Predicted protein targets (top 16)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.54 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.54 |
| ▸ | ALDH1A1 | P00352 | 6/20 | 0.54 |
| ▸ | LMNA | P02545 | 2/20 | 0.50 |
| ▸ | CHKA | P35790 | 2/20 | 0.50 |
| ▸ | HTT | P42858 | 2/20 | 0.50 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.50 |
| ▸ | PKM | P14618 | 1/20 | 0.50 |
| ▸ | GAA | P10253 | 2/20 | 0.48 |
| ▸ | MAPT | P10636 | 1/20 | 0.48 |
| ▸ | GFER | P55789 | 1/20 | 0.48 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.47 |
| ▸ | RAB9A | P51151 | 1/20 | 0.47 |
| ▸ | ATM | Q13315 | 1/20 | 0.47 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.47 |
| ▸ | SRD5A2 | P31213 | 1/20 | 0.47 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Bromide SCHEMBL21751040 | 0.98 | NPSR1 (0.53) | L3MBTL1NPSR1ALDH1A1LMNACHKA | |
| SCHEMBL28119608 | 0.93 | NPSR1 (0.49) | L3MBTL1NPSR1ALDH1A1LMNACHKA | |
| SCHEMBL127407 | 0.86 | ALDH1A1 (0.52) | L3MBTL1NPSR1ALDH1A1LMNACHKA | |
| SCHEMBL10626173 | 0.83 | CA2 (0.52) | L3MBTL1NPSR1ALDH1A1LMNACHKA | |
| SCHEMBL736568 | 0.83 | LMNA (0.56) | L3MBTL1NPSR1ALDH1A1LMNACHKA | |
| SCHEMBL21750919 | 0.82 | NPSR1 (0.40) | L3MBTL1NPSR1ALDH1A1LMNACHKA | |
| Bromide SCHEMBL140800 | 0.81 | LMNA (0.55) | L3MBTL1NPSR1ALDH1A1LMNACHKA | |
| Hydrochloric Acid SCHEMBL34474399 | 0.81 | L3MBTL1 (0.64) | L3MBTL1NPSR1ALDH1A1LMNACHKA | |
| Iodide SCHEMBL8728732 | 0.81 | L3MBTL1 (0.69) | L3MBTL1NPSR1ALDH1A1LMNACHKA | |
| Hydrochloric Acid SCHEMBL11604013 | 0.80 | MAPT (0.54) | L3MBTL1NPSR1ALDH1A1LMNACHKA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 30 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2024204692-A1 | RESIN COMPOSITION, TRANSPARENT MATERIAL, TRANSPARENT FILM, PLATE MATERIAL FOR SCREEN PRINTING, STENCIL FOR SCREEN PRINTING, AND PHOTOSENSITIVE RESIST FILM | 株式会社ムラカミ | 2024-10-03 | — | — | WO | disclosed |
| US-20230202221-A1 | THERMAL TRANSFER SHEET, DISCOLORED OR DECOLORIZED PRINTED MATERIAL, AND METHOD FOR PRODUCING DISCOLORED OR DECOLORIZED PRINTED MATERIAL | DAI NIPPON PRINTING CO., LTD. (JP) | 2023-06-29 | — | — | US | disclosed |
| WO-2022215283-A1 | LAYERED FILM FOR PATTERN FORMATION, NON-PHOTOSENSITIVE SCREEN PRINTING PLATE, AND METHOD FOR MANUFACTURING SAME | 株式会社 ムラカミ | 2022-10-13 | — | — | WO | disclosed |
| EP-3775004-A1 | BENZOXAZINE RESIN COMPOSITION, PREPREG, AND FIBER-REINFORCED COMPOSITE MATERIAL | Toray Industries, Inc. (JP) | 2021-02-17 | — | — | EP | disclosed |
| US-20200062783-A1 | PHOTO LEWIS ACID GENERATOR | NIPPON SHOKUBAI CO., LTD. (JP) | 2020-02-27 | — | — | US | disclosed |
| WO-2019186269-A1 | BENZOXAZINE RESIN COMPOSITION, PREPREG, AND FIBER-REINFORCED COMPOSITE MATERIAL | TORAY INDUSTRIES, INC. (JP) | 2019-10-03 | — | — | WO | disclosed |
| US-9904167-B2 | Compound, active light sensitive or radiation sensitive resin composition, resist film using same, resist-coated mask blank, photomask, pattern forming method, method for manufacturing electronic device, and electronic device | FUJIFILM CORPORATION (JP) | 2018-02-27 | — | — | US | disclosed |
| US-20160116840-A1 | COMPOUND, ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE RESIN COMPOSITION, RESIST FILM USING SAME, RESIST-COATED MASK BLANK, PHOTOMASK, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2016-04-28 | — | — | US | disclosed |
| EP-1553449-B1 | ACTIVE ENERGY RAY SENSITIVE RESIN COMPOSITION, ACTIVE ENERGY RAY SENSITIVE RESIN FILM AND METHOD FOR FORMING PATTERN USING SAID FILM | MURAKAMI CO LTD (JP) | 2016-01-20 | — | — | EP | disclosed |
| US-8900791-B2 | Actinic ray-sensitive or radiation-sensitive resin composition and method of forming pattern with the composition | FUJIFILM CORPORATION (JP) | 2014-12-02 | — | — | US | disclosed |
| US-7470502-B2 | Ink composition, inkjet recording method, printed material, process for producing lithographic printing plate, and lithographic printing plate | FUJIFILM CORPORATION (JP) | 2008-12-30 | — | — | US | disclosed |
| US-7303787-B2 | Active ray curable ink-jet composition, image forming method using the same, and ink-jet recording apparatus | KONICA MINOLTA MEDICAL & GRAPHIC, INC. (JP) | 2007-12-04 | — | — | US | disclosed |
| EP-1808466-A1 | Ink composition, inkjet recording method, printed material, process for producing lithographic printing plate, and lithographic printing plate | Fujifilm Corporation (JP) | 2007-07-18 | — | — | EP | disclosed |
| US-20070160815-A1 | Ink composition, inkjet recording method, printed material, process for producing lithographic printing plate, and lithographic printing plate | FUJIFILM CORPORATION (JP) | 2007-07-12 | — | — | US | disclosed |
| US-7182453-B2 | Ink jet recording apparatus and ink jet recording method | KONICA MINOLTA HOLDINGS, INC. (JP) | 2007-02-27 | — | — | US | disclosed |
| US-20070039517-A1 | Ink composition, inkjet recording method, printed material, process for producing lithographic printing plate, and lithographic printing plate | FUJI PHOTO FILM CO., LTD. | 2007-02-22 | — | — | US | disclosed |
| EP-1754758-A2 | Ink composition comprising an onium salt and a cationically polymerisable compound, inkjet recording method, printed material, process for producing lithographic printing plate, and lithographic printing plate | Fuji Photo Film Co., Ltd. (JP) | 2007-02-21 | — | — | EP | disclosed |
| US-20050227166-A1 | Active energy ray sensitive resin composition, active energy ray sensitive resin film and method for forming pattern using said film | MURAKAMI CO., LTD. (JP) | 2005-10-13 | — | — | US | disclosed |
| EP-1553449-A1 | ACTIVE ENERGY RAY SENSITIVE RESIN COMPOSITION, ACTIVE ENERGY RAY SENSITIVE RESIN FILM AND METHOD FOR FORMING PATTERN USING SAID FILM | Murakami Co., Ltd. (JP) | 2005-07-13 | — | — | EP | disclosed |
| US-6806040-B2 | ORGANIC OLIGOMER, A POLYMERIZATION INITIATOR AND A CROSSLINKING AGENT, THE ORGANIC OLIGOMER BEING A SILICONE OLIGOMER REPRESENTED BY THE FOLLOWING FORMULA (1), WHEREIN X DENOTES HYDROGEN, DEUTERIUM, HALOGEN, AN ALKYL GROUP OR AN | NIPPON TELEGRAPH AND TELEPHONE CORPORATION (JP) | 2004-10-19 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20160116840-A1 | COMPOUND, ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE RESIN COMPOSITION, RESIST FILM USING SAME, RESIST-COATED MASK BLANK, PHOTOMASK, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE | CHRM1, ESR1, RER1 | L3MBTL1 2782/4885NPSR1 1055/4885ALDH1A1 3574/4885 |
| US-20200062783-A1 | PHOTO LEWIS ACID GENERATOR | LEO1, LRRK2, LSG1 | L3MBTL1 121/4885NPSR1 2746/4885ALDH1A1 3738/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.