SCHEMBL3869765

SCHEMBL3869765

CC(=CCc1ccc(O)cc1)C(N)=O

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CA2 P00918 2/20 0.47
SLC7A5 Q01650 1/20 0.42
KDM4E B2RXH2 2/20 0.41
F13A1 P00488 1/20 0.41
ESR1 P03372 3/20 0.40
ESR2 Q92731 3/20 0.40
BLM P54132 1/20 0.40
CAMK2A Q9UQM7 1/20 0.39
ABAT P80404 1/20 0.39
TAAR1 Q96RJ0 3/20 0.37
SLC6A2 P23975 2/20 0.37
TRPA1 O75762 1/20 0.37
ALDH1A1 P00352 1/20 0.36
HTR1A P08908 1/20 0.36
ADRA2A P08913 1/20 0.36
CYP2C19 P33261 1/20 0.36
HTR3A P46098 1/20 0.36
BACE1 P56817 1/20 0.36
L3MBTL1 Q9Y468 1/20 0.36
IDO1 P14902 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1788431 0.85 IDO1 (0.43) TAAR1TRPA1ALDH1A1IDO1
SCHEMBL5421635 0.83 CA2 (0.45) CA2SLC7A5KDM4EF13A1ESR1
SCHEMBL554389 0.83 ALDH1A1 (0.42) SLC7A5TAAR1ALDH1A1IDO1
SCHEMBL554390 0.83 ALDH1A1 (0.42) SLC7A5TAAR1ALDH1A1IDO1
SCHEMBL339754 0.81 XDH (0.49) CA2SLC7A5KDM4EESR1BLM
SCHEMBL339752 0.81 XDH (0.49) CA2SLC7A5KDM4EESR1BLM
SCHEMBL1153975 0.76 MAOA (0.50) CA2KDM4EF13A1ESR1ESR2
SCHEMBL26067609 0.76 CA2 (0.48) CA2SLC7A5KDM4EESR1ESR2
SCHEMBL3880999 0.75 HMGB1 (0.39) CA2ESR1ESR2BACE1
SCHEMBL3863132 0.75 HMGB1 (0.39) CA2ESR1ESR2BACE1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1729176-B1 POSITIVE RADIATION-SENSITIVE RESIN COMPOSITION JSR CORP (JP) 2017-06-28 EP disclosed
US-7482111-B2 Negative radiation-sensitive resin composition JSR CORPORATION (JP) 2009-01-27 US disclosed
EP-1826612-A1 Radiation-sensitive positive resin composition for producing platings, transfer film, and process for producing platings JSR Corporation (JP) 2007-08-29 EP disclosed
US-20070196765-A1 RADIATION-SENSITIVE POSITIVE RESIN COMPOSITION FOR PRODUCING PLATINGS, TRANSFER FILM, AND PROCESS FOR PRODUCING PLATINGS JSR CORPORATION (JP) 2007-08-23 US disclosed
US-20070190450-A1 Negative radiation-sensitive resin composition JSR CORPORATION (JP) 2007-08-16 US disclosed
US-20070190465-A1 Positively radiation-sensitive resin composition JSR CORPORATION (JP) 2007-08-16 US disclosed
EP-1746461-A1 NEGATIVE RADIATION-SENSITIVE RESIN COMPOSITION JSR Corporation (JP) 2007-01-24 EP disclosed
EP-1729176-A1 POSITIVELY RADIATION-SENSITIVE RESIN COMPOSITION JSR Corporation (JP) 2006-12-06 EP disclosed