SCHEMBL3886820

SCHEMBL3886820

C[Si]1(C)[Si](c2ccccc2)(c2ccccc2)[Si](c2ccccc2)(c2ccccc2)[Si](c2ccccc2)(c2ccccc2)[Si](c2ccccc2)(c2ccccc2)[Si]1(c1ccccc1)c1ccccc1

nearest known ligand 0.33

Predicted protein targets (top 10)

geneUniProtsupporting neighboursconfidence
LMNA P02545 1/20 0.33
TSHR P16473 1/20 0.33
ALOX12 P18054 1/20 0.33
ACHE P22303 1/20 0.33
CALM1 P0DP23 1/20 0.32
MAPK1 P28482 1/20 0.31
DUSP3 P51452 1/20 0.31
PTPN5 P54829 1/20 0.31
PTPN11 Q06124 1/20 0.31
ALDH1A1 P00352 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1249832 0.84 CALM1 (0.41) LMNATSHRALOX12ACHECALM1
SCHEMBL1426708 0.84 CALM1 (0.41) LMNATSHRALOX12ACHECALM1
SCHEMBL1425981 0.84 CALM1 (0.41) LMNATSHRALOX12ACHECALM1
SCHEMBL5554735 0.75 CALM1 (0.35) LMNATSHRALOX12ACHECALM1
SCHEMBL1776551 0.71 LMNA (0.33) LMNATSHRALOX12ACHEALDH1A1
SCHEMBL3642337 0.70 ALDH1A1 (0.40) LMNACALM1MAPK1ALDH1A1
SCHEMBL14743135 0.70
SCHEMBL1484049 0.65 TSHR (0.33) LMNATSHRALOX12ACHEALDH1A1
SCHEMBL9177736 0.65 LMNA (0.33) LMNATSHRALOX12ACHEALDH1A1
SCHEMBL7853760 0.65 LMNA (0.33) LMNATSHRALOX12ACHEALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0043480-B1 PROCESS FOR FORMING METALLIC IMAGES Hitachi, Ltd. (JP) 1985-04-03 EP claimed
US-4347304-A PHOTOSENSITIZATION WITH DISILANES OR ORGANIC COMPOUNDS HAVING COUPLED GERMANIUM OR TIN MOLECULES; PHOTORESISTS; POSITIVES; PLATING HITACHI, LTD. (JP) 1982-08-31 US claimed
US-7572303-B2 A symmetrical dialkyl carbonate, a metal, borong, silicon, or group 7 compound, a hydrogen or hydrocarbon-based fuel, an oxidizer, and a metallic cocatalyst; minimized hydrolysis; improved combustion and storage stability OCTANE INTERNATIONAL, LTD. (US) 2009-08-11 US disclosed
EP-0954558-B1 FUEL COMPOSITIONS EXHIBITING IMPROVED FUEL STABILITY ORR WILLIAM C (US) 2006-06-14 EP disclosed
US-20050044778-A1 Fuel compositions employing catalyst combustion structure OCTANE INTERNATIONAL, LTD. 2005-03-03 US disclosed
US-20040237384-A1 Fuel compositions exhibiting improved fuel stability OCTANE INTERNATIONAL, LTD. 2004-12-02 US disclosed
US-6652608-B1 Fuel compositions exhibiting improved fuel stability OCTANE INTERNATIONAL, LTD. 2003-11-25 US disclosed
EP-0043480-B1 PROCESS FOR FORMING METALLIC IMAGES Hitachi, Ltd. (JP) 1985-04-03 EP disclosed
US-4347304-A PHOTOSENSITIZATION WITH DISILANES OR ORGANIC COMPOUNDS HAVING COUPLED GERMANIUM OR TIN MOLECULES; PHOTORESISTS; POSITIVES; PLATING HITACHI, LTD. (JP) 1982-08-31 US disclosed
EP-0043480-A2 Process for forming metallic images Hitachi, Ltd. (JP) 1982-01-13 EP disclosed