SCHEMBL3948528

SCHEMBL3948528

C=C(c1ccccc1C(=C)[Si](OC)(OC)OC)[Si](OC)(OC)OC

nearest known ligand 0.34

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TSHR P16473 4/20 0.34
LMNA P02545 1/20 0.34
HSD17B10 Q99714 2/20 0.33
ALDH1A1 P00352 2/20 0.33
CFTR P13569 1/20 0.33
KDM4E B2RXH2 3/20 0.32
POLB P06746 1/20 0.32
ATM Q13315 1/20 0.32
GLA P06280 1/20 0.32
CA1 P00915 2/20 0.31
CA2 P00918 2/20 0.31
CA12 O43570 1/20 0.31
CA4 P22748 1/20 0.31
CA7 P43166 1/20 0.31
CA9 Q16790 1/20 0.31
CA14 Q9ULX7 1/20 0.31
HPGD P15428 1/20 0.31
CTSD P07339 1/20 0.31
HTT P42858 1/20 0.31
TP53 P04637 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7175530 0.86 ALDH1A1 (0.48) TSHRHSD17B10ALDH1A1CFTRKDM4E
SCHEMBL3955265 0.79 TSHR (0.33) TSHRLMNAHSD17B10ALDH1A1CFTR
SCHEMBL1408930 0.79 TSHR (0.41) TSHRLMNAALDH1A1POLBATM
SCHEMBL3950687 0.76 TSHR (0.41) TSHRLMNAHSD17B10ALDH1A1KDM4E
SCHEMBL3955257 0.75 MAPT (0.34) HSD17B10CA1CA2CA12CA7
SCHEMBL4135724 0.73 CES2 (0.35) TSHRLMNAATMRXFP1
SCHEMBL23493400 0.73 TSHR (0.32) TSHRLMNAHSD17B10ALDH1A1CFTR
SCHEMBL29434630 0.73 TSHR (0.32) TSHRLMNAHSD17B10ALDH1A1CFTR
SCHEMBL6509782 0.70 ADRA2A (0.34) TSHRLMNA
SCHEMBL29434687 0.70 ADRA2A (0.34) TSHRLMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7556860-B2 Laminate and method of forming the same, insulating film, and semiconductor device JSR CORPORATION (JP) 2009-07-07 US disclosed
US-20060216531-A1 Laminate and method of forming the same, insulating film, and semiconductor device JSR CORPORATION (JP) 2006-09-28 US disclosed
EP-1679184-A1 LAMINATE AND METHOD FOR FORMATION THEREOF, INSULATING FILM, SEMICONDUCTOR DEVICE, AND COMPOSITION FOR FORMING FILM JSR Corporation (JP) 2006-07-12 EP disclosed