SCHEMBL3858045

SCHEMBL3858045

CCOC(C)Oc1ccc2cc(C=O)ccc2c1

nearest known ligand 0.45

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A3 P47895 1/20 0.45
ALDH1A1 P00352 4/20 0.39
AKR1C3 P42330 1/20 0.38
AKR1C2 P52895 1/20 0.38
PPARG P37231 3/20 0.37
PPARA Q07869 3/20 0.37
PPARD Q03181 1/20 0.37
BCHE P06276 1/20 0.37
ACHE P22303 1/20 0.37
PTGS2 P35354 1/20 0.37
CYP2A6 P11509 1/20 0.37
PTGER4 P35408 1/20 0.37
RAB9A P51151 1/20 0.36
ESR1 P03372 2/20 0.36
AHR P35869 1/20 0.36
LMNA P02545 1/20 0.36
MAPT P10636 1/20 0.36
HPGD P15428 1/20 0.36
SMN1; SMN2 Q16637 1/20 0.36
TAS1R3 Q7RTX0 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8337904 0.85 ALDH1A3 (0.61) ALDH1A3ALDH1A1CYP2A6LMNAMAPT
SCHEMBL4057110 0.85 LMNA (0.44) AKR1C3AKR1C2PPARGPPARAPPARD
SCHEMBL29869460 0.85 ESR1 (0.36) AKR1C3AKR1C2PPARGPPARAPPARD
SCHEMBL283322 0.85 ESR1 (0.36) AKR1C3AKR1C2PPARGPPARAPPARD
SCHEMBL25518732 0.84 MAOA (0.47) ALDH1A3ALDH1A1RAB9AMAPTHPGD
Ammonia Solution, Strong SCHEMBL28760276 0.84 ESR1 (0.35) AKR1C3AKR1C2PPARGPPARAPPARD
2-Naphthaldehyde SCHEMBL434215 0.83 RAB9A (0.47) ALDH1A3ALDH1A1RAB9ALMNAMAPT
SCHEMBL3901021 0.82 CHRNB4 (0.36) AKR1C3AKR1C2PPARGPPARAPPARD
SCHEMBL23558704 0.81 ALDH1A3 (0.56) ALDH1A3ALDH1A1CYP2A6LMNAMAPT
SCHEMBL13845307 0.79 PPARG (0.50) PPARGPPARACYP2A6RAB9A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-1821878-B Photresist compositions comprising resin blends ROHM & HAAS ELECT MAT 2011-05-25 CN disclosed
US-7592125-B2 Chemically-amplified positive photoresist compositions that contain a photoactive component and blend of at least two distinct resins; a first resin that comprises hydroxy naphthyl groups and a second cross-linked resin; reduced line edge roughness ROHM AND HAAS ELECTRIC MATERIALS LLC (US) 2009-09-22 US disclosed
US-20080032232-A1 Novel resins and photoresist compositions comprising same SHIPLEY COMPANY, L.L.C. (US) 2008-02-07 US disclosed
US-7244542-B2 Resins and photoresist compositions comprising same SHIPLEY COMPANY, L.L.C. (US) 2007-07-17 US disclosed
CN-1821878-A Photresist compositions comprising resin blends ROHM & HAAS ELECT MAT (US) 2006-08-23 CN disclosed
EP-1684120-A1 Photresist compositions comprising resin blends Rohm and Haas Electronic Materials LLC (US) 2006-07-26 EP disclosed
US-20060160022-A1 Chemically-amplified positive photoresist compositions that contain a photoactive component and blend of at least two distinct resins; a first resin that comprises carbocyclic aryl units with hetero substitution and a second cross-linked resin ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2006-07-20 US disclosed
US-20040038150-A1 Novel resins and photoresist compositions comprising same SHIPLEY COMPANY, L.L.C. 2004-02-26 US disclosed