SCHEMBL4036772

SCHEMBL4036772

[CH2]C12CC3CC(C1)CC(CO)(C3)C2

nearest known ligand 0.49

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 3/20 0.45
LMNA P02545 1/20 0.45
GAA P10253 1/20 0.36
GRIN2D O15399 3/20 0.35
GRIN3B O60391 3/20 0.35
GRIN1 Q05586 3/20 0.35
GRIN2A Q12879 3/20 0.35
GRIN2B Q13224 3/20 0.35
GRIN2C Q14957 3/20 0.35
GRIN3A Q8TCU5 3/20 0.35
POLB P06746 1/20 0.35
MEN1 O00255 1/20 0.35
KMT2A Q03164 1/20 0.35
ESR1 P03372 1/20 0.32
CYP2C9 P11712 1/20 0.32
ESR2 Q92731 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL602378 0.84 ALDH1A1 (0.52) ALDH1A1LMNAGAAGRIN2DGRIN3B
SCHEMBL4044996 0.80 GRIN2D (0.33) ALDH1A1LMNAGRIN2DGRIN3BGRIN1
SCHEMBL10413669 0.78 GRIN2D (0.59) ALDH1A1GAAGRIN2DGRIN3BGRIN1
SCHEMBL18788534 0.76 PKM (0.48) ALDH1A1LMNAGAAGRIN2DGRIN3B
SCHEMBL18788533 0.76 PKM (0.48) ALDH1A1LMNAGAAGRIN2DGRIN3B
SCHEMBL1044999 0.76 PKM (0.48) ALDH1A1LMNAGAAGRIN2DGRIN3B
SCHEMBL10415218 0.75 GRIN2D (0.41) ALDH1A1GAAGRIN2DGRIN3BGRIN1
SCHEMBL4752629 0.74 GRIN2D (0.56) ALDH1A1LMNAGAAGRIN2DGRIN3B
SCHEMBL6058620 0.74 GRIN2D (0.64) ALDH1A1LMNAGAAGRIN2DGRIN3B
SCHEMBL14858329 0.74 LMNA (0.45) ALDH1A1LMNAGAAGRIN2DGRIN3B

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 26 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11681222-B2 Fluorine-containing polymer, purification method, and radiation-sensitive resin composition JSR CORPORATION (JP) 2023-06-20 US disclosed
US-20220137508-A9 FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION JSR CORPORATION (JP) 2022-05-05 US disclosed
US-20210278764-A1 FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION JSR CORPORATION (JP) 2021-09-09 US disclosed
US-11036133-B2 Fluorine-containing polymer, purification method, and radiation-sensitive resin composition JSR CORPORATION (JP) 2021-06-15 US disclosed
CN-107003604-B Photosensitive resin composition, method for producing color filter, and liquid crystal display device 奇美实业股份有限公司 2020-08-11 CN disclosed
US-20200124961-A1 FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION JSR CORPORATION (JP) 2020-04-23 US disclosed
US-10620534-B2 Fluorine-containing polymer, purification method, and radiation-sensitive resin composition JSR CORPORATION (JP) 2020-04-14 US disclosed
CN-106933033-B Photosensitive resin composition, optical filter and manufacturing method thereof, and liquid crystal display device 奇美实业股份有限公司 2020-03-13 CN disclosed
US-20190278175-A9 FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION JSR CORPORATION (JP) 2019-09-12 US disclosed
US-20190025695-A1 FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION JSR CORPORATION (JP) 2019-01-24 US disclosed
CN-100577630-C Adamantane derivative and process for producing the same IDEMITSU KOSAN CO 2010-01-06 CN disclosed
US-20090156854-A1 ADAMANTANE DERIVATIVES AND PROCESS FOR PRODUCING THE SAME IDEMITSU KOSAN CO., LTD. (JP) 2009-06-18 US disclosed
US-7528279-B2 Adamantane derivatives and process for producing the same IDEMITSU KOSAN CO., LTD. (JP) 2009-05-05 US disclosed
EP-2003148-A9 FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION JSR Corporation (JP) 2009-04-22 EP disclosed
EP-2003148-A2 FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION JSR Corporation (JP) 2008-12-17 EP disclosed
US-20080153030-A1 Positive resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2008-06-26 US disclosed
US-20070129532-A1 Adamantane derivatives and process for producing the same IDEMITSU KOSAN CO., LTD (JP) 2007-06-07 US disclosed
CN-1914147-A Adamantane derivative and process for producing the same IDEMITSU KOSAN CO (JP) 2007-02-14 CN disclosed
EP-1712542-A1 ADAMANTANE DERIVATIVES AND PROCESS FOR PRODUCING THE SAME IDEMITSU KOSAN CO., LTD. (JP) 2006-10-18 EP disclosed
EP-1602975-A1 RADIATION-SENSITIVE RESIN COMPOSITION JSR Corporation (JP) 2005-12-07 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20090156854-A1 ADAMANTANE DERIVATIVES AND PROCESS FOR PRODUCING THE SAME ADH1A, ADH5, TAS1R2 ALDH1A1 7/4885LMNA 1642/4885GAA 379/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.