SCHEMBL3977333

SCHEMBL3977333

C=CCC1(OC(=O)C(=C)C(F)(F)F)C2CC3CC(C2)CC1C3

nearest known ligand 0.30

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
TGM2 P21980 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3908663 0.84 TGM2 (0.32) TGM2
SCHEMBL6103697 0.83 TGM2 (0.32) TGM2
SCHEMBL719297 0.82
SCHEMBL1079039 0.81 ALDH1A1 (0.32)
SCHEMBL14523968 0.81 TGM2 (0.30) TGM2
SCHEMBL14877443 0.81 HSD11B1 (0.31)
SCHEMBL5008366 0.78
SCHEMBL3916186 0.78 CYP17A1 (0.39) TGM2
SCHEMBL1077901 0.76 HSD11B1 (0.30)
SCHEMBL14523965 0.76 EPHX2 (0.34)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7494763-B2 Polyhydric phenol compound and chemically amplified resist composition containing the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2009-02-24 US claimed
US-20080248417-A1 Polyhydric phenol compound and chemically amplified resist composition containing the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2008-10-09 US claimed
US-7494763-B2 Polyhydric phenol compound and chemically amplified resist composition containing the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2009-02-24 US disclosed
US-20080248417-A1 Polyhydric phenol compound and chemically amplified resist composition containing the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2008-10-09 US disclosed
US-20060073411-A1 Chemically amplified resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2006-04-06 US disclosed
US-20040191674-A1 Chemical amplification resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2004-09-30 US disclosed
JP-2002338522-A METHOD FOR PRODUCING 2-ALKYL-2-ADAMANTYL α- TRIFLUOROMETHYLACRYLATE NIPPON MEKTRON LTD 2002-11-27 JP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20080248417-A1 Polyhydric phenol compound and chemically amplified resist composition containing the same CCNA1, C1R, CCNA2 TGM2 4716/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.