SCHEMBL4018802

SCHEMBL4018802

CN(C)CCCOC(=O)C=Cc1ccccc1

nearest known ligand 0.71

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
LMNA P02545 2/20 0.71
SMN1; SMN2 Q16637 1/20 0.71
ALDH1A1 P00352 2/20 0.65
KDM4E B2RXH2 1/20 0.64
BCHE P06276 5/20 0.62
ACHE P22303 5/20 0.62
AKR1B10 O60218 5/20 0.60
AKR1B1 P15121 5/20 0.60
MEN1 O00255 1/20 0.52
KMT2A Q03164 1/20 0.52
MAOB P27338 1/20 0.51
APP P05067 1/20 0.51
ALOX5 P09917 1/20 0.49
HTR2A P28223 1/20 0.48
HTR2C P28335 1/20 0.48
SIGMAR1 Q99720 1/20 0.48
GP6 Q9HCN6 1/20 0.48

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4018801 1.00 LMNA (0.71) LMNASMN1; SMN2ALDH1A1KDM4EBCHE
SCHEMBL7921547 0.96 LMNA (0.66) LMNASMN1; SMN2ALDH1A1KDM4EBCHE
SCHEMBL7921543 0.96 LMNA (0.66) LMNASMN1; SMN2ALDH1A1KDM4EBCHE
SCHEMBL7915315 0.94 LMNA (0.64) LMNASMN1; SMN2ALDH1A1KDM4EBCHE
SCHEMBL7915314 0.94 LMNA (0.64) LMNASMN1; SMN2ALDH1A1KDM4EBCHE
SCHEMBL7915247 0.94 LMNA (0.64) LMNASMN1; SMN2ALDH1A1KDM4EBCHE
SCHEMBL7915244 0.94 LMNA (0.64) LMNASMN1; SMN2ALDH1A1KDM4EBCHE
SCHEMBL4023891 0.91 ALDH1A1 (0.72) LMNASMN1; SMN2ALDH1A1KDM4EBCHE
SCHEMBL4023889 0.91 ALDH1A1 (0.72) LMNASMN1; SMN2ALDH1A1KDM4EBCHE
SCHEMBL15347088 0.86 AKR1B10 (0.73) LMNAALDH1A1AKR1B10AKR1B1MEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 27 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0065352-B1 LIGHT-SENSITIVE POLYMER COMPOSITION Hitachi, Ltd. (JP) 1986-01-29 EP claimed
EP-0065352-A2 Light-sensitive polymer composition Hitachi, Ltd. (JP) 1982-11-24 EP claimed
US-7521744-B2 Resin-encapsulated semiconductor apparatus and process for its fabrication RENESAS TECHNOLOGY CORP. (JP) 2009-04-21 US disclosed
US-7064368-B2 Resin-encapsulated semiconductor apparatus and process for its fabrication RENESAS TECHNOLOGY CORP. (JP) 2006-06-20 US disclosed
US-20050248014-A1 Resin-encapsulated semiconductor apparatus and process for its fabrication RENESAS TECHNOLOGY CORP. 2005-11-10 US disclosed
US-20050046047-A1 Resin-encapsulated semiconductor apparatus and process for its fabrication HITACHI, LTD. 2005-03-03 US disclosed
US-6847125-B2 Resin-encapsulated semiconductor apparatus and process for its fabrication RENESAS TECHNOLOGY CORP. (JP) 2005-01-25 US disclosed
US-20040084785-A1 Resin-encapsulated semiconductor apparatus and process for its fabrication HITACHI, LTD. 2004-05-06 US disclosed
US-6657245-B2 Resin-encapsulated semiconductor apparatus and process for its fabrication HITACHI, LTD. (JP) 2003-12-02 US disclosed
US-6617630-B2 Resin-encapsulated semiconductor apparatus and process for its fabrication HITACHI, LTD. (JP) 2003-09-09 US disclosed
US-6525359-B2 Resin-encapsulated semiconductor apparatus and process for its fabrication HITACHI, LTD. (JP) 2003-02-25 US disclosed
US-6147374-A Resin-encapsulated semiconductor apparatus HITACHI, LTD. (JP) 2000-11-14 US disclosed
US-5851681-A Wiring structure with metal wiring layers and polyimide layers, and fabrication process of multilayer wiring board HITACHI, LTD. (JP) 1998-12-22 US disclosed
US-5350663-A Construction of electrical circuits and protective or insulating layers for electronic components BASF LACKE+ FARBEN AKTIENGESELLSCHAFT (DE) 1994-09-27 US disclosed
US-4876167-A CATIONIC POLYMER CONTAINING PHOTOGENERATED 1,3-CYCLOBUTYLENE CROSSLINKING UNITS, WITH ANIONIC DYE EASTMAN KODAK COMPANY (US) 1989-10-24 US disclosed
US-4808510-A NEGATIVE-WORKING; PHOTO CROSSLINKABLE CATIONIC ADDITION POLYMER EASTMAN KODAK COMPANY (US) 1989-02-28 US disclosed
EP-0304383-A2 A photographic element and patternable mordant composition EASTMAN KODAK COMPANY (a New Jersey corporation) (US) 1989-02-22 EP disclosed
EP-0304382-A2 Color filter arrays EASTMAN KODAK COMPANY (a New Jersey corporation) (US) 1989-02-22 EP disclosed
EP-0065352-B1 LIGHT-SENSITIVE POLYMER COMPOSITION Hitachi, Ltd. (JP) 1986-01-29 EP disclosed
EP-0065352-A2 Light-sensitive polymer composition Hitachi, Ltd. (JP) 1982-11-24 EP disclosed