SCHEMBL3914853

SCHEMBL3914853

O=C(Nc1ccccc1)c1ccc2cc(O)c(C(=O)O)cc2c1

nearest known ligand 0.67

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PLAU P00749 3/20 0.62
F2 P00734 2/20 0.59
PLG P00747 2/20 0.59
PLAT P00750 2/20 0.59
KLKB1 P03952 1/20 0.59
KLK1 P06870 1/20 0.59
PRSS1 P07477 1/20 0.59
DEGS1 O15121 1/20 0.58
PTPN11 Q06124 1/20 0.56
F10 P00742 1/20 0.55
KMT2A Q03164 2/20 0.55
PKM P14618 1/20 0.55
NPC1 O15118 3/20 0.54
RAB9A P51151 3/20 0.54
KDM4E B2RXH2 1/20 0.54
SRC P12931 1/20 0.53
MEN1 O00255 1/20 0.52
POLB P06746 1/20 0.52
NR1H4 Q96RI1 1/20 0.52
GPR27 Q9NS67 1/20 0.52

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Hydrochloric Acid SCHEMBL3922301 0.99 PLAU (0.61) PLAUF2PLGPLATKLKB1
SCHEMBL7047835 0.94 PLAU (0.59) PLAUF2PLGPLATKLKB1
SCHEMBL6575251 0.93 PLAU (0.64) PLAUF2PLGPLATKLKB1
SCHEMBL3922289 0.89 PLAU (0.59) PLAUF2PLGPLATKLKB1
SCHEMBL3925183 0.89 PLG (0.62) PLAUF2PLGPLATKLKB1
Hydrochloric Acid SCHEMBL3922499 0.87 PLG (0.61) PLAUF2PLGPLATKLKB1
SCHEMBL6938709 0.87 MEN1 (0.58) PTPN11KMT2ANPC1RAB9ASRC
SCHEMBL6936149 0.85 PLAU (0.56) PLAUF2PLGPLATKLKB1
SCHEMBL8480342 0.85 PLAU (0.62) PLAUF2PLGPLATKLKB1
SCHEMBL6937149 0.85 PLAU (0.56) PLAUF2PLGPLATKLKB1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7531691-B2 Method for producing naphthalene carboxylic acid amide compound UENO FINE CHEMICALS INDUSTRY, LTD. (JP) 2009-05-12 US disclosed
US-20080045720-A1 Method for producing naphthalene carboxylic acid amide compound UENO FINE CHEMICALS INDUSTRY, LTD. (JP) 2008-02-21 US disclosed
EP-1867629-A2 Method for producing naphthalene carboxylic acid amide compound Ueno Fine Chemicals Industry, Ltd. (JP) 2007-12-19 EP disclosed
CN-101088987-A Method for producing naphthalene carboxylic acid amide compound UENO FINE CHEMICAL IND (JP) 2007-12-19 CN disclosed
US-7169523-B2 electrophotographic toners comprising binder resins, colorants and charge control agents consisting of naphthol derivatives, having excellent negative chargeability, dispersion in and compatibility with binders KABUSHIKI KAISHA UENO SEIYAKU OYO KENKYUJO (JP) 2007-01-30 US disclosed
US-7169523-B2 electrophotographic toners comprising binder resins, colorants and charge control agents consisting of naphthol derivatives, having excellent negative chargeability, dispersion in and compatibility with binders KABUSHIKI KAISHA UENO SEIYAKU OYO KENKYUJO (JP) 2007-01-30 US disclosed
EP-0937753-B1 WATER-SOLUBLE AZO COMPOUNDS AND PROCESS FOR PRODUCING THE SAME UENO SEIYAKU OYO KENKYUJO KK (JP) 2003-08-06 EP disclosed
EP-0882705-B1 BIS(AMINOCARBONYLNAPHTHOL) DERIVATIVE UENO SEIYAKU OYO KENKYUJO KK (JP) 2003-05-28 EP disclosed
US-6548703-B1 Toning agent KABUSHIKI KAISHA UENO SEIYAKU OYO KENKYUJO (JP) 2003-04-15 US disclosed
US-6239263-B1 PREPARED FROM A COUPLER CONSISTING OF 2-HYDROXYNAPHTHALENE-3,6-DICARBOXYLIC ACID OR AN ESTER THEREOF OR AN AMIDE DERIVATIVE OF THE SAME AND A DIAZONIUM COMPOUND KABUSHIKI KAISHA UENO SEIYAKU OYO KENKYUJO (JP) 2001-05-29 US disclosed
EP-1043364-A1 TONING AGENT KABUSHIKI KAISHA UENO SEIYAKU OYO KENKYUJO (JP) 2000-10-11 EP disclosed
US-6072042-A Bis(aminocarbonylnaphthol) derivative KABUSHIKI KAISHA UENO SEIYAKU OYO KENKYUJO (JP) 2000-06-06 US disclosed
EP-0984042-A1 WATER-SOLUBLE AZO COMPOUNDS AND PROCESS FOR THE PREPARATION THEREOF Kabushiki Kaisha Ueno Seiyaku Oyo Kenkyujo (JP) 2000-03-08 EP disclosed
US-6020470-A Water-soluble azo compounds and process for producing the same KABUSHIKI KAISHA UENO SEIYAKU OYO KENKYUJO (JP) 2000-02-01 US disclosed
US-5973126-A REACTING A 2-HYDROXYNAPHTHALENE-3,6-DICARBOXYLIC ACID, AN AMIDE, OR AN ESTER THEREOF OR DERIVATIVES WITH A DIAZOTIZED AROMATIC PRIMARY AMINE; WATER RESISTANCE, CHEMICAL RESISTANCE AND SOLVENT RESISTANCE. KABUSHIKI KAISHA UENO SEIYAKU OYO KENKYUJO (JP) 1999-10-26 US disclosed
US-5965715-A Bisazo compounds and process for the preparation thereof KABUSHIKI KAISHA UENO SEIYAKU OYO KENKYUJO (JP) 1999-10-12 US disclosed
EP-0937753-A1 WATER-SOLUBLE AZO COMPOUNDS AND PROCESS FOR PRODUCING THE SAME Kabushiki Kaisha Ueno Seiyaku Oyo Kenkyujo (JP) 1999-08-25 EP disclosed
EP-0882705-A1 BIS(AMINOCARBONYLNAPHTHOL) DERIVATIVE KABUSHIKI KAISHA UENO SEIYAKU OYO KENKYUJO (JP) 1998-12-09 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20080045720-A1 Method for producing naphthalene carboxylic acid amide compound NAAA, AADAC, NAT1 PLAU 4306/4885F2 2706/4885PLG 4202/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.