Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PTGS1 | P23219 | 5/20 | 0.39 |
| ▸ | PTGS2 | P35354 | 5/20 | 0.39 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.36 |
| ▸ | ALOX5 | P09917 | 1/20 | 0.35 |
| ▸ | BRD4 | O60885 | 2/20 | 0.34 |
| ▸ | POLB | P06746 | 1/20 | 0.33 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.33 |
| ▸ | MAPT | P10636 | 1/20 | 0.33 |
| ▸ | PKM | P14618 | 1/20 | 0.31 |
| ▸ | PKLR | P30613 | 1/20 | 0.31 |
| ▸ | CCR2 | P41597 | 1/20 | 0.30 |
| ▸ | PTGDR2 | Q9Y5Y4 | 1/20 | 0.30 |
| ▸ | AKR1B1 | P15121 | 1/20 | 0.30 |
| ▸ | PIK3C3 | Q8NEB9 | 1/20 | 0.30 |
| ▸ | KCNH2 | Q12809 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3881857 | 0.85 | KMT2A (0.32) | KMT2A | |
| SCHEMBL3878047 | 0.80 | FAAH (0.32) | PTGS1PTGS2ALDH1A1MAPTKCNH2 | |
| SCHEMBL4419486 | 0.78 | CA1 (0.34) | PTGS1PTGS2KMT2AALOX5BRD4 | |
| Trifluoromethanesulfonic Acid SCHEMBL36229 | 0.76 | BRD4 (0.32) | PTGS1PTGS2KMT2ABRD4ALDH1A1 | |
| SCHEMBL3870640 | 0.76 | CYTH2 (0.44) | PTGS1PTGS2KMT2AALOX5BRD4 | |
| Trifluoromethanesulfonic Acid SCHEMBL36187 | 0.75 | ACHE (0.33) | KMT2ABRD4 | |
| SCHEMBL7047390 | 0.74 | BRD4 (0.45) | PTGS1PTGS2KMT2ABRD4ALDH1A1 | |
| SCHEMBL136578 | 0.73 | CA1 (0.44) | PTGS1PTGS2KMT2AALOX5ALDH1A1 | |
| SCHEMBL3881541 | 0.73 | LDHA (0.37) | PTGS1KMT2APOLBPKLR | |
| Silver SCHEMBL6115455 | 0.72 | AKR1B1 (0.45) | POLBALDH1A1MAPTPKMPKLR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7638261-B2 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2009-12-29 | — | — | US | disclosed |
| US-20090148790-A1 | RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2009-06-11 | — | — | US | disclosed |
| US-7521169-B2 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2009-04-21 | — | — | US | disclosed |
| US-20060234153-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2006-10-19 | — | — | US | disclosed |
| EP-1557718-A1 | RADIATION-SENSITIVE RESIN COMPOSITION | JSR Corporation (JP) | 2005-07-27 | — | — | EP | disclosed |
| US-20030219680-A1 | Photoresists useful for microfabrication utilizing deep ultraviolet rays such as an excimer laser, x-rays such as synchrotron radiation, and electron beams | JSR CORPORATION (JP) | 2003-11-27 | — | — | US | disclosed |