2 P00734 3/20 0.43
HTT P42858 3/20 0.43
MEN1 O00255 3/20 0.43
XBP1 P17861 2/20 0.43
CYP1A2 P05177 1/20 0.43
CYP3A4 P08684 1/20 0.43
CYP2C19 P33261 1/20 0.43
NPSR1 Q6W5P4 1/20 0.43
LMNA P02545 1/20 0.43
SMN1; SMN2 Q16637 1/20 0.43
VDR P11473 1/20 0.42
TYMS P04818 3/20 0.40
DPP4 P27487 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL64157 0.81 ALDH1A1 (0.61) KDM4EMAPTKMT2AALDH1A1HPGD
SCHEMBL29368754 0.81 ALDH1A1 (0.61) KDM4EMAPTKMT2AALDH1A1HPGD
SCHEMBL21561247 0.80 KDM4E (0.44) KDM4EMAPTKMT2AALDH1A1HPGD
SCHEMBL21561249 0.78 KDM4E (0.35) KDM4EMAPTKMT2AALDH1A1HPGD
SCHEMBL29713407 0.78 ALDH1A1 (0.64) KDM4EMAPTKMT2AALDH1A1HPGD
SCHEMBL215202 0.78 ALDH1A1 (0.64) KDM4EMAPTKMT2AALDH1A1HPGD
SCHEMBL14099607 0.76 VDR (0.76) KDM4EMAPTKMT2AALDH1A1HPGD
SCHEMBL11291012 0.76 ALDH1A1 (0.54) KDM4EMAPTKMT2AALDH1A1HPGD
SCHEMBL184225 0.75 DNMT1 (0.42) KDM4EMAPTKMT2AALDH1A1HPGD
SCHEMBL13495393 0.75 DPP4 (0.47) KMT2AALDH1A1MEN1TYMSDPP4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 36 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7582412-B2 Undercoating; photoresists; overcoatings; impact strength; etching resistance; antireflectivity; forming relief images ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2009-09-01 US disclosed
US-7390608-B2 Photoresists containing Si-polymers ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2008-06-24 US disclosed
US-7306892-B2 Multilayer photoresist system SHIPLEY COMPANY, L.L.C. (US) 2007-12-11 US disclosed
EP-1319197-B1 ANTIREFLECTIVE COMPOSITION SHIPLEY CO LLC (US) 2007-06-06 EP disclosed
US-7217490-B2 Processes for producing silane monomers and polymers and photoresist compositions comprising same SHIPLEY COMPANY, L.L.C. (US) 2007-05-15 US disclosed
US-7118847-B2 Polymer and photoresist compositions SHIPLEY COMPANY LLC (US) 2006-10-10 US disclosed
US-7008750-B2 Processes for producing polysiloxanes and photoresist compositions comprising same SHIPLEY COMPANY, L.L.C. (US) 2006-03-07 US disclosed
US-20050170278-A1 Polymer and photoresist compositions SZMANDA CHARLES R (US) 2005-08-04 US disclosed
EP-1127900-B1 Polymer and photoresist compositions SHIPLEY CO LLC (US) 2005-04-27 EP disclosed
US-6855475-B2 Photoresist composition SHIPLEY COMPANY, L.L.C. (US) 2005-02-15 US disclosed
US-20020173680-A1 Polymer and photoresist compositions SHIPLEY COMPANY, L.L.C. (US) 2002-11-21 US disclosed
US-20020160302-A1 Polymer and photoresist compositions SHIPLEY COMPANY, L.L.C. (US) 2002-10-31 US disclosed
US-20020155380-A1 Polymer and photoresist compositions SHIPLEY COMPANY, L.L.C. 2002-10-24 US disclosed
US-20020076642-A1 Antireflective composition SHIPLEY COMPANY, L.L.C. 2002-06-20 US disclosed
US-6406828-B1 Polymer and photoresist compositions SHIPLEY COMPANY, L.L.C. 2002-06-18 US disclosed
US-20020051928-A1 Photoresist composition SHIPLEY COMPANY, L.L.C. (US) 2002-05-02 US disclosed
US-20020004570-A1 Polymer and photoresist compositions SHIPLEY COMPANY, L.L.C. (US) 2002-01-10 US disclosed
EP-1130468-A2 Polymer and photoresist compositions Shipley Company LLC (US) 2001-09-05 EP disclosed
EP-1127900-A1 Polymer and photoresist compositions Shipley Company LLC (US) 2001-08-29 EP disclosed
EP-1127899-A1 Polymer and photoresist compositions Shipley Company LLC (US) 2001-08-29 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20020173680-A1 Polymer and photoresist compositions RAD51, OSBP, BRPF1 KDM4E 2807/4885MAPT 499/4885KMT2A 3421/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.